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Engineering and Technology

D-Index
61
Citations
11475
World Ranking
2092
National Ranking
48

Overview

Wilhelmus M. M. Kessels is affiliated with Eindhoven University of Technology in the Netherlands and has an extensive publication record in engineering and materials science. Their research spans key subfields including electrical and electronic engineering, materials chemistry, atomic and molecular physics and optics, biomedical engineering, and electronic, optical, and magnetic materials.

The scientist's work primarily focuses on semiconductor materials and devices, as well as electronic and structural properties of oxides. Additional thematic areas include 2D materials and their applications, ZnO doping and properties, silicon and solar cell technologies, thin-film transistor technologies, and ferroelectric and negative capacitance devices.

Key recent papers authored include:

  • Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation, 2021, ACS Catalysis
  • Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers, 2020, ACS Materials Letters
  • On the hydrogenation of Poly-Si passivating contacts by Al2O3 and SiN thin films, 2020, Solar Energy Materials and Solar Cells
  • Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications, 2020, Nanotechnology
  • Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity, 2020, Chemistry of Materials

Frequent coauthors in their collaborative research efforts include Marcel A. Verheijen, Adriaan J. M. Mackus, Bart Macco, Ageeth A. Bol, and Harm C. M. Knoops.

The scientist's research has been published frequently in:

  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • The Journal of Physical Chemistry C
  • Applied Physics Letters
  • ACS Applied Nano Materials
  • Solar Energy Materials and Solar Cells

Best Publications

  • Flexible perovskite photovoltaic modules and cells rased on atomic layer deposited compact layers and UV-irradiated TiO2 scaffolds on plastic substrates

    Francesco Di Giacomo;Valerio Zardetto;Alessandra D'Epifanio;Sara Pescetelli

  • From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity.

    Adriaan J. M. Mackus;Marc J. M. Merkx;Wilhelmus M. M. Kessels

  • Passivating Contacts for Crystalline Silicon Solar Cells: From Concepts and Materials to Prospects

    Jimmy Melskens;Bas W. H. van de Loo;Bart Macco;Lachlan E. Black

  • Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma

    Hindrik Willem de Vries;Mauritius Cornelius Maria van de Sanden;Mariadriana Creatore;Wilhelmus Mathijs Marie Kessels

  • Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

    J A van Delft;D Garcia-Alonso;W M M Kessels

  • Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges

    V. Zardetto;B.L. Williams;A. Perrotta;F. Di Giacomo

  • Growth of AI2O3 thin films for photovoltaic applications

    Blasco Nicolas;Dingemans Gijs;Kessels Wilhelmus Mathijs Marie;Lachaud Christophe

  • Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

    Alfredo Mameli;Marc J M Merkx;Bora Karasulu;Fred Roozeboom

  • Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma.

    Harm C. M. Knoops;Eline M. J. Braeken;Koen de Peuter;Stephen E. Potts

  • Supported Core/Shell Bimetallic Nanoparticles Synthesis by Atomic Layer Deposition

    Matthieu J. Weber;Adriaan J. M. Mackus;Marcel A. Verheijen;Marcel A. Verheijen;Cees van der Marel

  • Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

    SE Stephen Potts;HB Harald Profijt;R Robin Roelofs;Wmm Erwin Kessels

  • Influence of Oxygen Exposure on the Nucleation of Platinum Atomic Layer Deposition: Consequences for Film Growth, Nanopatterning, and Nanoparticle Synthesis

    Adriaan J. M. Mackus;Marcel A. Verheijen;Marcel A. Verheijen;Noémi Leick;Ageeth A. Bol

  • Plasma atomic layer deposition

    Harm C. M. Knoops;Koen de Peuter;Wilhelmus M. M. Kessels

  • Catalytic combustion and dehydrogenation reactions during atomic layer deposition of platinum

    Adriaan J. M. Mackus;Noémi Leick;Layton Baker;Wilhelmus M. M. Kessels

  • Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells.

    Yinghuan Kuang;Valerio Zardetto;Roderick van Gils;Saurabh Karwal

  • Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells

    Dibyashree Koushik;Marko Jošt;A. Dučinskas;Claire Burgess

  • History of atomic layer deposition and its relationship with the American Vacuum Society

    Gregory N. Parsons;Jeffrey W. Elam;Steven M. George;Suvi Haukka

  • Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation.

    Adriaan J M Mackus;Matthieu J Weber;Nick F W Thissen;Diana Garcia-Alonso

  • Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology.

    Akhil Sharma;Marcel A. Verheijen;Marcel A. Verheijen;Longfei Wu;Saurabh Karwal

  • Area-selective atomic layer deposition of metal oxides on noble metals through catalytic oxygen activation

    Joseph A. Singh;Nick F. W. Thissen;Woo-Hee Kim;Hannah Johnson

  • Energy-enhanced atomic layer deposition for more process and precursor versatility

    SE Stephen Potts;Wmm Erwin Kessels

  • Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.

    Tahsin Faraz;Harm C. M. Knoops;Harm C. M. Knoops;Marcel A. Verheijen;Marcel A. Verheijen;Cristian A. A. van Helvoirt

Frequent Co-Authors

Marcel A. Verheijen
Marcel A. Verheijen Eindhoven University of Technology
Mariadriana Creatore
Mariadriana Creatore Eindhoven University of Technology
Fred Roozeboom
Fred Roozeboom University of Twente
Ageeth A. Bol
Ageeth A. Bol University of Michigan–Ann Arbor
Bram Hoex
Bram Hoex University of New South Wales
Ruud E. I. Schropp
Ruud E. I. Schropp Jinan University
Jan P. Hofmann
Jan P. Hofmann Eindhoven University of Technology
Andrea Fiore
Andrea Fiore Eindhoven University of Technology
Andreas Tünnermann
Andreas Tünnermann Friedrich Schiller University Jena

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