D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 113 Citations 49,596 496 World Ranking 327 National Ranking 140
Chemistry D-index 115 Citations 50,061 487 World Ranking 335 National Ranking 168

Research.com Recognitions

Awards & Achievements

1997 - Fellow of American Physical Society (APS) Citation For advancements in our understanding of gassurface energy transfer dynamics, surface kinetics and diffusion processes, environmental chemistry at gassurface interfaces, heterogeneous catalysis, and chemically controlled eptiaxy of novel thin film materials

Overview

What is he best known for?

The fields of study he is best known for:

  • Organic chemistry
  • Oxygen
  • Hydrogen

His primary scientific interests are in Atomic layer deposition, Analytical chemistry, Thin film, Chemical engineering and Layer. His work deals with themes such as Transmission electron microscopy, Coating and Electrode, which intersect with Atomic layer deposition. Steven M. George combines subjects such as Deposition, Silicon, Fourier transform infrared spectroscopy, Polymer and Desorption with his study of Analytical chemistry.

His Thin film study also includes

  • Chemical vapor deposition which intersects with area such as Torr and Inorganic chemistry,
  • Amorphous solid that connect with fields like Tungsten. The concepts of his Chemical engineering study are interwoven with issues in Dielectric spectroscopy, Cathode, Mineralogy, Lithium and Quartz crystal microbalance. Steven M. George interconnects Bifunctional, Deposition and Monomer in the investigation of issues within Layer.

His most cited work include:

  • Atomic layer deposition: an overview. (3441 citations)
  • Low-Temperature Al2O3 Atomic Layer Deposition (961 citations)
  • Surface Chemistry for Atomic Layer Growth (732 citations)

What are the main themes of his work throughout his whole career to date?

Steven M. George mainly investigates Atomic layer deposition, Analytical chemistry, Layer, Thin film and Chemical engineering. His study focuses on the intersection of Atomic layer deposition and fields such as Quartz crystal microbalance with connections in the field of X-ray reflectivity. His Analytical chemistry research includes themes of Silicon, Fourier transform infrared spectroscopy and Desorption, Thermal desorption, Adsorption.

The study incorporates disciplines such as Thermal, Deposition and Polymer in addition to Layer. His Thin film study combines topics from a wide range of disciplines, such as Amorphous solid, Substrate, Chemical vapor deposition and Tungsten. His Chemical engineering research incorporates elements of Electrolyte, Electrode, Cathode and Oxide.

He most often published in these fields:

  • Atomic layer deposition (47.88%)
  • Analytical chemistry (43.83%)
  • Layer (27.07%)

What were the highlights of his more recent work (between 2013-2021)?

  • Atomic layer deposition (47.88%)
  • Layer (27.07%)
  • Etching (7.73%)

In recent papers he was focusing on the following fields of study:

His scientific interests lie mostly in Atomic layer deposition, Layer, Etching, Chemical engineering and Analytical chemistry. Steven M. George is exploring Atomic layer deposition as part of his Thin film and Nanotechnology and Atomic layer deposition studies. As a part of the same scientific family, he mostly works in the field of Thin film, focusing on Chemical vapor deposition and, on occasion, Partial pressure and Hydrofluoric acid.

His Layer study integrates concerns from other disciplines, such as Optoelectronics, Thermal, Metal and Polymer. His Chemical engineering study incorporates themes from Porosity, Amorphous solid, Organic polymer, Cathode and Electrolyte. His Analytical chemistry study combines topics in areas such as Fourier transform infrared spectroscopy and Desorption, Quartz crystal microbalance, Adsorption.

Between 2013 and 2021, his most popular works were:

  • Reversible High‐Capacity Si Nanocomposite Anodes for Lithium‐ion Batteries Enabled by Molecular Layer Deposition (122 citations)
  • Effect of Al2O3 Coating on Stabilizing LiNi0.4Mn0.4Co0.2O2 Cathodes (108 citations)
  • Synthesis of ZnO quantum dot/graphene nanocomposites by atomic layer deposition with high lithium storage capacity (98 citations)

In his most recent research, the most cited papers focused on:

  • Organic chemistry
  • Oxygen
  • Hydrogen

His main research concerns Atomic layer deposition, Layer, Nanotechnology, Chemical engineering and Lithium. His Atomic layer deposition study is related to the wider topic of Thin film. His Nanotechnology research includes elements of Surface modification, Electrochemistry, Electrode and Lithium-ion battery.

His research in Chemical engineering intersects with topics in Electrolyte and Alkoxide. His research integrates issues of Oxide, Nanocomposite, Silicon, Amorphous solid and Anode in his study of Lithium. His Analytical chemistry research integrates issues from X-ray reflectivity, Fourier transform infrared spectroscopy, Dielectric spectroscopy, Carbon and Quartz crystal microbalance.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Atomic layer deposition: an overview.

Steven M. George.
Chemical Reviews (2010)

8466 Citations

Low-Temperature Al2O3 Atomic Layer Deposition

M. D. Groner;F. H. Fabreguette;J. W. Elam;S. M. George.
Chemistry of Materials (2004)

1598 Citations

Surface Chemistry for Atomic Layer Growth

S. M. George;and A. W. Ott;J. W. Klaus.
The Journal of Physical Chemistry (1996)

1212 Citations

Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates

M.D. Groner;J.W. Elam;F.H. Fabreguette;S.M. George.
Thin Solid Films (2002)

849 Citations

Hydrogen desorption kinetics from monohydride and dihydride species on silicon surfaces.

P. Gupta;V. L. Colvin;S. M. George.
Physical Review B (1988)

744 Citations

Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition

J. W. Elam;D. Routkevitch;P. P. Mardilovich;S. M. George.
Chemistry of Materials (2003)

684 Citations

Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

A.W. Ott;J.W. Klaus;J.M. Johnson;S.M. George.
Thin Solid Films (1997)

671 Citations

Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition

J. W. Elam;M. D. Groner;S. M. George.
Review of Scientific Instruments (2002)

670 Citations

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

A.C. Dillon;A.W. Ott;J.D. Way;S.M. George.
Surface Science (1995)

580 Citations

Ultrathin Direct Atomic Layer Deposition on Composite Electrodes for Highly Durable and Safe Li‐Ion Batteries

Yoon Seok Jung;Yoon Seok Jung;Andrew S. Cavanagh;Leah A. Riley;Sun Ho Kang.
Advanced Materials (2010)

571 Citations

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