Matthew E. Colburn

Best Publications

• Step and flash imprint lithography: a new approach to high-resolution patterning

  Matthew Colburn;Stephen C. Johnson;Michael D. Stewart;S. Damle

  962
  Citations

• Step and flash imprint lithography

  Carlton Grant Willson;Matthew Earl Colburn

  655
  Citations

• Polymer self assembly in semiconductor microelectronics

  C. T. Black;R. Ruiz;Gregory Breyta;J. Y. Cheng

  562
  Citations

• Imprint Lithography Template Having a Feature Size Under 250 nm

  Todd C. Bailey;Byung-Jin Choi;Matthew E. Colburn;Sidlgata V. Sreenivasan

  541
  Citations

• Step and flash imprint lithography: Template surface treatment and defect analysis

  T. Bailey;B. J. Choi;M. Colburn;M. Meissl

  518
  Citations

• Method of determining alignment between substrate, and template spaced apart from the substrate at predetermined distance

  Byung Jin Choi;チョイ，ビュン・ジン;Matthew Colburn;コルバーン，マシュー

  499
  Citations

• Method of forming closed air gap interconnects and structures formed thereby

  Matthew E Colburn;Timothy J Dalton;Elbert Huang;Satya V Nitta

  368
  Citations

• Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

  Joy Y. Cheng;Daniel P. Sanders;Hoa D. Truong;Stefan Harrer

  286
  Citations

• Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

  P. Ruchhoeft;M. Colburn;B. Choi;H. Nounu

  221
  Citations

• Design of orientation stages for step and flash imprint lithography

  B.J. Choi;S.V. Sreenivasan;S. Johnson;M. Colburn

  212
  Citations

• Methods of directed self-assembly and layered structures formed therefrom

  Daniel Paul Sanders;Joy Cheng;William Hinsberg;Ho-Cheol Kim

  212
  Citations

• Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

  Hsinyu Tsai;Jed W. Pitera;Hiroyuki Miyazoe;Sarunya Bangsaruntip

  180
  Citations

• Step and flash imprint lithography for sub-100-nm patterning

  Matthew Colburn;Annette Grot;Marie N. Amistoso;Byung Jin Choi

  170
  Citations

• High-resolution overlay alignment systems for imprint lithography

  Sidlgata V. Sreenivasan;Byung J. Choi;Matthew Colburn;Todd Bailey

  164
  Citations

• A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

  R. Xie;P. Montanini;K. Akarvardar;N. Tripathi

  162
  Citations

• Sidewall image transfer process employing a cap material layer for a metal nitride layer

  John C. Arnold;Sean D. Burns;Matthew E. Colburn;David V. Horak

  161
  Citations

• Dsa grapho-epitaxy process with etch stop material

  Jassem A. Abdallah;Matthew E. Colburn;Steven J. Holmes;Daiji Kawamura

  159
  Citations

• Development and advantages of step-and-flash lithography

  M. Colburn;T. Bailey;B. J. Choi;John G Ekerdt

  155
  Citations

• Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics

  Nirupama Chakrapani;Matthew E. Colburn;Christos D. Dimitrakopoulos;Dirk Pfeiffer

  149
  Citations

• Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers

  Matthew Colburn;Itai Suez;Byung Jin Choi;Mario Meissl

  143
  Citations