D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 55 Citations 8,605 349 World Ranking 4485 National Ranking 1275
Electronics and Electrical Engineering D-index 55 Citations 9,072 449 World Ranking 1368 National Ranking 624

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Electrical engineering
  • Transistor

The scientist’s investigation covers issues in Dielectric, High-κ dielectric, Optoelectronics, Analytical chemistry and Condensed matter physics. His Dielectric study incorporates themes from Threshold voltage, Electronic engineering, Quantum tunnelling and Capacitor. His studies in High-κ dielectric integrate themes in fields like Electrical measurements, Hafnium, MOSFET, Gate dielectric and Thermal ionization.

His Optoelectronics study combines topics in areas such as Transistor, Protein filament, Resistive random-access memory and Current. His study in Analytical chemistry is interdisciplinary in nature, drawing from both Chemical vapor deposition, Electron mobility, Annealing, Layer and Molecular physics. The study incorporates disciplines such as Stress, Oxide and Ionic radius in addition to Condensed matter physics.

His most cited work include:

  • Negative oxygen vacancies in HfO2 as charge traps in high-k stacks (237 citations)
  • Negative oxygen vacancies in HfO$_2$ as charge traps in high-k stacks (214 citations)
  • Spectroscopic properties of oxygen vacancies in monoclinic Hf O 2 calculated with periodic and embedded cluster density functional theory (173 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of investigation include Optoelectronics, Dielectric, High-κ dielectric, MOSFET and Gate dielectric. Gennadi Bersuker works mostly in the field of Optoelectronics, limiting it down to concerns involving Electronic engineering and, occasionally, Reliability and Resistive random-access memory. Gennadi Bersuker combines subjects such as Analytical chemistry, Oxide, Layer, Condensed matter physics and Voltage with his study of Dielectric.

His High-κ dielectric study integrates concerns from other disciplines, such as Hafnium, Dielectric strength, Time-dependent gate oxide breakdown, Transient and Gate stack. His study looks at the relationship between MOSFET and topics such as Threshold voltage, which overlap with PMOS logic. His Gate dielectric research incorporates themes from Field-effect transistor, Leakage, Equivalent oxide thickness and Atomic layer deposition.

He most often published in these fields:

  • Optoelectronics (57.34%)
  • Dielectric (39.24%)
  • High-κ dielectric (36.42%)

What were the highlights of his more recent work (between 2012-2020)?

  • Optoelectronics (57.34%)
  • Dielectric (39.24%)
  • Resistive random-access memory (7.65%)

In recent papers he was focusing on the following fields of study:

Optoelectronics, Dielectric, Resistive random-access memory, Electronic engineering and Analytical chemistry are his primary areas of study. The various areas that he examines in his Optoelectronics study include Metal gate and MOSFET. His research in Dielectric intersects with topics in Layer, Substrate, Stress and Threshold voltage.

The concepts of his Electronic engineering study are interwoven with issues in Resistive touchscreen and Reliability. Gennadi Bersuker combines subjects such as Etching, Oxide, Quantum tunnelling and Dopant with his study of Analytical chemistry. His studies in High-κ dielectric integrate themes in fields like Charge pump and Gate oxide.

Between 2012 and 2020, his most popular works were:

  • Microscopic Modeling of HfO x RRAM Operations: From Forming to Switching (69 citations)
  • An Empirical Model for RRAM Resistance in Low- and High-Resistance States (62 citations)
  • A Compact Model of Program Window in HfO x RRAM Devices for Conductive Filament Characteristics Analysis (58 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Transistor

His primary areas of study are Dielectric, Optoelectronics, Resistive random-access memory, Voltage and Electronic engineering. His Dielectric study combines topics in areas such as Threshold voltage, Stress, Quantum tunnelling and Analytical chemistry. His study in Threshold voltage is interdisciplinary in nature, drawing from both Atomic layer deposition and MOSFET.

In his research on the topic of Stress, Grain boundary is strongly related with Condensed matter physics. His Optoelectronics research includes themes of Layer, Substrate and Tin. His research in High-κ dielectric tackles topics such as Metal gate which are related to areas like Breakdown voltage.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Negative oxygen vacancies in HfO2 as charge traps in high-k stacks

J. L. Gavartin;D. Muñoz Ramo;A. L. Shluger;G. Bersuker.
Applied Physics Letters (2006)

360 Citations

Negative oxygen vacancies in HfO$_2$ as charge traps in high-k stacks

J. L. Gavartin;D. Munoz Ramo;A. L. Shluger;G. Bersuker.
arXiv: Materials Science (2006)

334 Citations

Negative oxygen vacancies in HfO$_2$ as charge traps in high-k stacks

J. L. Gavartin;D. Munoz Ramo;A. L. Shluger;G. Bersuker.
arXiv: Materials Science (2006)

334 Citations

A Physical Model of the Temperature Dependence of the Current Through $\hbox{SiO}_{2}\hbox{/}\hbox{HfO}_{2}$ Stacks

L. Vandelli;A. Padovani;L. Larcher;R. G. Southwick.
IEEE Transactions on Electron Devices (2011)

279 Citations

A Physical Model of the Temperature Dependence of the Current Through $\hbox{SiO}_{2}\hbox{/}\hbox{HfO}_{2}$ Stacks

L. Vandelli;A. Padovani;L. Larcher;R. G. Southwick.
IEEE Transactions on Electron Devices (2011)

279 Citations

Spectroscopic properties of oxygen vacancies in monoclinic Hf O 2 calculated with periodic and embedded cluster density functional theory

D. Muñoz Ramo;J. L. Gavartin;A. L. Shluger;G. Bersuker.
Physical Review B (2007)

232 Citations

Spectroscopic properties of oxygen vacancies in monoclinic Hf O 2 calculated with periodic and embedded cluster density functional theory

D. Muñoz Ramo;J. L. Gavartin;A. L. Shluger;G. Bersuker.
Physical Review B (2007)

232 Citations

Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning

P. D. Kirsch;P. Sivasubramani;J. Huang;C. D. Young.
Applied Physics Letters (2008)

199 Citations

Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning

P. D. Kirsch;P. Sivasubramani;J. Huang;C. D. Young.
Applied Physics Letters (2008)

199 Citations

The role of nitrogen-related defects in high-k dielectric oxides: Density-functional studies

J. L. Gavartin;A. L. Shluger;Adam S. Foster;G. I. Bersuker.
Journal of Applied Physics (2005)

193 Citations

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