2018 - Member of the National Academy of Engineering For the development of directed self-assembly of block copolymers as an industrially significant process for nanolithography.
2016 - Semiconductor Industry Association University Researcher Award
2008 - Fellow of American Physical Society (APS) Citation For fundamental and insightful research on the dimension dependent properties of polymer nanostructures, the directed selfassembly of block copolymers, and their application in the development of advanced lithographic materials and processes
Paul F. Nealey mainly focuses on Copolymer, Nanotechnology, Thin film, Polymer chemistry and Chemical engineering. His studies deal with areas such as Wetting, Self-assembly, Morphology, Substrate and Monte Carlo method as well as Copolymer. His Nanotechnology research includes elements of Lithography and Integrated circuit.
His Thin film study combines topics in areas such as Perpendicular, Lamellar structure, Polymer, Surface and Octadecyltrichlorosilane. His biological study spans a wide range of topics, including Methacrylate, Polystyrene, Methyl methacrylate, Styrene and Surface energy. His Chemical engineering research includes elements of Monolayer, Self-assembled monolayer and Adsorption.
The scientist’s investigation covers issues in Copolymer, Nanotechnology, Chemical engineering, Thin film and Polymer. His study in Copolymer is interdisciplinary in nature, drawing from both Self-assembly and Polymer chemistry. His Nanotechnology research incorporates themes from Nanolithography and Lithography.
His studies deal with areas such as Resist and Extreme ultraviolet lithography as well as Lithography. His Chemical engineering study integrates concerns from other disciplines, such as Electrolyte, Ionic conductivity and Surface energy. His research in Thin film intersects with topics in Wetting, Chemical physics, Lamellar structure, Phase and Substrate.
Paul F. Nealey focuses on Copolymer, Chemical engineering, Polymer, Optoelectronics and Nanotechnology. Paul F. Nealey interconnects Thin film and Lithography in the investigation of issues within Copolymer. His research integrates issues of Substrate and Composite material, Lamellar structure in his study of Thin film.
His studies in Chemical engineering integrate themes in fields like Ion, Lithium and Electrolyte, Ionic conductivity. Paul F. Nealey has researched Polymer in several fields, including Layer, Nanoscopic scale, Membrane and Liquid crystal. The study incorporates disciplines such as Resist, Electron-beam lithography, Nanolithography and Thermal in addition to Optoelectronics.
His primary areas of study are Copolymer, Chemical engineering, Nanotechnology, Polymer and Thin film. In the field of Copolymer, his study on Styrene overlaps with subjects such as Template. Paul F. Nealey has included themes like Electrolyte, Ionic conductivity and Membrane in his Chemical engineering study.
The concepts of his Nanotechnology study are interwoven with issues in Rhodamine 6G and Lithography. In his research on the topic of Polymer, Nanoporous, Methacrylate, Nanopore and Metrology is strongly related with Scanning transmission electron microscopy. His Thin film research integrates issues from Acetone, Solvent vapor, Solvent, Phase and Ketone.
This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.
Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
Sang Ouk Kim;Harun H. Solak;Mark P. Stoykovich;Nicola J. Ferrier.
Effects of synthetic micro- and nano-structured surfaces on cell behavior
R. G. Flemming;Christopher J Murphy;G. A. Abrams;S. L. Goodman.
Density multiplication and improved lithography by directed block copolymer assembly
Paul Franklin Nealey;Huiman Kang;Francois Detcheverry;Juan J. Depablo.
Directed assembly of block copolymer blends into nonregular device-oriented structures.
Mark P. Stoykovich;Marcus Müller;Sang Ouk Kim;Harun H. Solak.
Epithelial contact guidance on well-defined micro- and nanostructured substrates
Ana I. Teixeira;George A. Abrams;Paul J. Bertics;Christopher J. Murphy.
Journal of Cell Science (2003)
Dependence of the Glass Transition Temperature of Polymer Films on Interfacial Energy and Thickness
David S. Fryer;Richard D. Peters;Eui Jun Kim;Jeanne E. Tomaszewski.
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
Mark P Stoykovich;Huiman Kang;Kostas Ch Daoulas;Guoliang Liu.
ACS Nano (2007)
Block copolymers and conventional lithography
Mark P. Stoykovich;Paul F. Nealey.
Materials Today (2006)
Molecular simulation of ultrathin polymeric films near the glass transition.
J. A Torres;P. F. Nealey;J. J. de Pablo.
Physical Review Letters (2000)
Nanoscale topography of the basement membrane underlying the corneal epithelium of the rhesus macaque.
G. A. Abrams;S. L. Goodman;P. F. Nealey;M. Franco.
Cell and Tissue Research (2000)
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