What is she best known for?
The fields of study she is best known for:
- Polymer
- Nanotechnology
- Semiconductor
Her primary scientific interests are in Nanotechnology, Copolymer, Self-assembly, Lithography and Nanoscopic scale.
Her research in Nanotechnology focuses on subjects like Nanolithography, which are connected to Magnetic nanoparticles.
Joy Cheng brings together Copolymer and Orientation to produce work in her papers.
She merges Self-assembly with Template in her research.
She works mostly in the field of Lithography, limiting it down to concerns involving Photolithography and, occasionally, Spin casting, Spin coating and Photoresist.
She has included themes like Template method pattern and Fin in her Nanoscopic scale study.
Her most cited work include:
- Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up (598 citations)
- Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up (598 citations)
- Nanostructure engineering by templated self-assembly of block copolymers. (590 citations)
What are the main themes of her work throughout her whole career to date?
Joy Cheng mainly investigates Nanotechnology, Copolymer, Directed self assembly, Polymer chemistry and Lithography.
Her Nanoscopic scale and Nanostructure study in the realm of Nanotechnology connects with subjects such as Template.
Her Copolymer study integrates concerns from other disciplines, such as Self-assembly, Layer, Chemical engineering and Lamellar structure.
Her study in Self-assembly is interdisciplinary in nature, drawing from both Thin film and Polystyrene.
Her studies deal with areas such as Photoresist, Trim and Hydrogen silsesquioxane as well as Directed self assembly.
Her research on Lithography also deals with topics like
- Photolithography which intersects with area such as Spin casting,
- Wafer which is related to area like Multiple patterning.
She most often published in these fields:
- Nanotechnology (45.38%)
- Copolymer (45.38%)
- Directed self assembly (32.77%)
What were the highlights of her more recent work (between 2012-2020)?
- Nanotechnology (45.38%)
- Copolymer (45.38%)
- Directed self assembly (32.77%)
In recent papers she was focusing on the following fields of study:
Her scientific interests lie mostly in Nanotechnology, Copolymer, Directed self assembly, Layer and Lithography.
In her research, Fin is intimately related to Optoelectronics, which falls under the overarching field of Nanotechnology.
Joy Cheng interconnects Wetting, Thin film, Polymer chemistry, Polycarbonate and Surface energy in the investigation of issues within Copolymer.
Her Directed self assembly research is multidisciplinary, incorporating elements of Characterization, Trim, Hydrogen silsesquioxane and Resist.
Her Layer research includes elements of Block, Perpendicular and Lamellar structure.
Her Lithography research incorporates themes from Wafer, Computational lithography, Semiconductor and Design for manufacturability.
Between 2012 and 2020, her most popular works were:
- Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication (118 citations)
- Three-dimensional nanofabrication by block copolymer self-assembly. (111 citations)
- Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films (48 citations)
In her most recent research, the most cited papers focused on:
- Polymer
- Nanotechnology
- Semiconductor
Joy Cheng spends much of her time researching Nanotechnology, Copolymer, Layer, Directed self assembly and Lithography.
Her study in Nanotechnology concentrates on Nanoscopic scale and Nanostructure.
Her work carried out in the field of Copolymer brings together such families of science as Thin film and Polymer chemistry.
Her work focuses on many connections between Thin film and other disciplines, such as Self-assembly, that overlap with her field of interest in Semiconductor device, Nanolithography, Chemical engineering, Polycarbonate and Trimethylene carbonate.
As a part of the same scientific family, Joy Cheng mostly works in the field of Layer, focusing on Perpendicular and, on occasion, Semiconductor, Wetting, Engineering drawing and Lamellar structure.
Her Lithography study combines topics in areas such as Polymer physics, Resolution and Metrology.
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