Josephine B. Chang spends much of her time researching Optoelectronics, Electrical engineering, Nanowire, Field-effect transistor and Transistor. The study incorporates disciplines such as Layer, Gate dielectric and Gate oxide in addition to Optoelectronics. The concepts of her Electrical engineering study are interwoven with issues in Parasitic capacitance and Substrate.
The various areas that Josephine B. Chang examines in her Nanowire study include Nanomesh, CMOS, Doping and Inverter. She combines subjects such as Etching and Silicon with her study of Field-effect transistor. Her work in the fields of Transistor, such as Threshold voltage and Drain-induced barrier lowering, overlaps with other areas such as Stack.
Optoelectronics, Electrical engineering, Layer, Nanowire and Field-effect transistor are her primary areas of study. Josephine B. Chang interconnects Electronic engineering, Gate dielectric and Gate oxide in the investigation of issues within Optoelectronics. Her studies deal with areas such as Substrate and Silicon as well as Electronic engineering.
Her Transistor study, which is part of a larger body of work in Electrical engineering, is frequently linked to Planar, Communication channel and Fabrication, bridging the gap between disciplines. Her Layer research incorporates elements of Gate stack and Dielectric. Her biological study deals with issues like CMOS, which deal with fields such as MOSFET.
Josephine B. Chang mainly investigates Optoelectronics, Layer, Field-effect transistor, Nanowire and Semiconductor device. Her Optoelectronics research is multidisciplinary, relying on both Thermocouple and Electronic engineering. Her Layer research incorporates themes from Graphene and Gate stack.
Her Field-effect transistor research is multidisciplinary, incorporating perspectives in RF switch, Raman spectroscopy and Second source. Her research in Nanowire intersects with topics in Nanosheet, Doping and MOSFET. Her studies in Semiconductor device integrate themes in fields like Electronics, Substrate, Semiconductor and Engineering physics.
Her scientific interests lie mostly in Layer, Field-effect transistor, Nanowire, Optoelectronics and Gate stack. Her work on Atomic layer deposition as part of general Layer research is often related to Carbon, thus linking different fields of science. Her work deals with themes such as Double gate, Lamellar structure and Void, which intersect with Field-effect transistor.
Her Nanowire study incorporates themes from Semiconductor materials and Semiconductor device. Her Optoelectronics research is multidisciplinary, incorporating elements of Substrate and Electronic engineering. Her Gate stack study combines topics from a wide range of disciplines, such as Structural engineering and Composite material.
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Fin field effect transistor devices with self-aligned source and drain regions
Josephine Bea Chang;Michael Guillorn;Wilfried Ernst-August Haensch;Katherine Lynn Saenger.
(2009)
Gate-all-around silicon nanowire 25-stage CMOS ring oscillators with diameter down to 3 nm
S. Bangsaruntip;A. Majumdar;G. M. Cohen;S. U. Engelmann.
symposium on vlsi technology (2010)
Printable polythiophene gas sensor array for low-cost electronic noses
Josephine B. Chang;Vincent Liu;Vivek Subramanian;Kevin Sivula.
Journal of Applied Physics (2006)
Improved superconducting qubit coherence using titanium nitride
Josephine B. Chang;Michael R. Vissers;Antonio D. Córcoles;Martin Sandberg.
Applied Physics Letters (2013)
Hybrid CMOS technology with nanowire devices and double gated planar devices
Sarunya Bangsaruntip;Josephine B. Chang;Leland Chang;Jeffrey W. Sleight.
(2012)
Challenges and solutions of FinFET integration in an SRAM cell and a logic circuit for 22 nm node and beyond
H. Kawasaki;V. S. Basker;T. Yamashita;C.-H. Lin.
international electron devices meeting (2009)
Field-effect transistor inverter and fabricating method thereof
Josephine Chang;Paul Chang;Guillorn Michael A;Jeffrey Sleight.
(2010)
Fabricating Method for Nanowire Mesh Device
Chang Josephine;Stephen Bedell;Chang Paul;Michael Guillorn.
(2015)
Printed electronics for low-cost electronic systems: Technology status and application development
Vivek Subramanian;Josephine B. Chang;Alejandro de la Fuente Vornbrock;Daniel C. Huang.
european solid-state circuits conference (2008)
Fin-Last Replacement Metal Gate FinFET
Josephine B. Chang;Michael A. Guillom;Wilfried Ernst-August Haensch.
(2011)
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