1997 - Fellow of American Physical Society (APS) Citation For advancements in our understanding of gassurface energy transfer dynamics, surface kinetics and diffusion processes, environmental chemistry at gassurface interfaces, heterogeneous catalysis, and chemically controlled eptiaxy of novel thin film materials
His primary scientific interests are in Atomic layer deposition, Analytical chemistry, Thin film, Chemical engineering and Layer. His work deals with themes such as Transmission electron microscopy, Coating and Electrode, which intersect with Atomic layer deposition. Steven M. George combines subjects such as Deposition, Silicon, Fourier transform infrared spectroscopy, Polymer and Desorption with his study of Analytical chemistry.
His Thin film study also includes
Steven M. George mainly investigates Atomic layer deposition, Analytical chemistry, Layer, Thin film and Chemical engineering. His study focuses on the intersection of Atomic layer deposition and fields such as Quartz crystal microbalance with connections in the field of X-ray reflectivity. His Analytical chemistry research includes themes of Silicon, Fourier transform infrared spectroscopy and Desorption, Thermal desorption, Adsorption.
The study incorporates disciplines such as Thermal, Deposition and Polymer in addition to Layer. His Thin film study combines topics from a wide range of disciplines, such as Amorphous solid, Substrate, Chemical vapor deposition and Tungsten. His Chemical engineering research incorporates elements of Electrolyte, Electrode, Cathode and Oxide.
His scientific interests lie mostly in Atomic layer deposition, Layer, Etching, Chemical engineering and Analytical chemistry. Steven M. George is exploring Atomic layer deposition as part of his Thin film and Nanotechnology and Atomic layer deposition studies. As a part of the same scientific family, he mostly works in the field of Thin film, focusing on Chemical vapor deposition and, on occasion, Partial pressure and Hydrofluoric acid.
His Layer study integrates concerns from other disciplines, such as Optoelectronics, Thermal, Metal and Polymer. His Chemical engineering study incorporates themes from Porosity, Amorphous solid, Organic polymer, Cathode and Electrolyte. His Analytical chemistry study combines topics in areas such as Fourier transform infrared spectroscopy and Desorption, Quartz crystal microbalance, Adsorption.
His main research concerns Atomic layer deposition, Layer, Nanotechnology, Chemical engineering and Lithium. His Atomic layer deposition study is related to the wider topic of Thin film. His Nanotechnology research includes elements of Surface modification, Electrochemistry, Electrode and Lithium-ion battery.
His research in Chemical engineering intersects with topics in Electrolyte and Alkoxide. His research integrates issues of Oxide, Nanocomposite, Silicon, Amorphous solid and Anode in his study of Lithium. His Analytical chemistry research integrates issues from X-ray reflectivity, Fourier transform infrared spectroscopy, Dielectric spectroscopy, Carbon and Quartz crystal microbalance.
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Atomic layer deposition: an overview.
Steven M. George.
Chemical Reviews (2010)
Low-Temperature Al2O3 Atomic Layer Deposition
M. D. Groner;F. H. Fabreguette;J. W. Elam;S. M. George.
Chemistry of Materials (2004)
Surface Chemistry for Atomic Layer Growth
S. M. George;and A. W. Ott;J. W. Klaus.
The Journal of Physical Chemistry (1996)
Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates
M.D. Groner;J.W. Elam;F.H. Fabreguette;S.M. George.
Thin Solid Films (2002)
Hydrogen desorption kinetics from monohydride and dihydride species on silicon surfaces.
P. Gupta;V. L. Colvin;S. M. George.
Physical Review B (1988)
Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition
J. W. Elam;D. Routkevitch;P. P. Mardilovich;S. M. George.
Chemistry of Materials (2003)
Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry
A.W. Ott;J.W. Klaus;J.M. Johnson;S.M. George.
Thin Solid Films (1997)
Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
J. W. Elam;M. D. Groner;S. M. George.
Review of Scientific Instruments (2002)
Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence
A.C. Dillon;A.W. Ott;J.D. Way;S.M. George.
Surface Science (1995)
Ultrathin Direct Atomic Layer Deposition on Composite Electrodes for Highly Durable and Safe Li‐Ion Batteries
Yoon Seok Jung;Yoon Seok Jung;Andrew S. Cavanagh;Leah A. Riley;Sun Ho Kang.
Advanced Materials (2010)
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