World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
56
Citations
9187
World Ranking
2122
National Ranking
835

Materials Science

D-Index
56
Citations
9370
World Ranking
8380
National Ranking
2056

Vijay Narayanan publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Vijay Narayanan sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 328 publications — 63rd percentile

63% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Vijay Narayanan D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Vijay Narayanan sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 56 D-Index — 71st percentile

71% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2020 - Fellow, National Academy of Inventors
  • 2014 - ACM Fellow For contributions to power estimation and optimization in the design of power-aware systems.

Overview

Vijay Narayanan is affiliated with IBM in the United States and conducts research primarily in the field of Engineering. Their work spans several subfields, including Electrical and Electronic Engineering, Materials Chemistry, and Artificial Intelligence, with additional contributions in Computer Vision and Pattern Recognition as well as Cognitive Neuroscience.

The research topics central to Narayanan's work include:

  • Advanced Memory and Neural Computing
  • Ferroelectric and Negative Capacitance Devices
  • Semiconductor Materials and Devices
  • Phase-change Materials and Chalcogenides
  • Neural Networks and Reservoir Computing
  • Machine Learning in Materials Science
  • Advancements in Semiconductor Devices and Circuit Design

Their publication record features papers in various venues, with a focus on journals such as arXiv (Cornell University), IEEE Transactions on Electron Devices, ECS Meeting Abstracts, Nature Communications, and APL Machine Learning.

Selected recent papers authored or co-authored by Narayanan include:

  • A 64-core mixed-signal in-memory compute chip based on phase-change memory for deep neural network inference, 2023, Nature Electronics
  • An analog-AI chip for energy-efficient speech recognition and transcription, 2023, Nature
  • Hardware-aware training for large-scale and diverse deep learning inference workloads using in-memory computing-based accelerators, 2023, Nature Communications
  • HERMES-Core-A 1.59-TOPS/mm2 PCM on 14-nm CMOS In-Memory Compute Core Using 300-ps/LSB Linearized CCO-Based ADCs, 2022, IEEE Journal of Solid-State Circuits
  • A Heterogeneous and Programmable Compute-In-Memory Accelerator Architecture for Analog-AI Using Dense 2-D Mesh, 2022, IEEE Transactions on Very Large Scale Integration (VLSI) Systems

Frequent collaborators in their research include Nicole Saulnier, Kevin Brew, Abu Sebastian, Malte J. Rasch, and Manuel Le Gallo.

Vijay Narayanan has received recognition for their contributions through awards such as:

  • Fellow, National Academy of Inventors, 2020
  • ACM Fellow, 2014, for contributions to power estimation and optimization in the design of power-aware systems

Best Publications

  • Advanced high-κ dielectric stacks with polySi and metal gates: recent progress and current challenges

    E. P. Gusev;V. Narayanan;M. M. Frank

  • Switching of ferroelectric polarization in epitaxial BaTiO3 films on silicon without a conducting bottom electrode

    Catherine Dubourdieu;John Bruley;Thomas M. Arruda;Agham Posadas

  • A Comparative Study of NBTI and PBTI (Charge Trapping) in SiO2/HfO2 Stacks with FUSI, TiN, Re Gates

    S. Zafar;Y.H. Kim;V. Narayanan;C. Cabral

  • Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures

    Cyril Cabral;Alessandro C. Callegari;Michael A. Gribelyuk;Paul C. Jamison

  • Oxygen vacancies in high dielectric constant oxide-semiconductor films.

    Supratik Guha;Vijay Narayanan

  • Verfahren für metall-ersetzungs-gate eines high-performance-bauelements

    An L Steegen;Victor Ku;Kwong Hon Wong;Ying Li

  • High performance 14nm SOI FinFET CMOS technology with 0.0174µm 2 embedded DRAM and 15 levels of Cu metallization

    C-H. Lin;B. Greene;S. Narasimha;J. Cai

  • High- $\kappa$ /Metal-Gate Fully Depleted SOI CMOS With Single-Silicide Schottky Source/Drain With Sub-30-nm Gate Length

    M.H. Khater;Zhen Zhang;Jin Cai;C. Lavoie

  • Structures and techniques for atomic layer deposition

    Shintaro Aoyama;Robert D. Clark;Steven P. Consiglio;Marinus Hopstaken

  • Comparative study of GaN and AlN nucleation layers and their role in growth of GaN on sapphire by metalorganic chemical vapor deposition

    K. Lorenz;M. Gonsalves;Wook Kim;V. Narayanan

  • Origins of threading dislocations in GaN epitaxial layers grown on sapphire by metalorganic chemical vapor deposition

    V. Narayanan;K. Lorenz;Wook Kim;S. Mahajan

  • Examination of flatband and threshold voltage tuning of HfO2∕TiN field effect transistors by dielectric cap layers

    S. Guha;S. Guha;V. K. Paruchuri;M. Copel;V. Narayanan

  • A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

    X. Chen;S. Samavedam;V. Narayanan;K. Stein

  • SELECTIVE IMPLEMENTATION OF BARRIER LAYERS TO ACHIEVE THRESHOLD VOLTAGE CONTROL IN CMOS DEVICE FABRICATION WITH HIGH-k DIELECTRICS

    Nestor A. Bojarczuk;Cyril Cabral;Eduard A. Cartier;Matthew W. Copel

  • Stabilization of flatband voltages and threshold voltages in hafnium oxide based silicon transistors for cmos

    Nestor A. Bojarczuk;Michael P. Chudzik;Matthew W. Copel;Supratik Guha

  • A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications

    S. Krishnan;U. Kwon;N. Moumen;M.W. Stoker

  • Role of oxygen vacancies in V/sub FB//V/sub t/ stability of pFET metals on HfO/sub 2/

    E. Cartier;F.R. McFeely;V. Narayanan;P. Jamison

  • Fundamental aspects of HfO 2 -based high-k metal gate stack reliability and implications on t inv -scaling

    E. Cartier;A. Kerber;T. Ando;M. M. Frank

  • High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processing

    M. Chudzik;B. Doris;R. Mo;J. Sleight

  • Band-Edge High-Performance High-k/Metal Gate n-MOSFETs Using Cap Layers Containing Group IIA and IIIB Elements with Gate-First Processing for 45 nm and Beyond

    V. Narayanan;V.K. Paruchuri;N.A. Bojarczuk;B.P. Linder

  • Removal of charged defects from metal oxide-gate stacks

    Eduard A. Cartier;Matthew W. Copel;Supratik Guha;Richard A. Haight

Frequent Co-Authors

Eduard A. Cartier
Eduard A. Cartier IBM (United States)
Vamsi K. Paruchuri
Vamsi K. Paruchuri IBM (United States)
Martin M. Frank
Martin M. Frank IBM (United States)
Michael P. Chudzik
Michael P. Chudzik IBM (United States)
Bruce B. Doris
Bruce B. Doris IBM (United States)
Supratik Guha
Supratik Guha Argonne National Laboratory
Matthew Copel
Matthew Copel IBM (United States)
Sufi Zafar
Sufi Zafar IBM (United States)
Cyril Cabral
Cyril Cabral IBM (United States)
James H. Stathis
James H. Stathis IBM (United States)

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

For students exploring Electronics and Electrical Engineering, diversifying skill sets is crucial. Many professionals supplement their technical knowledge with degrees in fields like instructional design, which enhances their ability to develop educational content and training programs for technical audiences.

Competency-based programs offer a flexible alternative for learners aiming to balance education with work or personal commitments. These competency based degrees and programs allow students to progress by demonstrating skills, often accelerating their path to graduation.

Military families often face unique challenges pursuing higher education. Fortunately, many online colleges for military spouses provide tailored support, including flexible schedules and financial aid options, making degree completion more accessible.

Additionally, students benefit from enrolling in institutions offering online colleges with frequent start dates, which enable quicker entry into programs without waiting for traditional semester schedules.

Exploring these educational options can open diverse career pathways, ensuring a comprehensive and flexible learning experience suited to personal and professional goals.

Best Scientists Citing Vijay Narayanan

Trending Scientists

Recently Published Articles