Gregory N. Parsons mostly deals with Atomic layer deposition, Nanotechnology, Chemical engineering, Silicon and Thin film. His biological study spans a wide range of topics, including Inorganic chemistry, Coating, Polypropylene and Polymer. The Nanotechnology study combines topics in areas such as Aluminum oxide and Mesoporous material.
The concepts of his Silicon study are interwoven with issues in Analytical chemistry, X-ray photoelectron spectroscopy, Amorphous solid, Amorphous silicon and Dielectric. Gregory N. Parsons combines subjects such as Silane and Annealing with his study of Analytical chemistry. His studies in Thin film integrate themes in fields like Electronics, Deposition, Metal-organic framework and Nanostructure.
His primary areas of investigation include Atomic layer deposition, Thin film, Chemical engineering, Analytical chemistry and Nanotechnology. His Atomic layer deposition research incorporates themes from Fiber, Oxide, Coating and Polymer. His Oxide study combines topics from a wide range of disciplines, such as Inorganic chemistry and Metal.
His work in Thin film tackles topics such as Optoelectronics which are related to areas like Thin-film transistor. Gregory N. Parsons interconnects Organic chemistry and Polymer chemistry in the investigation of issues within Chemical engineering. His Analytical chemistry study incorporates themes from Plasma-enhanced chemical vapor deposition, Chemical vapor deposition, Silicon, Silane and Substrate.
Gregory N. Parsons mainly focuses on Atomic layer deposition, Chemical engineering, Nanotechnology, Thin film and Layer. The Atomic layer deposition study combines topics in areas such as Oxide, Nucleation, Polymer, Metal-organic framework and Coating. Gregory N. Parsons has included themes like Porosity, Sorbent and Copper in his Chemical engineering study.
His work deals with themes such as Dye-sensitized solar cell, Platinum and Shell, which intersect with Nanotechnology. He focuses mostly in the field of Thin film, narrowing it down to topics relating to Analytical chemistry and, in certain cases, Crystal. His studies in Layer integrate themes in fields like Optoelectronics and Deposition.
The scientist’s investigation covers issues in Atomic layer deposition, Thin film, Nanotechnology, Chemical engineering and Metal-organic framework. His Atomic layer deposition research incorporates themes from Oxide, Nucleation, Inorganic chemistry, Polymer and Shell. He has researched Thin film in several fields, including Layer, Substrate and Adsorption.
His Substrate study integrates concerns from other disciplines, such as Amorphous solid, Thermal conductivity, Chemical vapor deposition and Silicon. His Nanotechnology study combines topics in areas such as Dye-sensitized solar cell, Pseudocapacitance and Porous medium. His Chemical engineering research includes themes of Waste management, Coating, Hydrogen and Methane.
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Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition
Paul Poodt;David C. Cameron;Eric Dickey;Steven M. George.
Journal of Vacuum Science and Technology (2012)
Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)
T.M. Klein;D. Niu;W.S. Epling;W. Li.
Applied Physics Letters (1999)
Low hydrogen content stoichiometric silicon nitride films deposited by plasma‐enhanced chemical vapor deposition
G. N. Parsons;J. H. Souk;J. Batey.
Journal of Applied Physics (1991)
Physical and electrical characterization of ultrathin yttrium silicate insulators on silicon
J. J. Chambers;G. N. Parsons.
Journal of Applied Physics (2001)
Atomic layer deposition on electrospun polymer fibers as a direct route to AL2O3 microtubes with precise wall thickness control.
Qing Peng;Xiao-Yu Sun;Joseph C. Spagnola;G. Kevin Hyde.
Nano Letters (2007)
Three-dimensional self-assembled photonic crystals with high temperature stability for thermal emission modification
Kevin A. Arpin;Mark D. Losego;Andrew N. Cloud;Hailong Ning.
Nature Communications (2013)
Stability of low-temperature amorphous silicon thin film transistors formed on glass and transparent plastic substrates
C.-S. Yang;L. L. Smith;C. B. Arthur;G. N. Parsons.
Journal of Vacuum Science & Technology B (2000)
Progress and future directions for atomic layer deposition and ALD-based chemistry
Gregory N. Parsons;Steven M. George;Mato Knez.
Mrs Bulletin (2011)
“Zincone” Zinc Oxide−Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition
Qing Peng;Bo Gong;Ryan M. VanGundy;Gregory N. Parsons.
Chemistry of Materials (2009)
High dielectric constant metal silicates formed by controlled metal-surface reactions
Gregory N. Parsons;James J. Chambers;M. Jason Kelly.
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