D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 66 Citations 16,251 424 World Ranking 3105 National Ranking 36

Overview

What is he best known for?

The fields of study he is best known for:

  • Ion
  • Hydrogen
  • Semiconductor

Van de Mcm Richard Sanden mostly deals with Atomic layer deposition, Analytical chemistry, Passivation, Silicon and Thin film. His Atomic layer deposition research is multidisciplinary, incorporating elements of Inorganic chemistry, Substrate, Tin and Deposition. His study looks at the intersection of Substrate and topics like Remote plasma with Miniaturization.

His biological study focuses on Infrared spectroscopy. His studies in Passivation integrate themes in fields like Optoelectronics, Annealing, Crystalline silicon and Thermal stability. His Silicon study incorporates themes from Hydrogen, Amorphous silicon and Dielectric.

His most cited work include:

  • Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3 (570 citations)
  • Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges (478 citations)
  • On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3 (418 citations)

What are the main themes of his work throughout his whole career to date?

The scientist’s investigation covers issues in Analytical chemistry, Silicon, Thin film, Optoelectronics and Atomic physics. His study in Analytical chemistry is interdisciplinary in nature, drawing from both Amorphous solid, Hydrogen, Substrate and Atomic layer deposition. Van de Mcm Richard Sanden interconnects Inorganic chemistry, Nucleation, Tin and Remote plasma in the investigation of issues within Atomic layer deposition.

His research in Silicon intersects with topics in Chemical vapor deposition, Silane, Amorphous silicon, Nanocrystalline silicon and Infrared spectroscopy. The Optoelectronics study combines topics in areas such as Layer, Passivation and Thermal. His Atomic physics research incorporates elements of Ion, Electron density and Emission spectrum.

He most often published in these fields:

  • Analytical chemistry (43.06%)
  • Silicon (20.82%)
  • Thin film (20.41%)

What were the highlights of his more recent work (between 2006-2017)?

  • Analytical chemistry (43.06%)
  • Atomic layer deposition (13.67%)
  • Thin film (20.41%)

In recent papers he was focusing on the following fields of study:

His scientific interests lie mostly in Analytical chemistry, Atomic layer deposition, Thin film, Optoelectronics and Silicon. Van de Mcm Richard Sanden has researched Analytical chemistry in several fields, including Ellipsometry, Chemical vapor deposition, Dielectric and Nucleation. His Atomic layer deposition research incorporates themes from Inorganic chemistry, Passivation, Tin, Substrate and Remote plasma.

The study incorporates disciplines such as Amorphous solid, Hydrogen, Ion and Deposition in addition to Thin film. His biological study spans a wide range of topics, including Layer, Nanocrystalline silicon and Graphene. His work investigates the relationship between Silicon and topics such as Amorphous silicon that intersect with problems in Chemical physics.

Between 2006 and 2017, his most popular works were:

  • Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges (478 citations)
  • On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3 (418 citations)
  • Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3 (370 citations)

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

HB Harald Profijt;SE Stephen Potts;van de Mcm Richard Sanden;Wmm Erwin Kessels.
Journal of Vacuum Science and Technology (2011)

888 Citations

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

B Bram Hoex;Sbs Stephan Heil;E Erik Langereis;van de Mcm Richard Sanden.
Applied Physics Letters (2006)

860 Citations

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

B Bram Hoex;Jjh Joost Gielis;van de Mcm Richard Sanden;Wmm Erwin Kessels.
Journal of Applied Physics (2008)

682 Citations

Silicon surface passivation by atomic layer deposited Al2O3

B Bram Hoex;J Jeroen Schmidt;P Pohl;van de Mcm Richard Sanden.
Journal of Applied Physics (2008)

564 Citations

Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3

J Jeroen Schmidt;A Merkle;R Brendel;B Bram Hoex.
Progress in Photovoltaics (2008)

559 Citations

Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3

B Bram Hoex;J Jeroen Schmidt;R Bock;PP Altermatt.
Applied Physics Letters (2007)

540 Citations

X-Ray photoelectron spectroscopy reference data for identification of the C3N4 phase in carbon–nitrogen films

AP Dementjev;de A Ariël Graaf;van de Mcm Richard Sanden;KI Maslakov.
Diamond and Related Materials (2000)

472 Citations

Determining the material structure of microcrystalline silicon from Raman spectra

C Chiel Smit;van Racmm René Swaaij;H Donker;Amhn Petit.
Journal of Applied Physics (2003)

419 Citations

Optical constants of graphene measured by spectroscopic ellipsometry

JW Jan-Willem Weber;VE Calado;van de Mcm Richard Sanden.
Applied Physics Letters (2010)

416 Citations

In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

E Erik Langereis;Sbs Stephan Heil;Hcm Harm Knoops;W Wytze Keuning.
Journal of Physics D (2009)

366 Citations

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Best Scientists Citing van de Mcm Richard Sanden

Wilhelmus M. M. Kessels

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Eindhoven University of Technology

Publications: 116

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University of Antwerp

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Marcel A. Verheijen

Marcel A. Verheijen

Eindhoven University of Technology

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Miro Zeman

Miro Zeman

Delft University of Technology

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Wmm Erwin Kessels

Wmm Erwin Kessels

Eindhoven University of Technology

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Christophe Detavernier

Christophe Detavernier

Ghent University

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Christophe Ballif

Christophe Ballif

École Polytechnique Fédérale de Lausanne

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Armin G. Aberle

Armin G. Aberle

National University of Singapore

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Fred Roozeboom

Fred Roozeboom

Eindhoven University of Technology

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Rolf Brendel

Rolf Brendel

University of Hannover

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Stefan W. Glunz

Stefan W. Glunz

Fraunhofer Institute for Solar Energy Systems

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Martin Hermle

Martin Hermle

Fraunhofer Institute for Solar Energy Systems

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Mikko Ritala

Mikko Ritala

University of Helsinki

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Markku Leskelä

Markku Leskelä

University of Helsinki

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Michio Kondo

Michio Kondo

Waseda University

Publications: 31

Andres Cuevas

Andres Cuevas

Australian National University

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