World's Best Scientists 2026 revealed!
Christopher K. Ober

Christopher K. Ober

D-Index & Metrics

Materials Science

D-Index
99
Citations
42897
World Ranking
1086
National Ranking
359

Chemistry

D-Index
99
Citations
42305
World Ranking
1314
National Ranking
506

Research.com Recognitions

  • 2014 - Fellow of the American Association for the Advancement of Science (AAAS)

Overview

Christopher K. Ober is affiliated with Cornell University in the United States. Their research career focuses primarily on engineering and materials science, with significant contributions in subfields including electrical and electronic engineering, electronic, optical and magnetic materials, surfaces, coatings and films, biomedical engineering, and mechanics of materials.

The main topics in Ober's body of work include:

  • Advancements in photolithography techniques
  • Copper interconnects and reliability
  • Electron and X-ray spectroscopy techniques
  • Nanofabrication and lithography techniques
  • Metal and thin film mechanics
  • Polymer surface interaction studies
  • Muon and positron interactions and applications

Frequent publication venues where Ober's research appears cover a range of specialized scientific journals and platforms. These include:

  • IUPAC Standards Online
  • ACS Applied Materials & Interfaces
  • ACS Macro Letters
  • Journal of Photopolymer Science and Technology
  • Langmuir

Ober has collaborated repeatedly with several co-authors in the field. Frequent collaborators are:

  • Christine K. Luscombe
  • Natalie Stingelin
  • Teruaki Hayakawa
  • Richard G. Jones

The scientist's recent papers demonstrate ongoing work on photoresists and lithographic materials, including the following publications:

  • Terminology of polymers in advanced lithography (IUPAC Recommendations 2020), 2020, Pure and Applied Chemistry
  • Recent developments in photoresists for extreme-ultraviolet lithography, 2023, Polymer
  • Modular Synthesis of Phthalaldehyde Derivatives Enabling Access to Photoacid Generator-bound Self-Immolative Polymer Resists with Next-Generation Photolithographic Properties, 2022, Journal of the American Chemical Society
  • High-Performance Chain Scissionable Resists for Extreme Ultraviolet Lithography: Discovery of the Photoacid Generator Structure and Mechanism, 2022, Chemistry of Materials
  • Review of essential use of fluorochemicals in lithographic patterning and semiconductor processing, 2022, Journal of Micro/Nanopatterning Materials and Metrology

Honors awarded to Ober include being named a Fellow of the American Association for the Advancement of Science (AAAS) in 2014.

Best Publications

  • Emerging applications of stimuli-responsive polymer materials

    Martien A Cohen Stuart;Wilhelm T S Huck;Jan Genzer;Marcus Müller

  • Principles of Polymer Systems

    Ferdinand Rodriguez;Claude Cohen;Christopher K. Ober;Lynden Archer

  • Nanocomposite Materials for Optical Applications

    Laura L. Beecroft;Christopher K. Ober

  • Advances in polymers for anti-biofouling surfaces

    Sitaraman Krishnan;Craig J. Weinman;Christopher K. Ober

  • Competing Interactions and Levels of Ordering in Self-Organizing Polymeric Materials

    M. Muthukumar;C. K. Ober;E. L. Thomas

  • An efficient two-photon-generated photoacid applied to positive-tone 3D microfabrication

    Wenhui Zhou;Stephen M. Kuebler;Kevin L. Braun;Tianyue Yu

  • Self-Assembled Monolayers and Polymer Brushes in Biotechnology: Current Applications and Future Perspectives

    Wageesha Senaratne;Luisa Andruzzi;Christopher K Ober

  • Attogram detection using nanoelectromechanical oscillators

    B. Ilic;Harold G. Craighead;S. Krylov;W. Senaratne

  • Self-Assembled Smectic Phases in Rod-Coil Block Copolymers

    J. T. Chen;E. L. Thomas;C. K. Ober;G.-p. Mao

  • 50th Anniversary Perspective: Polymer Brushes: Novel Surfaces for Future Materials

    Wei-Liang Chen;Roselynn Cordero;Hai Tran;Christopher K. Ober

  • Particle size control in dispersion polymerization of polystyrene

    Kar P. Lok;Christopher K. Ober

  • Liquid Crystalline, Semifluorinated Side Group Block Copolymers with Stable Low Energy Surfaces: Synthesis, Liquid Crystalline Structure, and Critical Surface Tension

    Jianguo Wang;Guoping Mao;Christopher K. Ober;Edward J. Kramer

  • Anti-biofouling properties of comblike block copolymers with amphiphilic side chains.

    Sitaraman Krishnan;Ramakrishnan Ayothi;Alexander Hexemer;John A. Finlay

  • Comparison of the fouling release properties of hydrophobic fluorinated and hydrophilic PEGylated block copolymer surfaces: attachment strength of the diatom Navicula and the green alga Ulva.

    Sitaraman Krishnan;Nick Wang;Christopher K. Ober;John A. Finlay

  • Liquid crystal polymers with flexible spacers in the main chain

    Christopher K. Ober;Jung-Il Jin;Qifeng Zhou;Robert W. Lenz

  • Recent progress in high resolution lithography

    Daniel Bratton;Da Yang;Junyan Dai;Christopher K. Ober

  • Extreme ultraviolet resist materials for sub-7 nm patterning

    Li Li;Xuan Liu;Shyam Pal;Shulan Wang

  • Polyelectrolyte–Surfactant Complexes in the Solid State: Facile building blocks for self‐organizing materials

    Christopher K. Ober;Gerhard Wegner

  • Block copolymer patterns and templates

    Mingqi Li;Christopher K. Ober

  • Surface Segregation Studies of Fluorine-Containing Diblock Copolymers

    Dhamodharan R. Iyengar;Susanne M. Perutz;Chi-An Dai;Christopher K. Ober

  • Monodispersed, micron-sized polystyrene particles by dispersion polymerization

    Christopher K. Ober;Kar P. Lok;Michael L. Hair

Frequent Co-Authors

Emmanuel P. Giannelis
Emmanuel P. Giannelis Cornell University
Daniel A. Fischer
Daniel A. Fischer National Institute of Standards and Technology
George G. Malliaras
George G. Malliaras University of Cambridge
Hilmar Koerner
Hilmar Koerner United States Air Force Research Laboratory
John A. Finlay
John A. Finlay Newcastle University
Michael O. Thompson
Michael O. Thompson Cornell University
Edwin L. Thomas
Edwin L. Thomas Texas A&M University
Emo Chiellini
Emo Chiellini University of Pisa
Barbara Baird
Barbara Baird Cornell University
Hans-Werner Schmidt
Hans-Werner Schmidt University of Bayreuth

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