World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
89
Citations
30824
World Ranking
1769
National Ranking
93

Michael J. Hoffmann publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Michael J. Hoffmann sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 558 publications — 90th percentile

90% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Michael J. Hoffmann D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Michael J. Hoffmann sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 89 D-Index — 87th percentile

87% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Michael J. Hoffmann is affiliated with the Karlsruhe Institute of Technology in Germany and has contributed significantly to the fields of materials science and engineering. Their research spans multiple subfields, focusing primarily on materials chemistry, electrical and electronic engineering, biomedical engineering, aerospace engineering, and ceramics and composites.

The scientist's work addresses a range of main topics, including:

  • Ferroelectric and piezoelectric materials
  • High-temperature coating behaviors
  • Electronic and structural properties of oxides
  • Microwave dielectric ceramics synthesis
  • Microstructure and mechanical properties
  • Multiferroics and related materials
  • Acoustic wave resonator technologies

Michael J. Hoffmann has published frequently in various scientific journals, with notable venues including:

  • Journal of the European Ceramic Society
  • Journal of Applied Physics
  • Acta Materialia
  • Ionics
  • SSRN Electronic Journal

Some of their recent publications are:

  • "Grain size effects in donor doped lead zirconate titanate ceramics," 2020, Journal of Applied Physics
  • "A thermal grooving study of relative grain boundary energies of nickel in polycrystalline Ni and in a Ni/YSZ anode measured by atomic force microscopy," 2021, Acta Materialia
  • "The mechanism of grain growth at general grain boundaries in SrTiO3," 2020, Scripta Materialia
  • "Upscaling of LATP synthesis: Stoichiometric screening of phase purity and microstructure to ionic conductivity maps," 2021, Ionics
  • "Processing and properties of translucent bismuth sodium titanate ceramics," 2020, Journal of the European Ceramic Society

Collaboration is an important aspect of their work, with frequent coauthors including:

  • Karl G. Schell
  • Ethel C. Bucharsky
  • Patricia Haremski
  • Piero Lupetin
  • Lars Epple

Michael J. Hoffmann's research contributions are documented across a significant number of publications in materials science, with 38 publications in the field and 28 in engineering. Their focus on ceramics and composites, together with materials chemistry, reflects a multidisciplinary approach towards understanding and developing advanced materials.

Best Publications

  • Industry 4.0

    Heiner Lasi;Peter Fettke;Hans-Georg Kemper;Thomas Feld

  • Unique Thickness-Dependent Properties of the van der Waals Interlayer Antiferromagnet MnBi2Te4 Films

    M. M. Otrokov;I. P. Rusinov;I. P. Rusinov;M. Blanco-Rey;M. Blanco-Rey;M. Hoffmann

  • Stabilizing the ferroelectric phase in doped hafnium oxide

    M. Hoffmann;U. Schroeder;T. Schenk;T. Shimizu

  • Unveiling the double-well energy landscape in a ferroelectric layer

    Michael Hoffmann;Franz P. G. Fengler;Melanie Herzig;Terence Mittmann

  • Prediction and observation of an antiferromagnetic topological insulator.

    M. M. Otrokov;I. I. Klimovskikh;H. Bentmann;D. Estyunin

  • Mechanisms of aging and fatigue in ferroelectrics

    Yuri A. Genenko;Julia Glaum;Michael J. Hoffmann;Karsten Albe

  • In-Situ Raman Investigation of Polysulfide Formation in Li-S Cells

    M. Hagen;P. Schiffels;M. Hammer;S. Dörfler

  • Next generation ferroelectric materials for semiconductor process integration and their applications

    T. Mikolajick;S. Slesazeck;H. Mulaosmanovic;M. H. Park

  • Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material.

    Uwe Schroeder;Claudia Richter;Min Hyuk Park;Tony Schenk

  • Nanodomain structure of Pb [ Zr 1 − x Ti x ] O 3 at its morphotropic phase boundary: Investigations from local to average structure

    Kristin A. Schönau;Ljubomira A. Schmitt;Michael Knapp;Hartmut Fuess

  • High capacity vertical aligned carbon nanotube/sulfur composite cathodes for lithium–sulfur batteries

    Susanne Dörfler;Susanne Dörfler;Markus Hagen;Holger Althues;Jens Tübke

  • The lowest energy Frenkel and charge-transfer excitons in quasi-one-dimensional structures: application to MePTCDI and PTCDA crystals

    Michael Hoffmann;Karin Schmidt;Torsten Fritz;Tom Hasche

  • Calculating absorption shifts for retinal proteins: Computational challenges

    Wanko M;Hoffmann M;Strodel P;Koslowski A

  • Direct Observation of Negative Capacitance in Polycrystalline Ferroelectric HfO2

    Michael Hoffmann;Milan Pešić;Korok Chatterjee;Asif I. Khan

  • The study of grain size dependence of yield stress of copper for a wide grain size range

    V.Y. Gertsman;V.Y. Gertsman;M. Hoffmann;H. Gleiter;R. Birringer

  • Correlation between microstructure, strain behavior, and acoustic emission of soft PZT ceramics

    M.J Hoffmann;M Hammer;A Endriss;D.C Lupascu

  • Complex Internal Bias Fields in Ferroelectric Hafnium Oxide

    Tony Schenk;Michael Hoffmann;Johannes Ocker;Milan Pešić

  • Lithium Diffusion Pathway in Li1.3Al0.3Ti1.7(PO4)3 (LATP) Superionic Conductor

    Mykhailo Monchak;Mykhailo Monchak;Thomas Hupfer;Anatoliy Senyshyn;Hans Boysen

  • Dawn Arrives at Ceres: Exploration of a Small Volatile-Rich World

    C. T. Russell;C. A. Raymond;E. Ammannito;D. L. Buczkowski

  • Ferroelectric phase transitions in nanoscale HfO2 films enable giant pyroelectric energy conversion and highly efficient supercapacitors

    Michael Hoffmann;Uwe Schroeder;Christopher Künneth;Alfred Kersch

  • Single-step triplet-triplet annihilation: an intrinsic limit for the high brightness efficiency of phosphorescent organic light emitting diodes.

    W. Staroske;M. Pfeiffer;K. Leo;M. Hoffmann

Frequent Co-Authors

Theo Fett
Theo Fett Karlsruhe Institute of Technology
Uwe Schroeder
Uwe Schroeder Namlab gGmbH
Hartmut Fuess
Hartmut Fuess Technical University of Darmstadt
Stefan Slesazeck
Stefan Slesazeck Namlab gGmbH
Rüdiger-A. Eichel
Rüdiger-A. Eichel Forschungszentrum Jülich
Paul F. Becher
Paul F. Becher Oak Ridge National Laboratory
Sheldon M. Wiederhorn
Sheldon M. Wiederhorn National Institute of Standards and Technology
Gerold A. Schneider
Gerold A. Schneider Hamburg University of Technology
Hans-Joachim Kleebe
Hans-Joachim Kleebe Technical University of Darmstadt

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