The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Alexander L. Shluger sits on this spectrum.
This scientist: 493 publications — 86th percentile
86% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Alexander L. Shluger sits on this spectrum.
This scientist: 76 D-Index — 75th percentile
75% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Alexander L. Shluger is affiliated with University College London in the United Kingdom. Their research primarily focuses on materials science and engineering, with significant contributions to materials chemistry, electrical and electronic engineering, and related subfields.
Their publications cover several core topics including semiconductor materials and devices, microstructure and mechanical properties, electronic and structural properties of oxides, advanced photocatalysis techniques, advanced memory and neural computing, 2D materials and applications, and ferroelectric and negative capacitance devices.
Frequent publication venues for Shluger's work include Physical Review B, The Journal of Physical Chemistry C, Physical Review Materials, arXiv (Cornell University), and ECS Meeting Abstracts.
The scientist has collaborated frequently with a range of co-authors including Jack Strand, Vasileios Fotopoulos, Luca Larcher, David Mora-Fonz, and Thomas R. Durrant.
Some recent papers authored or co-authored by Shluger are:
Alexander L. Shluger has been recognized as a Fellow of the American Physical Society in 2011. The citation for this award mentioned contributions to the theory of local excited states and atomic forces at insulating surfaces.
Adam S. Foster;F. Lopez Gejo;Alexander L. Shluger;Risto M. Nieminen
Mario Lanza;H.-S. Philip Wong;Eric Pop;Daniele Ielmini
Werner A. Hofer;Adam S. Foster;Alexander L. Shluger
G. Bersuker;D. C. Gilmer;D. Veksler;P. Kirsch
J. L. Gavartin;D. Muñoz Ramo;A. L. Shluger;G. Bersuker
Adam S. Foster;V. B. Sulimov;F. Lopez Gejo;A. L. Shluger
Peter V. Sushko;Peter V. Sushko;Alexander L. Shluger;C.Richard A. Catlow
J. L. Gavartin;D. Munoz Ramo;A. L. Shluger;G. Bersuker
T Nomura;S W Kim;Y Kamihara;M Hirano
A M Stoneham;J Gavartin;A L Shluger;A V Kimmel
Zhongchang Wang;Mitsuhiro Saito;Keith P. McKenna;Keith P. McKenna;Lin Gu
D. Muñoz Ramo;J. L. Gavartin;A. L. Shluger;G. Bersuker
Clemens Barth;Adam S. Foster;Adam S. Foster;Claude R. Henry;Alexander L. Shluger;Alexander L. Shluger
R. Bennewitz;A. S. Foster;L. N. Kantorovich;M. Bammerlin
E. V. Stefanovich;E. V. Stefanovich;A. L. Shluger;A. L. Shluger;C. R. A. Catlow
Keith McKenna;Alexander Shluger
E. Stefanovich;E. Shidlovskaya;A. Shluger;M. Zakharov
A L Shluger;A M Stoneham
Peter V. Sushko;Alexander L. Shluger;Katsuro Hayashi;Masahiro Hirano
J. L. Gavartin;A. L. Shluger;Adam S. Foster;G. I. Bersuker
Alexander L. Shluger;Peter V. Sushko;Peter V. Sushko;Lev N. Kantorovich
Adam S. Foster;A. L. Shluger;Risto M. Nieminen
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