World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
57
Citations
10933
World Ranking
7997
National Ranking
102

Fred Roozeboom publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Fred Roozeboom sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 378 publications — 74th percentile

74% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Fred Roozeboom D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Fred Roozeboom sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 57 D-Index — 39th percentile

39% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Fred Roozeboom is affiliated with the University of Twente in the Netherlands and has contributed extensively to research in engineering and materials science. Their scholarship primarily focuses on electrical and electronic engineering as well as materials chemistry. Roozeboom's work spans several subfields including water science and technology, mechanics of materials, and condensed matter physics.

The scientist's research interests cover a range of topics related to semiconductor materials and devices, electronic and structural properties of oxides, and catalytic processes in materials science. Additional topics include membrane separation technologies, ZnO doping and properties, diamond and carbon-based materials research, and thin-film transistor technologies.

Roozeboom has a significant publication record that includes contributions to various academic journals and conference proceedings. Notable recent papers include:

  • "High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity," 2023, Advanced Materials
  • "Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials," 2023, Dalton Transactions
  • "Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy," 2021, The Journal of Physical Chemistry C
  • "Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2," 2024, ACS Applied Materials & Interfaces
  • "Tuning Nanopores in Tubular Ceramic Nanofiltration Membranes with Atmospheric-Pressure Atomic Layer Deposition: Prospects for Pressure-Based In-Line Monitoring of Pore Narrowing," 2024, Separations

Key frequent co-authors in their research include Alfredo Mameli, Michiel Nijboer, Alexey Y. Kovalgin, Arian Nijmeijer, and Mieke W.J. Luiten-Olieman. These collaborations have contributed to advancing studies related to atomic layer deposition and materials engineering.

Roozeboom's work has been published repeatedly in several venues, with a particular emphasis on ECS Meeting Abstracts, where they have 11 publications. Other notable venues include Atomic Layer Deposition, Advanced Materials, Dalton Transactions, and The Journal of Physical Chemistry C.

Best Publications

  • VANADIUM OXIDE MONOLAYER CATALYSTS. 3. A RAMAN SPECTROSCOPIC AND TEMPERATURE-PROGRAMMED REDUCTION STUDY OF MONOLAYER AND CRYSTAL-TYPE VANADIA ON VARIOUS SUPPORTS

    F. Roozeboom;M. C. Mittelmeijer-Hazeleger;J. A. Moulijn;J. Medema

  • Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

    Paul Poodt;David C. Cameron;Eric Dickey;Steven M. George

  • 3‐D Integrated All‐Solid‐State Rechargeable Batteries

    Phl Peter Notten;Phl Peter Notten;F Fred Roozeboom;F Fred Roozeboom;Rah Rogier Niessen;L Loïc Baggetto

  • High Energy Density All-Solid-State Batteries: A Challenging Concept Towards 3D Integration**

    L Loïc Baggetto;Rah Rogier Niessen;F Fred Roozeboom;F Fred Roozeboom;Phl Peter Notten;Phl Peter Notten

  • ENERGETICS OF SELF-INTERSTITIAL CLUSTERS IN SI

    N. E. B. Cowern;G. Mannino;P. A. Stolk;F. Roozeboom

  • High-Speed Spatial Atomic-Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation

    P. Paul Poodt;Am Adriaan Lankhorst;F. Fred Roozeboom;K. Karel Spee

  • Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor

    van Jl Hans Hemmen;Sbs Stephan Heil;JH Klootwijk;F Fred Roozeboom

  • Method and apparatus for depositing atomic layers on a substrate

    Adrianus Johannes Petrus Maria Vermeer;Freddy Roozeboom;Deelen Joop Van

  • Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

    Alfredo Mameli;Marc J M Merkx;Bora Karasulu;Fred Roozeboom

  • Ultrahigh Capacitance Density for Multiple ALD-Grown MIM Capacitor Stacks in 3-D Silicon

    J.H. Klootwijk;K.B. Jinesh;W. Dekkers;J.F. Verhoeven

  • Deposition of TiN and HfO{sub 2} in a commercial 200 mm remote plasma atomic layer deposition reactor

    Sbs Stephan Heil;van Jl Hans Hemmen;CJ Hodson;N Singh

  • Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?

    T Tahsin Faraz;F Fred Roozeboom;Hcm Harm Knoops;Wmm Erwin Kessels

  • Rapid thermal processing systems: A review with emphasis on temperature control

    Fred Roozeboom;N. Parekh

  • Ferromagnetic resonance and eddy currents in high-permeable thin films

    E. van de Riet;F. Roozeboom

  • Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition

    Sbs Stephan Heil;E Erik Langereis;F Fred Roozeboom;van de Mcm Richard Sanden

  • Spatial atomic layer deposition of zinc oxide thin films

    A Andrea Illiberi;F Fred Roozeboom;F Fred Roozeboom;P Poodt

  • Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications

    Hcm Harm Knoops;L Loïc Baggetto;E Erik Langereis;van de Mcm Richard Sanden

  • Thermally assisted reversal of exchange biasing in NiO and FeMn based systems

    P. A. A. van der Heijden;T. F. M. M. Maas;W. J. M. de Jonge;J. C. S. Kools

  • Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

    Esko Ahvenniemi;Andrew R. Akbashev;Saima Ali;Mikhael Bechelany

  • Electronic device, assembly and methods of manufacturing an electronic device

    Freddy Roozeboom;Adrianus A. J. Buijsman;Patrice Gamand;Antonius L. A. M. Kemmeren

  • Vanadium oxide monolayer catalysts. I. Preparation, characterization, and thermal stability

    Unknown

Frequent Co-Authors

Wmm Erwin Kessels
Wmm Erwin Kessels Eindhoven University of Technology
Wilhelmus M. M. Kessels
Wilhelmus M. M. Kessels Eindhoven University of Technology
Marcel A. Verheijen
Marcel A. Verheijen Eindhoven University of Technology
van de Mcm Richard Sanden
van de Mcm Richard Sanden Eindhoven University of Technology
Jeffrey W. Elam
Jeffrey W. Elam Argonne National Laboratory
Phl Peter Notten
Phl Peter Notten Eindhoven University of Technology
J. Ruud van Ommen
J. Ruud van Ommen Delft University of Technology
Robin H. A. Ras
Robin H. A. Ras Aalto University
Stacey F. Bent
Stacey F. Bent Stanford University
Pasqualina M. Sarro
Pasqualina M. Sarro Delft University of Technology

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