D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 61 Citations 11,051 264 World Ranking 3115 National Ranking 939

Overview

What is he best known for?

The fields of study he is best known for:

  • Organic chemistry
  • Oxygen
  • Hydrogen

Gregory N. Parsons mostly deals with Atomic layer deposition, Nanotechnology, Chemical engineering, Silicon and Thin film. His biological study spans a wide range of topics, including Inorganic chemistry, Coating, Polypropylene and Polymer. The Nanotechnology study combines topics in areas such as Aluminum oxide and Mesoporous material.

The concepts of his Silicon study are interwoven with issues in Analytical chemistry, X-ray photoelectron spectroscopy, Amorphous solid, Amorphous silicon and Dielectric. Gregory N. Parsons combines subjects such as Silane and Annealing with his study of Analytical chemistry. His studies in Thin film integrate themes in fields like Electronics, Deposition, Metal-organic framework and Nanostructure.

His most cited work include:

  • Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition (235 citations)
  • Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100) (185 citations)
  • Physical and electrical characterization of ultrathin yttrium silicate insulators on silicon (182 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of investigation include Atomic layer deposition, Thin film, Chemical engineering, Analytical chemistry and Nanotechnology. His Atomic layer deposition research incorporates themes from Fiber, Oxide, Coating and Polymer. His Oxide study combines topics from a wide range of disciplines, such as Inorganic chemistry and Metal.

His work in Thin film tackles topics such as Optoelectronics which are related to areas like Thin-film transistor. Gregory N. Parsons interconnects Organic chemistry and Polymer chemistry in the investigation of issues within Chemical engineering. His Analytical chemistry study incorporates themes from Plasma-enhanced chemical vapor deposition, Chemical vapor deposition, Silicon, Silane and Substrate.

He most often published in these fields:

  • Atomic layer deposition (44.37%)
  • Thin film (28.62%)
  • Chemical engineering (27.33%)

What were the highlights of his more recent work (between 2013-2021)?

  • Atomic layer deposition (44.37%)
  • Chemical engineering (27.33%)
  • Nanotechnology (21.54%)

In recent papers he was focusing on the following fields of study:

Gregory N. Parsons mainly focuses on Atomic layer deposition, Chemical engineering, Nanotechnology, Thin film and Layer. The Atomic layer deposition study combines topics in areas such as Oxide, Nucleation, Polymer, Metal-organic framework and Coating. Gregory N. Parsons has included themes like Porosity, Sorbent and Copper in his Chemical engineering study.

His work deals with themes such as Dye-sensitized solar cell, Platinum and Shell, which intersect with Nanotechnology. He focuses mostly in the field of Thin film, narrowing it down to topics relating to Analytical chemistry and, in certain cases, Crystal. His studies in Layer integrate themes in fields like Optoelectronics and Deposition.

Between 2013 and 2021, his most popular works were:

  • Facile Conversion of Hydroxy Double Salts to Metal–Organic Frameworks Using Metal Oxide Particles and Atomic Layer Deposition Thin-Film Templates (91 citations)
  • Ultra-Fast Degradation of Chemical Warfare Agents Using MOF-Nanofiber Kebabs. (76 citations)
  • Atomic Layer Deposition of TiO2 on Mesoporous nanoITO: Conductive Core–Shell Photoanodes for Dye-Sensitized Solar Cells (63 citations)

In his most recent research, the most cited papers focused on:

  • Organic chemistry
  • Oxygen
  • Hydrogen

The scientist’s investigation covers issues in Atomic layer deposition, Thin film, Nanotechnology, Chemical engineering and Metal-organic framework. His Atomic layer deposition research incorporates themes from Oxide, Nucleation, Inorganic chemistry, Polymer and Shell. He has researched Thin film in several fields, including Layer, Substrate and Adsorption.

His Substrate study integrates concerns from other disciplines, such as Amorphous solid, Thermal conductivity, Chemical vapor deposition and Silicon. His Nanotechnology study combines topics in areas such as Dye-sensitized solar cell, Pseudocapacitance and Porous medium. His Chemical engineering research includes themes of Waste management, Coating, Hydrogen and Methane.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Paul Poodt;David C. Cameron;Eric Dickey;Steven M. George.
Journal of Vacuum Science and Technology (2012)

277 Citations

Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)

T.M. Klein;D. Niu;W.S. Epling;W. Li.
Applied Physics Letters (1999)

276 Citations

Low hydrogen content stoichiometric silicon nitride films deposited by plasma‐enhanced chemical vapor deposition

G. N. Parsons;J. H. Souk;J. Batey.
Journal of Applied Physics (1991)

240 Citations

Physical and electrical characterization of ultrathin yttrium silicate insulators on silicon

J. J. Chambers;G. N. Parsons.
Journal of Applied Physics (2001)

229 Citations

Atomic layer deposition on electrospun polymer fibers as a direct route to AL2O3 microtubes with precise wall thickness control.

Qing Peng;Xiao-Yu Sun;Joseph C. Spagnola;G. Kevin Hyde.
Nano Letters (2007)

205 Citations

Three-dimensional self-assembled photonic crystals with high temperature stability for thermal emission modification

Kevin A. Arpin;Mark D. Losego;Andrew N. Cloud;Hailong Ning.
Nature Communications (2013)

205 Citations

Stability of low-temperature amorphous silicon thin film transistors formed on glass and transparent plastic substrates

C.-S. Yang;L. L. Smith;C. B. Arthur;G. N. Parsons.
Journal of Vacuum Science & Technology B (2000)

202 Citations

Progress and future directions for atomic layer deposition and ALD-based chemistry

Gregory N. Parsons;Steven M. George;Mato Knez.
Mrs Bulletin (2011)

187 Citations

“Zincone” Zinc Oxide−Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition

Qing Peng;Bo Gong;Ryan M. VanGundy;Gregory N. Parsons.
Chemistry of Materials (2009)

182 Citations

High dielectric constant metal silicates formed by controlled metal-surface reactions

Gregory N. Parsons;James J. Chambers;M. Jason Kelly.
(2001)

176 Citations

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