World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
61
Citations
11475
World Ranking
2094
National Ranking
48

Wilhelmus M. M. Kessels publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Wilhelmus M. M. Kessels sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 319 publications — 79th percentile

79% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Wilhelmus M. M. Kessels D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Wilhelmus M. M. Kessels sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 61 D-Index — 80th percentile

80% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Wilhelmus M. M. Kessels is affiliated with Eindhoven University of Technology in the Netherlands and has an extensive publication record in engineering and materials science. Their research spans key subfields including electrical and electronic engineering, materials chemistry, atomic and molecular physics and optics, biomedical engineering, and electronic, optical, and magnetic materials.

The scientist's work primarily focuses on semiconductor materials and devices, as well as electronic and structural properties of oxides. Additional thematic areas include 2D materials and their applications, ZnO doping and properties, silicon and solar cell technologies, thin-film transistor technologies, and ferroelectric and negative capacitance devices.

Key recent papers authored include:

  • Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation, 2021, ACS Catalysis
  • Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers, 2020, ACS Materials Letters
  • On the hydrogenation of Poly-Si passivating contacts by Al2O3 and SiN thin films, 2020, Solar Energy Materials and Solar Cells
  • Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications, 2020, Nanotechnology
  • Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity, 2020, Chemistry of Materials

Frequent coauthors in their collaborative research efforts include Marcel A. Verheijen, Adriaan J. M. Mackus, Bart Macco, Ageeth A. Bol, and Harm C. M. Knoops.

The scientist's research has been published frequently in:

  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • The Journal of Physical Chemistry C
  • Applied Physics Letters
  • ACS Applied Nano Materials
  • Solar Energy Materials and Solar Cells

Best Publications

  • Flexible perovskite photovoltaic modules and cells rased on atomic layer deposited compact layers and UV-irradiated TiO2 scaffolds on plastic substrates

    Francesco Di Giacomo;Valerio Zardetto;Alessandra D'Epifanio;Sara Pescetelli

  • From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity.

    Adriaan J. M. Mackus;Marc J. M. Merkx;Wilhelmus M. M. Kessels

  • Passivating Contacts for Crystalline Silicon Solar Cells: From Concepts and Materials to Prospects

    Jimmy Melskens;Bas W. H. van de Loo;Bart Macco;Lachlan E. Black

  • Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma

    Hindrik Willem de Vries;Mauritius Cornelius Maria van de Sanden;Mariadriana Creatore;Wilhelmus Mathijs Marie Kessels

  • Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing

    J A van Delft;D Garcia-Alonso;W M M Kessels

  • Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges

    V. Zardetto;B.L. Williams;A. Perrotta;F. Di Giacomo

  • Growth of AI2O3 thin films for photovoltaic applications

    Blasco Nicolas;Dingemans Gijs;Kessels Wilhelmus Mathijs Marie;Lachaud Christophe

  • Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

    Alfredo Mameli;Marc J M Merkx;Bora Karasulu;Fred Roozeboom

  • Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma.

    Harm C. M. Knoops;Eline M. J. Braeken;Koen de Peuter;Stephen E. Potts

  • Supported Core/Shell Bimetallic Nanoparticles Synthesis by Atomic Layer Deposition

    Matthieu J. Weber;Adriaan J. M. Mackus;Marcel A. Verheijen;Marcel A. Verheijen;Cees van der Marel

  • Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

    SE Stephen Potts;HB Harald Profijt;R Robin Roelofs;Wmm Erwin Kessels

  • Influence of Oxygen Exposure on the Nucleation of Platinum Atomic Layer Deposition: Consequences for Film Growth, Nanopatterning, and Nanoparticle Synthesis

    Adriaan J. M. Mackus;Marcel A. Verheijen;Marcel A. Verheijen;Noémi Leick;Ageeth A. Bol

  • Plasma atomic layer deposition

    Harm C. M. Knoops;Koen de Peuter;Wilhelmus M. M. Kessels

  • Catalytic combustion and dehydrogenation reactions during atomic layer deposition of platinum

    Adriaan J. M. Mackus;Noémi Leick;Layton Baker;Wilhelmus M. M. Kessels

  • Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells.

    Yinghuan Kuang;Valerio Zardetto;Roderick van Gils;Saurabh Karwal

  • Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells

    Dibyashree Koushik;Marko Jošt;A. Dučinskas;Claire Burgess

  • History of atomic layer deposition and its relationship with the American Vacuum Society

    Gregory N. Parsons;Jeffrey W. Elam;Steven M. George;Suvi Haukka

  • Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation.

    Adriaan J M Mackus;Matthieu J Weber;Nick F W Thissen;Diana Garcia-Alonso

  • Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology.

    Akhil Sharma;Marcel A. Verheijen;Marcel A. Verheijen;Longfei Wu;Saurabh Karwal

  • Area-selective atomic layer deposition of metal oxides on noble metals through catalytic oxygen activation

    Joseph A. Singh;Nick F. W. Thissen;Woo-Hee Kim;Hannah Johnson

  • Energy-enhanced atomic layer deposition for more process and precursor versatility

    SE Stephen Potts;Wmm Erwin Kessels

  • Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.

    Tahsin Faraz;Harm C. M. Knoops;Harm C. M. Knoops;Marcel A. Verheijen;Marcel A. Verheijen;Cristian A. A. van Helvoirt

Frequent Co-Authors

Marcel A. Verheijen
Marcel A. Verheijen Eindhoven University of Technology
Mariadriana Creatore
Mariadriana Creatore Eindhoven University of Technology
Fred Roozeboom
Fred Roozeboom University of Twente
Ageeth A. Bol
Ageeth A. Bol University of Michigan–Ann Arbor
Bram Hoex
Bram Hoex University of New South Wales
Ruud E. I. Schropp
Ruud E. I. Schropp Jinan University
Jan P. Hofmann
Jan P. Hofmann Eindhoven University of Technology
Andrea Fiore
Andrea Fiore Eindhoven University of Technology
Andreas Tünnermann
Andreas Tünnermann Friedrich Schiller University Jena

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