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Materials Science

D-Index
46
Citations
9678
World Ranking
11354
National Ranking
2667

Overview

Joy Cheng is affiliated with IBM in the United States and specializes in the field of Materials Science. Their research encompasses several interdisciplinary subfields, including Materials Chemistry, Computational Theory and Mathematics, Molecular Biology, and Organic Chemistry.

Their scholarly output includes work published in highly recognized venues such as ACS Applied Polymer Materials and ACS Applied Materials & Interfaces. Two notable papers authored by Cheng include:

  • Essential Step Toward Mining Big Polymer Data: PolyName2Structure, Mapping Polymer Names to Structures (2020, ACS Applied Polymer Materials)
  • Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces (2020, ACS Applied Materials & Interfaces)

Joy Cheng's research interests cover a variety of advanced topics, such as:

  • Machine Learning in Materials Science
  • Computational Drug Discovery Methods
  • Biomedical Text Mining and Ontologies
  • Block Copolymer Self-Assembly
  • Advanced Polymer Synthesis and Characterization

Throughout their career, Cheng has frequently collaborated with several co-authors, including:

  • Daniel P. Sanders
  • Chieh Lin
  • Peihua Wang
  • Yi Hsiao
  • Yi-Tsu Chan

This collaboration network highlights an engagement with peers active in related domains, contributing to joint studies and publications. The work has predominantly concentrated on computational and experimental methods to better understand polymer materials and their behavior at molecular and larger structural scales.

Best Publications

  • Nanostructure engineering by templated self-assembly of block copolymers.

    Joy Y. Cheng;Anne M. Mayes;Caroline A. Ross

  • Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up

    Joy Y. Cheng;Joy Y. Cheng;Caroline A. Ross;Henry I. Smith;Edwin L. Thomas

  • Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

    J.Y. Cheng;C.A. Ross;V.Z.H. Chan;E.L. Thomas

  • Polymer self assembly in semiconductor microelectronics

    C. T. Black;R. Ruiz;Gregory Breyta;J. Y. Cheng

  • Fabrication of nanostructures with long-range order using block copolymer lithography

    J. Y. Cheng;C. A. Ross;E. L. Thomas;Henry I. Smith

  • Dense Self-Assembly on Sparse Chemical Patterns : Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

    Joy Y. Cheng;Charles T. Rettner;Daniel P. Sanders;Ho-Cheol Kim

  • Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography†

    Joy Y. Cheng;C.A. Ross;Edwin L. Thomas;Henry I. Smith

  • Micromagnetic behavior of electrodeposited cylinder arrays

    C. A. Ross;M. Hwang;M. Shima;J. Y. Cheng

  • Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

    Joy Y. Cheng;Daniel P. Sanders;Hoa D. Truong;Stefan Harrer

  • Methods of directed self-assembly and layered structures formed therefrom

    Daniel Paul Sanders;Joy Cheng;William Hinsberg;Ho-Cheol Kim

  • A 16nm FinFET CMOS technology for mobile SoC and computing applications

    Shien-Yang Wu;C. Y. Lin;M. C. Chiang;J. J. Liaw

  • Three-dimensional nanofabrication by block copolymer self-assembly.

    Caroline A. Ross;Karl K. Berggren;Joy Y. Cheng;Yeon Sik Jung

  • Magnetic behavior of lithographically patterned particle arrays (invited)

    C. A. Ross;S. Haratani;F. J. Castaño;Y. Hao

  • Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

    Hsinyu Tsai;Jed W. Pitera;Hiroyuki Miyazoe;Sarunya Bangsaruntip

  • A 7nm CMOS platform technology featuring 4 th generation FinFET transistors with a 0.027um 2 high density 6-T SRAM cell for mobile SoC applications

    Shien-Yang Wu;C.Y. Lin;M.C. Chiang;J.J. Liaw

  • Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

    Chris Bencher;Jeffrey Smith;Liyan Miao;Cathy Cai

  • Method of forming sub-lithographic structure utilizing polymer directional self-organization

    Joy Cheng;Yang Da;P Sanders Daniel;Lai Kafai

  • Method of forming polymer features by directed self-assembly of block copolymers

    Joy Cheng;William D. Hinsberg;Ho-cheol Kim;Charles T. Rettner

  • Self-assembled one-dimensional nanostructure arrays.

    Joy Y. Cheng;Feng Zhang;Vivian P. Chuang;and Anne M. Mayes

  • Facile postpolymerization end‐modification of RAFT polymers

    Jason M. Spruell;Benjamin A. Levy;Alexander Sutherland;William R. Dichtel

  • Polymer self assembly in semiconductor microelectronics

    C.T. Black;K.W. Guarini;R. Ruiz;E.M. Sikorski

Frequent Co-Authors

Charles T. Rettner
Charles T. Rettner IBM (United States)
Michael A. Guillorn
Michael A. Guillorn IBM (United States)
Ho-Cheol Kim
Ho-Cheol Kim IBM (United States)
Matthew E. Colburn
Matthew E. Colburn Facebook (United States)
Steven J. Holmes
Steven J. Holmes IBM (United States)
Alshakim Nelson
Alshakim Nelson University of Washington
Edwin L. Thomas
Edwin L. Thomas Texas A&M University
Jhon-Jhy Liaw
Jhon-Jhy Liaw Taiwan Semiconductor Manufacturing Company (Taiwan)

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