World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
78
Citations
16443
World Ranking
3046
National Ranking
847

Gregory N. Parsons publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Gregory N. Parsons sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 357 publications — 71st percentile

71% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Gregory N. Parsons D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Gregory N. Parsons sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 78 D-Index — 77th percentile

77% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Gregory N. Parsons is affiliated with North Carolina State University in the United States. Their research predominantly spans the fields of engineering and materials science, with significant focus on electrical and electronic engineering, materials chemistry, inorganic chemistry, renewable energy, sustainability, and biomedical engineering.

Their work covers a variety of main research topics, including:

  • Semiconductor materials and devices
  • Metal-Organic Frameworks: Synthesis and Applications
  • Electronic and Structural Properties of Oxides
  • MXene and MAX Phase Materials
  • Ferroelectric and Negative Capacitance Devices
  • Covalent Organic Framework Applications
  • Molecular Junctions and Nanostructures

Gregory N. Parsons has published extensively in several prominent journals. The most frequent publication venues include:

  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Chemistry of Materials
  • ACS Applied Materials & Interfaces
  • Advanced Functional Materials
  • Journal of the American Chemical Society

Among their recent papers are:

  • Area-Selective Deposition: Fundamentals, Applications, and Future Outlook, 2020, Chemistry of Materials
  • Fibre-based composites from the integration of metal-organic frameworks and polymers, 2021, Nature Reviews Materials
  • Many routes to ferroelectric HfO2: A review of current deposition methods, 2021, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films, 2020, Applied Physics Letters
  • An Advanced Dual-Function MnO2-Fabric Air Filter Combining Catalytic Oxidation of Formaldehyde and High-Efficiency Fine Particulate Matter Removal, 2020, Advanced Functional Materials

Frequent collaborators in their research include:

  • Hannah R. M. Margavio
  • Gregory W. Peterson
  • John J. Mahle
  • Carrie L. Donley
  • Rachel A. Nye

Best Publications

  • Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

    Paul Poodt;David C. Cameron;Eric Dickey;Steven M. George

  • Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

    Gregory N. Parsons;Robert D. Clark

  • Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)

    T.M. Klein;D. Niu;W.S. Epling;W. Li

  • Three-dimensional self-assembled photonic crystals with high temperature stability for thermal emission modification

    Kevin A. Arpin;Mark D. Losego;Andrew N. Cloud;Hailong Ning

  • Low hydrogen content stoichiometric silicon nitride films deposited by plasma‐enhanced chemical vapor deposition

    G. N. Parsons;J. H. Souk;J. Batey

  • Fibre-based composites from the integration of metal–organic frameworks and polymers

    Gregory W. Peterson;Gregory W. Peterson;Dennis T. Lee;Heather F. Barton;Thomas H. Epps

  • Catalytic “MOF-Cloth” Formed via Directed Supramolecular Assembly of UiO-66-NH2 Crystals on Atomic Layer Deposition-Coated Textiles for Rapid Degradation of Chemical Warfare Agent Simulants

    Dennis T. Lee;Junjie Zhao;Gregory W. Peterson;Gregory N. Parsons

  • UiO-66-NH2 Metal-Organic Framework (MOF) Nucleation on TiO2, ZnO, and Al2O3 Atomic Layer Deposition-Treated Polymer Fibers: Role of Metal Oxide on MOF Growth and Catalytic Hydrolysis of Chemical Warfare Agent Simulants.

    Dennis T. Lee;Junjie Zhao;Christopher J. Oldham;Gregory W. Peterson

  • Progress and future directions for atomic layer deposition and ALD-based chemistry

    Gregory N. Parsons;Steven M. George;Mato Knez

  • Ultra-Fast Degradation of Chemical Warfare Agents Using MOF-Nanofiber Kebabs.

    Junjie Zhao;Dennis T. Lee;Robert W. Yaga;Morgan G. Hall

  • Physical and electrical characterization of ultrathin yttrium silicate insulators on silicon

    J. J. Chambers;G. N. Parsons

  • Mechanisms and reactions during atomic layer deposition on polymers

    Gregory N. Parsons;Sarah E. Atanasov;Erinn C. Dandley;Christina K. Devine

  • Atomic layer deposition on electrospun polymer fibers as a direct route to AL2O3 microtubes with precise wall thickness control.

    Qing Peng;Xiao-Yu Sun;Joseph C. Spagnola;G. Kevin Hyde

  • “Zincone” Zinc Oxide−Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition

    Qing Peng;Bo Gong;Ryan M. VanGundy;Gregory N. Parsons

  • Facile Conversion of Hydroxy Double Salts to Metal–Organic Frameworks Using Metal Oxide Particles and Atomic Layer Deposition Thin-Film Templates

    Junjie Zhao;William T. Nunn;Paul C. Lemaire;Yiliang Lin

  • Solar water splitting in a molecular photoelectrochemical cell

    Leila Alibabaei;M. Kyle Brennaman;Michael R. Norris;Berç Kalanyan

  • Stability of low-temperature amorphous silicon thin film transistors formed on glass and transparent plastic substrates

    C.-S. Yang;L. L. Smith;C. B. Arthur;G. N. Parsons

  • Corrosion Protection of Copper Using Al2O3, TiO2, ZnO, HfO2, and ZrO2 Atomic Layer Deposition

    James S. Daubert;Grant T. Hill;Hannah N. Gotsch;Antoine P. Gremaud

  • Temperature-Dependent Subsurface Growth during Atomic Layer Deposition on Polypropylene and Cellulose Fibers

    Jesse S. Jur;Joseph C. Spagnola;Kyoungmi Lee;Bo Gong

  • Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition

    K. J. Park;J. M. Doub;T. Gougousi;G. N. Parsons

  • High dielectric constant metal silicates formed by controlled metal-surface reactions

    Gregory N. Parsons;James J. Chambers;M. Jason Kelly

Frequent Co-Authors

Gerald Lucovsky
Gerald Lucovsky North Carolina State University
Gregory W. Peterson
Gregory W. Peterson United States Army Research Laboratory
Saad A. Khan
Saad A. Khan North Carolina State University
Thomas J. Meyer
Thomas J. Meyer University of North Carolina at Chapel Hill
John J. Boland
John J. Boland Trinity College Dublin
Christopher B. Gorman
Christopher B. Gorman North Carolina State University
James C. Bonner
James C. Bonner North Carolina State University
Heinrich Kurz
Heinrich Kurz RWTH Aachen University
Robert Nemanich
Robert Nemanich Arizona State University
Kenneth Hanson
Kenneth Hanson Florida State University

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Best Scientists Citing Gregory N. Parsons

Trending Scientists

Recently Published Articles