The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Michael F. Hochella sits on this spectrum.
This scientist: 216 publications — 38th percentile
38% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Michael F. Hochella sits on this spectrum.
This scientist: 79 D-Index — 80th percentile
80% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Michael F. Hochella is affiliated with Virginia Tech in the United States. Their research spans the fields of Earth and Planetary Sciences and Environmental Science, with a focus on several subfields including Geochemistry and Petrology, Inorganic Chemistry, Health, Toxicology and Mutagenesis, Pollution, and Environmental Chemistry.
The main topics addressed in their research cover Geochemistry and Elemental Analysis, Radioactive Element Chemistry and Processing, Heavy Metals in the Environment, Iron Oxide Chemistry and Applications, Paleontology and Stratigraphy of Fossils, Coal and Its By-products, and Nanoparticles: Synthesis and Applications.
Frequent coauthors working alongside Michael F. Hochella include Qingze Chen, Michael Schindler, Jing Liu, Yixuan Yang, and Yi Yang.
Their research contributions have been published mainly in the following venues:
Significant recent papers by Michael F. Hochella include:
Michael F. Hochella has been recognized with several awards, including the C.C. Patterson Award from the Geochemical Society in 2021. They were also named a Fellow of the American Association for the Advancement of Science (AAAS) in 2007 and a Fellow of the American Geophysical Union (AGU) in 2006.
Marina E. Vance;Todd Kuiken;Eric P. Vejerano;Sean P. McGinnis
Michael F. Hochella;Steven K. Lower;Patricia A. Maurice;R. Lee Penn
Michael F. Hochella;Art F. White
Michael F. Hochella;Michael F. Hochella;David W. Mogk;James Ranville;Irving C. Allen
Bojeong Kim;Chee Sung Park;Mitsuhiro Murayama;Michael F. Hochella
Susan L. Stipp;Michael F. Hochella
I. V. Chernyshova;M. F. Hochella;A. S. Madden
Steven K. Lower;Michael F. Hochella;Terry J. Beveridge
Mark R. Wiesner;Gregory V. Lowry;Kimberly L. Jones;Michael F. Hochella
Nicholas S. Wigginton;Kelly L. Haus;Michael F. Hochella
Patricia M Dove;Michael F Hochella
Jodi L. Junta;Michael F. Hochella
Benjamin P. Colman;Christina L. Arnaout;Sarah Anciaux;Sarah Anciaux;Claudia K. Gunsch
Paul Wersin;Michael F. Hochella;Per Persson;George Redden
Susan L. Stipp;Michael F. Hochella;George A. Parks;James O. Leckie
Andrew S. Madden;Michael F. Hochella
S.E O'Reilly;Michael F Hochella
M.F. Hochella;A.H. Carim
Xing-pan Guo;Yi Yang;Da-pei Lu;Zuo-shun Niu
Andrew S. Madden;Michael F. Hochella;Todd P. Luxton
M. F. Hochella;S. K. Lower;P. A. Maurice;R. L. Penn
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