World's Best Scientists 2026 revealed!
Katherine L. Saenger

Katherine L. Saenger

D-Index & Metrics

Materials Science

D-Index
52
Citations
9908
World Ranking
9562
National Ranking
2312

Katherine L. Saenger publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Katherine L. Saenger sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 209 publications — 34th percentile

34% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Katherine L. Saenger D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Katherine L. Saenger sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 52 D-Index — 27th percentile

27% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Katherine L. Saenger is a researcher affiliated with Auburn University in the United States. Their research primarily spans across the fields of Computer Science and Engineering, with a focus on subfields such as Computer Vision and Pattern Recognition, Signal Processing, Computational Mechanics, Biomedical Engineering, and Statistical and Nonlinear Physics.

Their main research topics include Music Technology and Sound Studies, Music and Audio Processing, Acoustic Wave Phenomena Research, Experimental and Theoretical Physics Studies, Neuroscience and Music Perception, Fluid Dynamics and Vibration Analysis, and Fluid Dynamics and Turbulent Flows.

Saenger has contributed to several scientific publications, with a significant number appearing in The Journal of the Acoustical Society of America and the Proceedings of Meetings on Acoustics. Frequent coauthors include N. Giordano and Jared W. Thacker.

  • A pressure-based transfer matrix method and measurement technique for studying resonances in flutes and other open-input resonators, 2020, The Journal of the Acoustical Society of America
  • Study of "half-integer" harmonics in recorder tones and some speculations about their origin, 2023, The Journal of the Acoustical Society of America
  • Study of hysteretic behavior in the recorder, 2022, Proceedings of meetings on acoustics
  • The chimney tube in musical acoustics: A textbook-level formulation for students and musicians, 2022, The Journal of the Acoustical Society of America
  • Regime-change-induced modification of jet flow in flute-like instruments with a hysteresis region, 2022, Proceedings of meetings on acoustics

Saenger's frequent coauthors are:

  • N. Giordano
  • Jared W. Thacker

Most of the researcher's work has appeared in the following venues:

  • The Journal of the Acoustical Society of America
  • Proceedings of meetings on acoustics

Their research integrates aspects of computational and physical acoustics, particularly focusing on sound production in musical instruments such as flutes and recorders, exploring resonance behavior, harmonics, fluid flow dynamics, and hysteresis effects. This combination of computer science and engineering approaches informs both theoretical models and experimental techniques in the study of musical acoustics.

Best Publications

  • Pulsed laser deposition of diamond‐like carbon films

    David L. Pappas;Katherine L. Saenger;John Bruley;William Krakow

  • Method of forming closed air gap interconnects and structures formed thereby

    Matthew E Colburn;Timothy J Dalton;Elbert Huang;Satya V Nitta

  • Vapor deposition processes for amorphous carbon films with sp3 fractions approaching diamond

    Jerome J. Cuomo;David L. Pappas;John Bruley;James P. Doyle

  • Studies of atomic oxygen in O2+CF4 rf discharges by two‐photon laser‐induced fluorescence and optical emission spectroscopy

    R. E. Walkup;K. L. Saenger;G. S. Selwyn

  • Extremely high electron mobility in Si/SiGe modulation‐doped heterostructures

    K. Ismail;M. Arafa;K. L. Saenger;J. O. Chu

  • Transferable device-containing layer for silicon-on-insulator applications

    Jack Oon Chu;Alfred Grill;Dean A. Herman;Katherine L. Saenger

  • Picosecond optical studies of amorphous diamond and diamondlike carbon: Thermal conductivity and longitudinal sound velocity

    Christopher J. Morath;Humphrey J. Maris;Jerome J. Cuomo;David L. Pappas

  • Chip interconnect wiring structure with low dielectric constant insulator and methods for fabricating the same

    Leena P. Buchwalter;Alessandro Cesare Callegari;Stephan Alan Cohen;Teresita Ordonez Graham

  • (Ba,Sr)TiO 3 dielectrics for future stacked- capacitor DRAM

    D. E. Kotecki;J. D. Baniecki;H. Shen;R. B. Laibowitz

  • Plating of noble metal electrodes for DRAM and FRAM

    Panayotis Constantinou Andricacos;James Hartfiel Comfort;Alfred Grill;David Edward Kotecki

  • Dual damascene processing for semiconductor chip interconnects

    Alfred Grill;John Patrick Hummel;Christopher Vincent Jahnes;Vishnubhai Vitthalbhai Patel

  • Fin field effect transistor devices with self-aligned source and drain regions

    Josephine Bea Chang;Michael Guillorn;Wilfried Ernst-August Haensch;Katherine Lynn Saenger

  • Planar substrate with blended orientations and its forming method

    Alexander Reznicek

  • Identification of a mobility-limiting scattering mechanism in modulation-doped Si/SiGe heterostructures.

    K. Ismail;F. K. LeGoues;K. L. Saenger;M. Arafa

  • Method of forming multilevel interconnect structure containing air gaps including utilizing both sacrificial and placeholder material

    Alfred Grill;Jeffrey Curtis Hedrick;Christopher Vincent Jahnes;Satyanarayana Venkata Nitta

  • Scalable MOS field effect transistor

    Kevin Kok Chan;Jack Oon Chu;Khalid EzzEldin Ismail;Stephen Anthony Rishton

  • Characterization of laser vaporization plasmas generated for the deposition of diamond-like carbon

    David L. Pappas;Katherine L. Saenger;Jerome J. Cuomo;Russell W. Dreyfus

  • Mixed orientation and mixed material semiconductor-on-insulator wafer

    Guy M. Cohen;Alexander Reznicek;Katherine L. Saenger;Min Yang

  • Ion implantation combined with in situ or ex situ heat treatment for improved field effect transistors

    Stephen W. Bedell;Joel P. Desouza;Zhibin Ren;Alexander Reznicek

  • Method and materials for integration of fluorine-containing low-k dielectrics

    Alfred Grill;Christopher Jahnes;Vishnubhai Patel;Katherine Saenger

Frequent Co-Authors

Alfred Grill
Alfred Grill IBM (United States)
Cyril Cabral
Cyril Cabral IBM (United States)
John A. Ott
John A. Ott IBM (United States)
Devendra K. Sadana
Devendra K. Sadana IBM (United States)
Stephen W. Bedell
Stephen W. Bedell IBM (United States)
Christopher V. Jahnes
Christopher V. Jahnes IBM (United States)
Jerome J. Cuomo
Jerome J. Cuomo North Carolina State University
Vishnubhai Vitthalbhai Patel
Vishnubhai Vitthalbhai Patel IBM (United States)
Christian Lavoie
Christian Lavoie IBM (United States)
Robert Benjamin Laibowitz
Robert Benjamin Laibowitz IBM (United States)

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