World's Best Scientists 2026 revealed!
Christoph Adelmann

Christoph Adelmann

D-Index & Metrics

Materials Science

D-Index
55
Citations
12369
World Ranking
8523
National Ranking
100

Christoph Adelmann publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Christoph Adelmann sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 368 publications — 73rd percentile

73% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Christoph Adelmann D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Christoph Adelmann sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 55 D-Index — 34th percentile

34% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Christoph Adelmann is a researcher affiliated with Imec in Belgium. Their work spans multiple fields including Physics and Astronomy, Engineering, and Materials Science, with significant contributions distributed among these disciplines.

Their research focuses extensively on subfields such as Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry, and Biomedical Engineering. This multidisciplinary approach facilitates research across various topics including magnetic properties of thin films, semiconductor materials and devices, quantum and electron transport phenomena, ferroelectric and negative capacitance devices, copper interconnects and reliability, semiconductor materials and interfaces, as well as magnetic properties and applications.

Adelmann has authored or co-authored numerous scientific publications, often collaborating with several frequent coauthors. These include Florin Ciubotaru, Frederic Vanderveken, Sorin Cotöfană, Said Hamdioui, and Abdulqader Mahmoud.

Their recent papers reflect a focus on spintronics, magnonics, and spin-wave computing technologies, highlighted by the following works:

  • Opportunities and challenges for spintronics in the microelectronics industry, 2020, Nature Electronics
  • The 2021 Magnonics Roadmap, 2021, Journal of Physics Condensed Matter
  • Advances in Magnetics Roadmap on Spin-Wave Computing, 2022, IEEE Transactions on Magnetics
  • Reconfigurable submicrometer spin-wave majority gate with electrical transducers, 2020, Science Advances
  • Fan-out enabled spin wave majority gate, 2020, AIP Advances

The venues where Christoph Adelmann frequently publishes include arXiv (Cornell University) with 21 publications, Physical Review B with 5 publications, Journal of Applied Physics and IEEE Transactions on Circuits and Systems I Regular Papers with 3 publications each, and IEEE Transactions on Magnetics with 2 publications.

Best Publications

  • Opportunities and challenges for spintronics in the microelectronics industry

    B. Dieny;I. L. Prejbeanu;K. Garello;P. Gambardella

  • Stabilizing the ferroelectric phase in doped hafnium oxide

    M. Hoffmann;U. Schroeder;T. Schenk;T. Shimizu

  • The 2021 Magnonics Roadmap.

    Anjan Barman;Gianluca Gubbiotti;S. Ladak;A. O. Adeyeye

  • Impact of different dopants on the switching properties of ferroelectric hafniumoxide

    Uwe Schroeder;Ekaterina Yurchuk;Johannes Müller;Dominik Martin

  • High-k dielectrics for future generation memory devices (Invited Paper)

    J. A. Kittl;K. Opsomer;M. Popovici;N. Menou

  • Ferroelectricity in Gd-Doped HfO2 Thin Films

    S. Mueller;C. Adelmann;A. Singh;S. Van Elshocht

  • Electrical detection of spin accumulation at a ferromagnet-semiconductor interface.

    X. Lou;C. Adelmann;M. Furis;S. A. Crooker

  • Experimental prototype of a spin-wave majority gate

    Thomas Fischer;M. Kewenig;D. A. Bozhko;A. A. Serga

  • Identification of the ferroelectric switching process and dopant-dependent switching properties in orthorhombic HfO2: A first principles insight

    Sergiu Clima;Dirk Wouters;Christoph Adelmann;Tony Schenk

  • Dynamically stable gallium surface coverages during plasma-assisted molecular-beam epitaxy of (0001) GaN

    C. Adelmann;J. Brault;D. Jalabert;P. Gentile

  • Direct comparison of recombination dynamics in cubic and hexagonal GaN/AlN quantum dots

    Julia Simon;Julia Simon;N.T. Pelekanos;Christoph Adelmann;Esteban Martínez-Guerrero

  • Spin injection from the Heusler alloy Co2MnGe into Al0.1Ga0.9As∕GaAs heterostructures

    X. Y. Dong;C. Adelmann;J. Q. Xie;C. J. Palmstrøm

  • Self-assembled InGaN quantum dots grown by molecular-beam epitaxy

    C. Adelmann;J. Simon;G. Feuillet;N. T. Pelekanos

  • Spin injection and relaxation in ferromagnet-semiconductor heterostructures

    C. Adelmann;X. Lou;J. Strand;C. J. Palmstrøm

  • Surfactant effect of gallium during molecular-beam epitaxy of GaN on AlN (0001)

    Guido Mula;Guido Mula;C. Adelmann;S. Moehl;J. Oullier

  • Gallium adsorption on (0001) GaN surfaces

    Christoph Adelmann;Julien Brault;Guido Mula;Bruno Daudin

  • Spin injection from the Heusler alloy Co_2MnGe into Al_0.1Ga_0.9As/GaAs heterostructures

    X.Y. Dong;C. Adelmann;J.Q. Xie;C.J. Palmstrom

  • Thickness dependence of the resistivity of platinum-group metal thin films

    Shibesh Dutta;Kiroubanand Sankaran;Kristof Moors;Geoffrey Pourtois

  • Shape memory and ferromagnetic shape memory effects in single-crystal Ni2MnGa thin films

    J. W. Dong;J. Q. Xie;J. Lu;J. Lu;C. Adelmann

  • Advanced Interconnects: Materials, Processing, and Reliability

    Mikhail R. Baklanov;Christoph Adelmann;Larry Zhao;Stefan De Gendt

  • Thickness dependence of the resistivity of Platinum group metal thin films

    Shibesh Dutta;Kiroubanand Sankaran;Kristof Moors;Geoffrey Pourtois

  • Electrical Detection of Spin Accumulation at a Ferromagnet-Semiconductor Interface

    X. Lou;C. Adelmann;M. Furis;S.A. Crooker

Frequent Co-Authors

Iuliana Radu
Iuliana Radu Taiwan Semiconductor Manufacturing Company (Taiwan)
Chris Palmstrom
Chris Palmstrom University of California, Santa Barbara
S. De Gendt
S. De Gendt KU Leuven
Said Hamdioui
Said Hamdioui Delft University of Technology

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