World's Best Scientists 2026 revealed!
Christopher K. Ober

Christopher K. Ober

D-Index & Metrics

Materials Science

D-Index
99
Citations
42897
World Ranking
1086
National Ranking
358

Chemistry

D-Index
99
Citations
42305
World Ranking
1314
National Ranking
505

Christopher K. Ober publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Christopher K. Ober sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 713 publications — 95th percentile

95% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Christopher K. Ober D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Christopher K. Ober sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 99 D-Index — 92nd percentile

92% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2014 - Fellow of the American Association for the Advancement of Science (AAAS)

Overview

Christopher K. Ober is affiliated with Cornell University in the United States. Their research career focuses primarily on engineering and materials science, with significant contributions in subfields including electrical and electronic engineering, electronic, optical and magnetic materials, surfaces, coatings and films, biomedical engineering, and mechanics of materials.

The main topics in Ober's body of work include:

  • Advancements in photolithography techniques
  • Copper interconnects and reliability
  • Electron and X-ray spectroscopy techniques
  • Nanofabrication and lithography techniques
  • Metal and thin film mechanics
  • Polymer surface interaction studies
  • Muon and positron interactions and applications

Frequent publication venues where Ober's research appears cover a range of specialized scientific journals and platforms. These include:

  • IUPAC Standards Online
  • ACS Applied Materials & Interfaces
  • ACS Macro Letters
  • Journal of Photopolymer Science and Technology
  • Langmuir

Ober has collaborated repeatedly with several co-authors in the field. Frequent collaborators are:

  • Christine K. Luscombe
  • Natalie Stingelin
  • Teruaki Hayakawa
  • Richard G. Jones

The scientist's recent papers demonstrate ongoing work on photoresists and lithographic materials, including the following publications:

  • Terminology of polymers in advanced lithography (IUPAC Recommendations 2020), 2020, Pure and Applied Chemistry
  • Recent developments in photoresists for extreme-ultraviolet lithography, 2023, Polymer
  • Modular Synthesis of Phthalaldehyde Derivatives Enabling Access to Photoacid Generator-bound Self-Immolative Polymer Resists with Next-Generation Photolithographic Properties, 2022, Journal of the American Chemical Society
  • High-Performance Chain Scissionable Resists for Extreme Ultraviolet Lithography: Discovery of the Photoacid Generator Structure and Mechanism, 2022, Chemistry of Materials
  • Review of essential use of fluorochemicals in lithographic patterning and semiconductor processing, 2022, Journal of Micro/Nanopatterning Materials and Metrology

Honors awarded to Ober include being named a Fellow of the American Association for the Advancement of Science (AAAS) in 2014.

Best Publications

  • Emerging applications of stimuli-responsive polymer materials

    Martien A Cohen Stuart;Wilhelm T S Huck;Jan Genzer;Marcus Müller

  • Principles of Polymer Systems

    Ferdinand Rodriguez;Claude Cohen;Christopher K. Ober;Lynden Archer

  • Nanocomposite Materials for Optical Applications

    Laura L. Beecroft;Christopher K. Ober

  • Advances in polymers for anti-biofouling surfaces

    Sitaraman Krishnan;Craig J. Weinman;Christopher K. Ober

  • Competing Interactions and Levels of Ordering in Self-Organizing Polymeric Materials

    M. Muthukumar;C. K. Ober;E. L. Thomas

  • An efficient two-photon-generated photoacid applied to positive-tone 3D microfabrication

    Wenhui Zhou;Stephen M. Kuebler;Kevin L. Braun;Tianyue Yu

  • Self-Assembled Monolayers and Polymer Brushes in Biotechnology: Current Applications and Future Perspectives

    Wageesha Senaratne;Luisa Andruzzi;Christopher K Ober

  • Attogram detection using nanoelectromechanical oscillators

    B. Ilic;Harold G. Craighead;S. Krylov;W. Senaratne

  • Self-Assembled Smectic Phases in Rod-Coil Block Copolymers

    J. T. Chen;E. L. Thomas;C. K. Ober;G.-p. Mao

  • 50th Anniversary Perspective: Polymer Brushes: Novel Surfaces for Future Materials

    Wei-Liang Chen;Roselynn Cordero;Hai Tran;Christopher K. Ober

  • Particle size control in dispersion polymerization of polystyrene

    Kar P. Lok;Christopher K. Ober

  • Liquid Crystalline, Semifluorinated Side Group Block Copolymers with Stable Low Energy Surfaces: Synthesis, Liquid Crystalline Structure, and Critical Surface Tension

    Jianguo Wang;Guoping Mao;Christopher K. Ober;Edward J. Kramer

  • Anti-biofouling properties of comblike block copolymers with amphiphilic side chains.

    Sitaraman Krishnan;Ramakrishnan Ayothi;Alexander Hexemer;John A. Finlay

  • Comparison of the fouling release properties of hydrophobic fluorinated and hydrophilic PEGylated block copolymer surfaces: attachment strength of the diatom Navicula and the green alga Ulva.

    Sitaraman Krishnan;Nick Wang;Christopher K. Ober;John A. Finlay

  • Liquid crystal polymers with flexible spacers in the main chain

    Christopher K. Ober;Jung-Il Jin;Qifeng Zhou;Robert W. Lenz

  • Recent progress in high resolution lithography

    Daniel Bratton;Da Yang;Junyan Dai;Christopher K. Ober

  • Extreme ultraviolet resist materials for sub-7 nm patterning

    Li Li;Xuan Liu;Shyam Pal;Shulan Wang

  • Polyelectrolyte–Surfactant Complexes in the Solid State: Facile building blocks for self‐organizing materials

    Christopher K. Ober;Gerhard Wegner

  • Block copolymer patterns and templates

    Mingqi Li;Christopher K. Ober

  • Surface Segregation Studies of Fluorine-Containing Diblock Copolymers

    Dhamodharan R. Iyengar;Susanne M. Perutz;Chi-An Dai;Christopher K. Ober

  • Monodispersed, micron-sized polystyrene particles by dispersion polymerization

    Christopher K. Ober;Kar P. Lok;Michael L. Hair

Frequent Co-Authors

Emmanuel P. Giannelis
Emmanuel P. Giannelis Cornell University
Daniel A. Fischer
Daniel A. Fischer National Institute of Standards and Technology
George G. Malliaras
George G. Malliaras University of Cambridge
Hilmar Koerner
Hilmar Koerner United States Air Force Research Laboratory
John A. Finlay
John A. Finlay Newcastle University
Michael O. Thompson
Michael O. Thompson Cornell University
Edwin L. Thomas
Edwin L. Thomas Texas A&M University
Emo Chiellini
Emo Chiellini University of Pisa
Barbara Baird
Barbara Baird Cornell University
Hans-Werner Schmidt
Hans-Werner Schmidt University of Bayreuth

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