World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
106
Citations
36978
World Ranking
824
National Ranking
279

Jeffrey W. Elam publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Jeffrey W. Elam sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 544 publications — 89th percentile

89% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Jeffrey W. Elam D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Jeffrey W. Elam sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 106 D-Index — 94th percentile

94% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Jeffrey W. Elam is affiliated with Argonne National Laboratory in the United States and has contributed extensively to research in engineering and materials science. Their work spans various topics related to semiconductor materials, battery technologies, and membrane separation processes.

The research fields of focus include:

  • Engineering
  • Materials Science

Key subfields within these domains encompass:

  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Renewable Energy, Sustainability and the Environment
  • Biomedical Engineering
  • Water Science and Technology

Frequent research topics covered by Jeffrey W. Elam are:

  • Semiconductor materials and devices
  • Electronic and Structural Properties of Oxides
  • Advancements in Battery Materials
  • Catalytic Processes in Materials Science
  • Advanced Battery Materials and Technologies
  • Membrane Separation Technologies
  • Electrochemical Analysis and Applications

Several publications illustrate their recent work:

  • Advanced strategies for the development of porous carbon as a Li host/current collector for lithium metal batteries, 2021, Energy storage materials
  • Visible-Light-Activated Photocatalytic Films toward Self-Cleaning Membranes, 2020, Advanced Functional Materials
  • Polyphenol-Sensitized Atomic Layer Deposition for Membrane Interface Hydrophilization, 2020, Advanced Functional Materials
  • Consistency and reproducibility in atomic layer deposition, 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Water treatment based on atomically engineered materials: Atomic layer deposition and beyond, 2021, Matter

Jeffrey W. Elam regularly collaborates with several researchers including:

  • Anil U. Mane
  • Rajesh Pathak
  • Vepa Rozyyev
  • Ángel Yanguas-Gil
  • Seth B. Darling

Common venues for publishing their research are:

  • ECS Meeting Abstracts
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • ACS Applied Materials & Interfaces
  • Chemistry of Materials
  • arXiv (Cornell University)

Best Publications

  • Low-Temperature Al2O3 Atomic Layer Deposition

    M. D. Groner;F. H. Fabreguette;J. W. Elam;S. M. George

  • ZnO Nanotube Based Dye-Sensitized Solar Cells

    Alex B.F. Martinson;Jeffrey W. Elam;Joseph T. Hupp;Michael J. Pellin

  • Increased Silver Activity for Direct Propylene Epoxidation via Subnanometer Size Effects

    Y. Lei;Y. Lei;Faisal Mehmood;Sungsik Lee;Jeffrey P. Greeley

  • Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates

    M.D. Groner;J.W. Elam;F.H. Fabreguette;S.M. George

  • Coking- and Sintering-Resistant Palladium Catalysts Achieved Through Atomic Layer Deposition

    Junling Lu;Baosong Fu;Mayfair C. Kung;Guomin Xiao

  • Subnanometre platinum clusters as highly active and selective catalysts for the oxidative dehydrogenation of propane.

    Stefan Vajda;Michael J. Pellin;Jeffrey P. Greeley;Christopher L. Marshall

  • Catalyst Design with Atomic Layer Deposition

    Brandon J. O'Neill;Brandon J. O'Neill;David H. K. Jackson;Jechan Lee;Christian P. Canlas

  • Membrane materials for water purification: design, development, and application

    Anna Lee;Jeffrey W. Elam;Seth B. Darling;Seth B. Darling

  • Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition

    J. W. Elam;D. Routkevitch;P. P. Mardilovich;S. M. George

  • Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition

    J. W. Elam;M. D. Groner;S. M. George

  • Ultrastable substrates for surface-enhanced Raman spectroscopy: Al2O3 overlayers fabricated by atomic layer deposition yield improved anthrax biomarker detection.

    Xiaoyu Zhang;Jing Zhao;Alyson V. Whitney;Jeffrey W. Elam

  • Structural and Electrochemical Study of Al2O3 and TiO2 Coated Li1.2Ni0.13Mn0.54Co0.13O2 Cathode Material Using ALD

    Xiaofeng Zhang;Ilias Belharouak;Li Li;Yu Lei

  • Growth of ZnO/Al2O3 Alloy Films Using Atomic Layer Deposition Techniques

    J. W. Elam;S. M. George

  • A nanostructured cathode architecture for low charge overpotential in lithium-oxygen batteries

    Jun Lu;Yu Lei;Kah Chun Lau;Xiangyi Luo

  • Localized surface plasmon resonance nanosensor: a high-resolution distance-dependence study using atomic layer deposition.

    Alyson V. Whitney;Jeffrey W. Elam;Shengli Zou;Alex V. Zinovev

  • Sequential Infiltration Synthesis for Advanced Lithography

    Seth B. Darling;Jeffrey W. Elam;Yu-Chih Tseng;Qing Peng

  • Synthesis and Stabilization of Supported Metal Catalysts by Atomic Layer Deposition

    Junling Lu;Jeffrey W. Elam;Peter C. Stair

  • ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements

    J.W. Elam;Z.A. Sechrist;S.M. George

  • Effectively suppressing dissolution of manganese from spinel lithium manganate via a nanoscale surface-doping approach

    Jun Lu;Chun Zhan;Chun Zhan;Tianpin Wu;Jianguo Wen

  • Atomic layer deposition-Sequential self-limiting surface reactions for advanced catalyst "bottom-up" synthesis

    Junling Lu;Jeffrey W. Elam;Peter C Stair;Peter C Stair

  • Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers

    Qing Peng;Yu-Chih Tseng;Seth B. Darling;Jeffrey W. Elam

Frequent Co-Authors

Michael J. Pellin
Michael J. Pellin Argonne National Laboratory
Peter C. Stair
Peter C. Stair Northwestern University
Seth B. Darling
Seth B. Darling Argonne National Laboratory
Alex B. F. Martinson
Alex B. F. Martinson Argonne National Laboratory
Christopher L. Marshall
Christopher L. Marshall Argonne National Laboratory
Junling Lu
Junling Lu University of Science and Technology of China
Stefan Vajda
Stefan Vajda Czech Academy of Sciences
Randall E. Winans
Randall E. Winans Argonne National Laboratory
Michael J. Bedzyk
Michael J. Bedzyk Northwestern University
Xiangbo Meng
Xiangbo Meng University of Arkansas at Fayetteville

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