World's Best Scientists 2026 revealed!
Annelies Delabie

Annelies Delabie

D-Index & Metrics

Engineering and Technology

D-Index
47
Citations
7145
World Ranking
4966
National Ranking
61

Annelies Delabie publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Annelies Delabie sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 324 publications — 80th percentile

80% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Annelies Delabie D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Annelies Delabie sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 47 D-Index — 52nd percentile

52% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Annelies Delabie is affiliated with KU Leuven in Belgium and has an extensive publication record focused on Engineering and Materials Science. Their research contributions span 57 publications in Engineering and 47 in Materials Science, reflecting a broad engagement with these disciplines.

The scientist's work covers several subfields, including Electrical and Electronic Engineering, Materials Chemistry, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, and Biomedical Engineering. These areas encompass a wide range of materials and their applications in technological contexts.

Main research topics addressed by Delabie include Semiconductor materials and devices, Electronic and Structural Properties of Oxides, 2D Materials and Applications, Advancements in Photolithography Techniques, Copper Interconnects and Reliability, Chalcogenide Semiconductor Thin Films, and Catalytic Processes in Materials Science.

Frequent collaborators in Delabie's research include Benjamin Groven, Kaat Van Dongen, Rachel A. Nye, Jan-Willem J. Clerix, and Gouri Sankar Kar.

Key publication venues where Delabie has published multiple works include Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, The Journal of Physical Chemistry C, Chemistry of Materials, Journal of Micro/Nanopatterning Materials and Metrology, and Micro and Nano Engineering.

Examples of recent papers highlight a focus on surface reactions, area-selective deposition techniques, and crystal growth mechanisms:

  • Insight into Selective Surface Reactions of Dimethylamino-trimethylsilane for Area-Selective Deposition of Metal, Nitride, and Oxide, 2020, The Journal of Physical Chemistry C
  • Area-Selective Deposition of Ruthenium by Area-Dependent Surface Diffusion, 2020, Chemistry of Materials
  • Chemical Vapor Deposition of a Single-Crystalline MoS2 Monolayer through Anisotropic 2D Crystal Growth on Stepped Sapphire Surface, 2024, ACS Nano
  • Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions, 2023, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition, 2022, Applied Physics Letters

Best Publications

  • Very low surface recombination velocities on p-type silicon wafers passivated with a dielectric with fixed negative charge

    G. Agostinelli;A. Delabie;P. Vitanov;Z. Alexieva

  • High-k dielectrics for future generation memory devices (Invited Paper)

    J. A. Kittl;K. Opsomer;M. Popovici;N. Menou

  • Effective electrical passivation of Ge(100) for high-k gate dielectric layers using germanium oxide

    Annelies Delabie;Florence Bellenger;Michel Houssa;Thierry Conard

  • CMOS Process-Compatible High-Power Low-Leakage AlGaN/GaN MISHEMT on Silicon

    M. Van Hove;S. Boulay;S. R. Bahl;S. Stoffels

  • Germanium surface passivation and atomic layer deposition of high-k dielectrics—a tutorial review on Ge-based MOS capacitors

    Qi Xie;Shaoren Deng;Marc Schaekers;Dennis Lin

  • Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

    Riikka L. Puurunen;Wilfried Vandervorst;Wim F. A. Besling;Olivier Richard

  • Passivation of Ge ( 100 ) ∕ GeO2 ∕ high-κ Gate Stacks Using Thermal Oxide Treatments

    F. Bellenger;M. Houssa;A. Delabie;V. Afanasiev

  • Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon

    Martin M. Frank;Yves Jean Chabal;Martin L. Green;Annelies Delabie

  • Characteristic trapping lifetime and capacitance-voltage measurements of GaAs metal-oxide-semiconductor structures

    Guy Brammertz;Koen Martens;Sonja Sioncke;Annelies Delabie

  • Atomic layer deposition of hafnium oxide on germanium substrates

    Annelies Delabie;Riikka L. Puurunen;Bert Brijs;Matty Caymax

  • New Mechanisms for Ozone-Based ALD Growth of High-k Dielectrics via Nitrogen-Oxygen Species

    Sung-Hoon Jung;Petri Raisanen;Michael Givens;Eric Shero

  • A reinterpretation of the EPR spectra of Cu(II) in zeolites A, Y and ZK4, based on ab initio cluster model calculations

    Kristine Pierloot;Annelies Delabie;Marijke H. Groothaert;Robert A. Schoonheydt

  • Identification of Cu(II) coordination structures in Cu-ZSM-5, based on a DFT/ab initio assignment of the EPR spectra

    Marijke H. Groothaert;Kristine Pierloot;Annelies Delabie;Robert A. Schoonheydt

  • Capacitance-voltage characterization of GaAs–Al2O3 interfaces

    G. Brammertz;H.-C. Lin;K. Martens;D. Mercier

  • The conversion mechanism of amorphous silicon to stoichiometric WS2

    Markus H. Heyne;Markus H. Heyne;Jean-François de Marneffe;Thomas Nuytten;Johan Meersschaut

  • Challenges and opportunities in advanced Ge pMOSFETs

    E Simoen;J Mitard;Geert Hellings;Geert Eneman

  • Electronic structure of GeO2-passivated interfaces of (100)Ge with Al2O3 and HfO2

    Valeri Afanas'ev;Andre Stesmans;Annelies Delabie;Florence Bellenger

  • Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S

    Benjamin Groven;Markus Heyne;Ankit Nalin Mehta;Hugo Bender

  • Estimation of fixed charge densities in hafnium-silicate gate dielectrics

    V.S. Kaushik;B.J. O'Sullivan;G. Pourtois;N. Van Hoornick

  • Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

    A. Delabie;M. Caymax;B. Groven;M. Heyne

  • HfO2 as gate dielectric on Ge: interfaces and deposition techniques

    M. Caymax;S. Van Elshocht;M. Houssa;A. Delabie

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

Pursuing a career in Engineering and Technology opens many doors, but a well-rounded education can further enhance your opportunities. In today’s evolving job market, online degrees are a flexible way to add valuable business and leadership skills to your technical background.

For those looking to expand into management or entrepreneurship, a bachelor of business administration online offers foundational business knowledge. Moving up the career ladder, organizational leadership master's programs are excellent choices to develop critical leadership and decision-making skills, highly valued across engineering sectors.

If you are interested in operations, logistics, or higher management roles, consider the best online mba in operations management programs. These programs focus on the strategic aspects of running technology-driven organizations.

For a streamlined admissions process, explore an online mba no gre option, allowing you to advance your education without the standardized test requirement. Combining engineering expertise with business credentials can open new and exciting career pathways in the USA and around the world.

Best Scientists Citing Annelies Delabie

Trending Scientists

Recently Published Articles