World's Best Scientists 2026 revealed!
Ben Kaczer

Ben Kaczer

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
65
Citations
17007
World Ranking
1208
National Ranking
28

Materials Science

D-Index
65
Citations
17163
World Ranking
5568
National Ranking
53

Ben Kaczer publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Ben Kaczer sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 672 publications — 93rd percentile

93% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Ben Kaczer D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Ben Kaczer sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 65 D-Index — 83rd percentile

83% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Ben Kaczer is affiliated with Imec in Belgium and has contributed extensively to the field of engineering, particularly within electrical and electronic engineering. Their research primarily focuses on semiconductor materials and devices, with specific interest in advancements in semiconductor devices and circuit design, integrated circuits and semiconductor failure analysis, and ferroelectric and negative capacitance devices.

Their scientific work spans various subfields including materials chemistry, atomic and molecular physics, optics, electronic, optical and magnetic materials, and artificial intelligence. These diverse interests highlight a multidisciplinary approach to research centered on semiconductor technologies and related physical phenomena.

Ben Kaczer's frequent co-authors include J. Franco, Alexander Grill, E. Bury, R. Degraeve, and Stanislav Tyaginov.

The scientist has published numerous papers over the years, with selected recent publications including:

  • Understanding and modelling the PBTI reliability of thin-film IGZO transistors, 2021, 2021 IEEE International Electron Devices Meeting (IEDM)
  • Perspective of 2D Integrated Electronic Circuits: Scientific Pipe Dream or Disruptive Technology?, 2022, Advanced Materials
  • Investigation of Imprint in FE-HfO₂ and Its Recovery, 2020, IEEE Transactions on Electron Devices
  • Understanding the Excess 1/f Noise in MOSFETs at Cryogenic Temperatures, 2023, IEEE Transactions on Electron Devices
  • Defect profiling in FEFET Si:HfO2 layers, 2020, Applied Physics Letters

Ben Kaczer has frequently published in the following venues:

  • IEEE Transactions on Electron Devices
  • 2022 IEEE International Reliability Physics Symposium (IRPS)
  • Solid-State Electronics
  • IEEE Electron Device Letters
  • Micromachines

The main research topics addressed by Ben Kaczer include:

  • Semiconductor materials and devices
  • Advancements in Semiconductor Devices and Circuit Design
  • Integrated Circuits and Semiconductor Failure Analysis
  • Ferroelectric and Negative Capacitance Devices
  • Advanced Memory and Neural Computing
  • Silicon Carbide Semiconductor Technologies
  • Quantum and electron transport phenomena

This body of work demonstrates a sustained engagement with both fundamental and applied aspects of semiconductor technology, highlighting key areas such as device reliability, noise phenomena at cryogenic temperatures, and new circuit integration concepts. Their publications contribute to a broad understanding of electronic device performance and material behavior within advanced semiconductor processes.

Best Publications

  • The Paradigm Shift in Understanding the Bias Temperature Instability: From Reaction–Diffusion to Switching Oxide Traps

    T. Grasser;B. Kaczer;W. Goes;H. Reisinger

  • Origin of NBTI variability in deeply scaled pFETs

    B. Kaczer;T. Grasser;Ph. J. Roussel;J. Franco

  • The time dependent defect spectroscopy (TDDS) for the characterization of the bias temperature instability

    T. Grasser;H. Reisinger;P.-J. Wagner;F. Schanovsky

  • High-k dielectrics for future generation memory devices (Invited Paper)

    J. A. Kittl;K. Opsomer;M. Popovici;N. Menou

  • Ubiquitous relaxation in BTI stressing—New evaluation and insights

    B. Kaczer;T. Grasser;P.J. Roussel;J. Martin-Martinez

  • A two-stage model for negative bias temperature instability

    T. Grasser;B. Kaczer;W. Goes;Th. Aichinger

  • Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability

    B. Kaczer;R. Degraeve;G. Groeseneken;M. Rasras

  • Consistent model for short-channel nMOSFET after hard gate oxide breakdown

    B. Kaczer;R. Degraeve;A. De Keersgieter;K. Van de Mieroop

  • Degradation and breakdown in thin oxide layers: mechanisms, models and reliability prediction

    Robin Degraeve;Ben Kaczer;Guido Groeseneken

  • Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification

    B. Kaczer;V. Arkhipov;R. Degraeve;N. Collaert

  • Analytic modeling of the bias temperature instability using capture/emission time maps

    T. Grasser;P.-J. Wagner;H. Reisinger;Th. Aichinger

  • The Universality of NBTI Relaxation and its Implications for Modeling and Characterization

    T. Grasser;W. Gos;V. Sverdlov;B. Kaczer

  • Comphy — A compact-physics framework for unified modeling of BTI

    Gerhard Rzepa;Jacopo Franco;Barry J. O'Sullivan;A. Subirats

  • Time-dependent defect spectroscopy for characterization of border traps in metal-oxide-semiconductor transistors

    Tibor Grasser;Hans Reisinger;Paul-Jürgen Wagner;Ben Kaczer

  • Emerging yield and reliability challenges in nanometer CMOS technologies

    G. Gielen;P. De Wit;E. Maricau;J. Loeckx

  • Atomistic approach to variability of bias-temperature instability in circuit simulations

    B. Kaczer;S. Mahato;V. Valduga de Almeida Camargo;M. Toledano-Luque

  • AC NBTI studied in the 1 Hz -- 2 GHz range on dedicated on-chip CMOS circuits

    R. Fernandez;B. Kaczer;A. Nackaerts;S. Demuynck

  • Simultaneous Extraction of Recoverable and Permanent Components Contributing to Bias-Temperature Instability

    T. Grasser;B. Kaczer;P. Hehenberger;W. Gos

  • High performance Ge pMOS devices using a Si-compatible process flow

    P. Zimmerman;G. Nicholas;B. De Jaeger;B. Kaczer

  • Switching oxide traps as the missing link between negative bias temperature instability and random telegraph noise

    T. Grasser;H. Reisinger;W. Goes;Th. Aichinger

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