The scientist’s investigation covers issues in Dielectric, High-κ dielectric, Optoelectronics, Analytical chemistry and Condensed matter physics. His Dielectric study incorporates themes from Threshold voltage, Electronic engineering, Quantum tunnelling and Capacitor. His studies in High-κ dielectric integrate themes in fields like Electrical measurements, Hafnium, MOSFET, Gate dielectric and Thermal ionization.
His Optoelectronics study combines topics in areas such as Transistor, Protein filament, Resistive random-access memory and Current. His study in Analytical chemistry is interdisciplinary in nature, drawing from both Chemical vapor deposition, Electron mobility, Annealing, Layer and Molecular physics. The study incorporates disciplines such as Stress, Oxide and Ionic radius in addition to Condensed matter physics.
His primary areas of investigation include Optoelectronics, Dielectric, High-κ dielectric, MOSFET and Gate dielectric. Gennadi Bersuker works mostly in the field of Optoelectronics, limiting it down to concerns involving Electronic engineering and, occasionally, Reliability and Resistive random-access memory. Gennadi Bersuker combines subjects such as Analytical chemistry, Oxide, Layer, Condensed matter physics and Voltage with his study of Dielectric.
His High-κ dielectric study integrates concerns from other disciplines, such as Hafnium, Dielectric strength, Time-dependent gate oxide breakdown, Transient and Gate stack. His study looks at the relationship between MOSFET and topics such as Threshold voltage, which overlap with PMOS logic. His Gate dielectric research incorporates themes from Field-effect transistor, Leakage, Equivalent oxide thickness and Atomic layer deposition.
Optoelectronics, Dielectric, Resistive random-access memory, Electronic engineering and Analytical chemistry are his primary areas of study. The various areas that he examines in his Optoelectronics study include Metal gate and MOSFET. His research in Dielectric intersects with topics in Layer, Substrate, Stress and Threshold voltage.
The concepts of his Electronic engineering study are interwoven with issues in Resistive touchscreen and Reliability. Gennadi Bersuker combines subjects such as Etching, Oxide, Quantum tunnelling and Dopant with his study of Analytical chemistry. His studies in High-κ dielectric integrate themes in fields like Charge pump and Gate oxide.
His primary areas of study are Dielectric, Optoelectronics, Resistive random-access memory, Voltage and Electronic engineering. His Dielectric study combines topics in areas such as Threshold voltage, Stress, Quantum tunnelling and Analytical chemistry. His study in Threshold voltage is interdisciplinary in nature, drawing from both Atomic layer deposition and MOSFET.
In his research on the topic of Stress, Grain boundary is strongly related with Condensed matter physics. His Optoelectronics research includes themes of Layer, Substrate and Tin. His research in High-κ dielectric tackles topics such as Metal gate which are related to areas like Breakdown voltage.
This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.
Negative oxygen vacancies in HfO2 as charge traps in high-k stacks
J. L. Gavartin;D. Muñoz Ramo;A. L. Shluger;G. Bersuker.
Applied Physics Letters (2006)
Negative oxygen vacancies in HfO$_2$ as charge traps in high-k stacks
J. L. Gavartin;D. Munoz Ramo;A. L. Shluger;G. Bersuker.
arXiv: Materials Science (2006)
Negative oxygen vacancies in HfO$_2$ as charge traps in high-k stacks
J. L. Gavartin;D. Munoz Ramo;A. L. Shluger;G. Bersuker.
arXiv: Materials Science (2006)
A Physical Model of the Temperature Dependence of the Current Through $\hbox{SiO}_{2}\hbox{/}\hbox{HfO}_{2}$ Stacks
L. Vandelli;A. Padovani;L. Larcher;R. G. Southwick.
IEEE Transactions on Electron Devices (2011)
A Physical Model of the Temperature Dependence of the Current Through $\hbox{SiO}_{2}\hbox{/}\hbox{HfO}_{2}$ Stacks
L. Vandelli;A. Padovani;L. Larcher;R. G. Southwick.
IEEE Transactions on Electron Devices (2011)
Spectroscopic properties of oxygen vacancies in monoclinic Hf O 2 calculated with periodic and embedded cluster density functional theory
D. Muñoz Ramo;J. L. Gavartin;A. L. Shluger;G. Bersuker.
Physical Review B (2007)
Spectroscopic properties of oxygen vacancies in monoclinic Hf O 2 calculated with periodic and embedded cluster density functional theory
D. Muñoz Ramo;J. L. Gavartin;A. L. Shluger;G. Bersuker.
Physical Review B (2007)
Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning
P. D. Kirsch;P. Sivasubramani;J. Huang;C. D. Young.
Applied Physics Letters (2008)
Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning
P. D. Kirsch;P. Sivasubramani;J. Huang;C. D. Young.
Applied Physics Letters (2008)
The role of nitrogen-related defects in high-k dielectric oxides: Density-functional studies
J. L. Gavartin;A. L. Shluger;Adam S. Foster;G. I. Bersuker.
Journal of Applied Physics (2005)
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