His scientific interests lie mostly in Analytical chemistry, Atomic layer deposition, Nanotechnology, Thin film and Capacitor. His Analytical chemistry study combines topics from a wide range of disciplines, such as Chemical vapor deposition, Crystalline silicon, Electrical resistivity and conductivity, Dielectric and Substrate. His study in Atomic layer deposition is interdisciplinary in nature, drawing from both Aluminum oxide, Tin, Passivation and Remote plasma.
He has included themes like Deposition and Silicon in his Nanotechnology study. His work deals with themes such as Flexible electronics, Condensed matter physics, Aluminium, Lithium and Electronics, which intersect with Thin film. His Capacitor research is multidisciplinary, incorporating elements of Electronic component, Optoelectronics, Trench and Capacitance.
His primary areas of investigation include Optoelectronics, Atomic layer deposition, Nanotechnology, Analytical chemistry and Silicon. His Optoelectronics study incorporates themes from Etching, Layer, Substrate and Capacitor. Atomic layer deposition is a primary field of his research addressed under Thin film.
In the field of Nanotechnology, his study on Atomic layer epitaxy overlaps with subjects such as Material physics. His work in Analytical chemistry addresses issues such as Annealing, which are connected to fields such as Crystallography. His biological study spans a wide range of topics, including Doping, Boron, Ion implantation, Integrated circuit and Electronic engineering.
His primary scientific interests are in Atomic layer deposition, Nanotechnology, Optoelectronics, Etching and Layer. Atomic layer deposition is a subfield of Thin film that Freddy Roozeboom tackles. His Nanotechnology research includes elements of Plasma, Silicon, Dielectric and Nucleation.
The various areas that he examines in his Silicon study include CMOS and Integrated circuit. Many of his studies on Optoelectronics involve topics that are commonly interrelated, such as Deposition. His Analytical chemistry research is multidisciplinary, relying on both Atom probe and Dopant.
His primary scientific interests are in Atomic layer deposition, Nanotechnology, Optoelectronics, Atmospheric pressure and Thin film. The Atomic layer deposition study combines topics in areas such as Substrate, Chemical engineering, Plasma and Analytical chemistry. His Nanotechnology research incorporates elements of Reading list and Nucleation.
In his study, Silicon and Selectivity is inextricably linked to Transparent conducting film, which falls within the broad field of Nucleation. His Optoelectronics research is multidisciplinary, incorporating perspectives in Tin, Deposition, Activation energy and Resistive random-access memory. Thin film is often connected to Transmission electron microscopy in his work.
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Vanadium oxide monolayer catalysts. 3. A Raman spectroscopic and temperature-programmed reduction study of monolayer and crystal-type vanadia on various supports
F. Roozeboom;M. C. Mittelmeijer-Hazeleger;J. A. Moulijn;J. Medema.
The Journal of Physical Chemistry (1980)
ENERGETICS OF SELF-INTERSTITIAL CLUSTERS IN SI
N. E. B. Cowern;G. Mannino;P. A. Stolk;F. Roozeboom.
Physical Review Letters (1999)
3‐D Integrated All‐Solid‐State Rechargeable Batteries
Phl Peter Notten;Phl Peter Notten;F Fred Roozeboom;F Fred Roozeboom;Rah Rogier Niessen;L Loïc Baggetto.
Advanced Materials (2007)
High Energy Density All-Solid-State Batteries: A Challenging Concept Towards 3D Integration**
L Loïc Baggetto;Rah Rogier Niessen;F Fred Roozeboom;F Fred Roozeboom;Phl Peter Notten;Phl Peter Notten.
Advanced Functional Materials (2008)
High‐Speed Spatial Atomic‐Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation
P. Paul Poodt;Am Adriaan Lankhorst;F. Fred Roozeboom;K. Karel Spee.
Advanced Materials (2010)
Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor
van Jl Hans Hemmen;Sbs Stephan Heil;JH Klootwijk;F Fred Roozeboom.
Journal of The Electrochemical Society (2007)
Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition
Paul Poodt;David C. Cameron;Eric Dickey;Steven M. George.
Journal of Vacuum Science and Technology (2012)
Method and apparatus for depositing atomic layers on a substrate
Adrianus Johannes Petrus Maria Vermeer;Freddy Roozeboom;Deelen Joop Van.
Rapid thermal processing systems: A review with emphasis on temperature control
Fred Roozeboom;N. Parekh.
Journal of Vacuum Science & Technology B (1990)
Ultrahigh Capacitance Density for Multiple ALD-Grown MIM Capacitor Stacks in 3-D Silicon
J.H. Klootwijk;K.B. Jinesh;W. Dekkers;J.F. Verhoeven.
IEEE Electron Device Letters (2008)
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