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Materials Science

D-Index
73
Citations
19460
World Ranking
3849
National Ranking
51

Overview

van de Mcm Richard Sanden is affiliated with Eindhoven University of Technology in the Netherlands. Their research spans multiple domains primarily within engineering and materials science, with a strong focus on plasma science and catalysis.

Their recent publications reflect active engagement in various aspects of plasma technology and catalytic materials. Notable papers include:

  • The 2022 Plasma Roadmap: low temperature plasma science and technology (2022, Journal of Physics D Applied Physics)
  • Plasma Activated Electrochemical Ammonia Synthesis from Nitrogen and Water (2020, ACS Energy Letters)
  • Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation (2021, ACS Catalysis)
  • Observation and rationalization of nitrogen oxidation enabled only by coupled plasma and catalyst (2022, Nature Communications)
  • CO2 Conversion in Nonuniform Discharges: Disentangling Dissociation and Recombination Mechanisms (2020, The Journal of Physical Chemistry C)

The researcher has collaborated frequently with several co-authors, including Mihalis N. Tsampas, F J J Peeters, S. Welzel, W.A. Bongers, and Alex van de Steeg.

Their work has been published in venues where they have multiple contributions, such as:

  • Zenodo (CERN European Organization for Nuclear Research)
  • Plasma Sources Science and Technology
  • Journal of Physics D Applied Physics
  • ECS Meeting Abstracts
  • SSRN Electronic Journal

The main fields of study span engineering and materials science, with subfields that include materials chemistry, electrical and electronic engineering, radiology, nuclear medicine and imaging, renewable energy, sustainability and the environment, and catalysis.

Core topics of their research encompass:

  • Plasma Applications and Diagnostics
  • Plasma Diagnostics and Applications
  • Catalytic Processes in Materials Science
  • Advancements in Solid Oxide Fuel Cells
  • Ammonia Synthesis and Nitrogen Reduction
  • Electrocatalysts for Energy Conversion
  • Catalysts for Methane Reforming

Best Publications

  • Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

    HB Harald Profijt;SE Stephen Potts;van de Mcm Richard Sanden;Wmm Erwin Kessels

  • Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

    B Bram Hoex;Sbs Stephan Heil;E Erik Langereis;van de Mcm Richard Sanden

  • On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

    B Bram Hoex;Jjh Joost Gielis;van de Mcm Richard Sanden;Wmm Erwin Kessels

  • Silicon surface passivation by atomic layer deposited Al2O3

    B Bram Hoex;J Jeroen Schmidt;P Pohl;van de Mcm Richard Sanden

  • Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3

    J Jeroen Schmidt;A Merkle;R Brendel;B Bram Hoex

  • X-Ray photoelectron spectroscopy reference data for identification of the C3N4 phase in carbon–nitrogen films

    AP Dementjev;de A Ariël Graaf;van de Mcm Richard Sanden;KI Maslakov

  • Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3

    B Bram Hoex;J Jeroen Schmidt;R Bock;PP Altermatt

  • Optical constants of graphene measured by spectroscopic ellipsometry

    JW Jan-Willem Weber;VE Calado;van de Mcm Richard Sanden

  • Determining the material structure of microcrystalline silicon from Raman spectra

    C Chiel Smit;van Racmm René Swaaij;H Donker;Amhn Petit

  • In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

    E Erik Langereis;Sbs Stephan Heil;Hcm Harm Knoops;W Wytze Keuning

  • Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor

    van Jl Hans Hemmen;Sbs Stephan Heil;JH Klootwijk;F Fred Roozeboom

  • Vacancies and voids in hydrogenated amorphous silicon

    Ahm Arno Smets;Wmm Erwin Kessels;van de Mcm Richard Sanden

  • Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

    SE Stephen Potts;W Wytze Keuning;E Erik Langereis;G Gijs Dingemans

  • Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD

    G Gijs Dingemans;van de Mcm Richard Sanden;Wmm Erwin Kessels

  • Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

    G Gijs Dingemans;R Seguin;P Engelhart;van de Mcm Richard Sanden

  • Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

    G Gijs Dingemans;W Beyer;van de Mcm Richard Sanden;Wmm Erwin Kessels

  • Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

    Ajm Adrie Mackus;Sbs Stephan Heil;E Erik Langereis;Hcm Harm Knoops

  • Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

    Hcm Harm Knoops;E Erik Langereis;van de Mcm Richard Sanden;Wmm Erwin Kessels

  • Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3

    G Gijs Dingemans;NM Nick Terlinden;D Pierreux;HB Harald Profijt

  • Negative charge and charging dynamics in Al2O3 films on Si characterized by second-harmonic generation

    Jjh Joost Gielis;B Bram Hoex;van de Mcm Richard Sanden;Wmm Erwin Kessels

Frequent Co-Authors

Wmm Erwin Kessels
Wmm Erwin Kessels Eindhoven University of Technology
Bram Hoex
Bram Hoex University of New South Wales
Fred Roozeboom
Fred Roozeboom University of Twente
Phl Peter Notten
Phl Peter Notten Eindhoven University of Technology
Bernd Rech
Bernd Rech Helmholtz-Zentrum Berlin für Materialien und Energie
Miro Zeman
Miro Zeman Delft University of Technology
Ruud E. I. Schropp
Ruud E. I. Schropp Jinan University
Jan Schmidt
Jan Schmidt University of Hannover
Eray S. Aydil
Eray S. Aydil New York University
Annemie Bogaerts
Annemie Bogaerts University of Antwerp

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