World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
48
Citations
9110
World Ranking
3077
National Ranking
54

Aaron Thean publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Aaron Thean sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 474 publications — 82nd percentile

82% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Aaron Thean D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Aaron Thean sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 48 D-Index — 56th percentile

56% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Aaron Thean is affiliated with the National University of Singapore and specializes in engineering, with a focus on electrical and electronic engineering. Their research spans several interconnected fields, including biomedical engineering, materials chemistry, artificial intelligence, and cellular and molecular neuroscience.

Thean's primary research topics include semiconductor materials and devices, advanced memory and neural computing, ferroelectric and negative capacitance devices, advanced sensor and energy harvesting materials, photonic and optical devices, advancements in semiconductor devices and circuit design, and thin-film transistor technologies.

Thean has published extensively, including notable papers such as:

  • "Technology Roadmap for Flexible Sensors" (2023) published in ACS Nano
  • "Low Subthreshold Swing and High Mobility Amorphous Indium-Gallium-Zinc-Oxide Thin-Film Transistor With Thin HfO2 Gate Dielectric and Excellent Uniformity" (2020) published in IEEE Electron Device Letters
  • "An Artificial Peripheral Neural System Based on Highly Stretchable and Integrated Multifunctional Sensors" (2021) published in Advanced Functional Materials
  • "A Wireless Multi-Channel Capacitive Sensor System for Efficient Glove-Based Gesture Recognition With AI at the Edge" (2020) published in IEEE Transactions on Circuits & Systems II Express Briefs
  • "Reconfigurable nonlinear photonic activation function for photonic neural network based on non-volatile opto-resistive RAM switch" (2022) published in Light Science & Applications

Thean frequently collaborates with other researchers, including Jieming Pan, Evgeny Zamburg, Yida Li, Baoshan Tang, and Sonu Hooda. These collaborations have contributed to a substantial number of joint publications across multiple venues.

Thean's work appears regularly in a number of scientific journals and conferences. Frequent publication venues include:

  • IEEE Transactions on Electron Devices
  • ACS Nano
  • 2022 International Electron Devices Meeting (IEDM)
  • IEEE Journal of Solid-State Circuits
  • IEEE Transactions on Neural Networks and Learning Systems

Best Publications

  • Vertical GAAFETs for the Ultimate CMOS Scaling

    Dmitry Yakimets;Geert Eneman;Pieter Schuddinck;Trong Huynh Bao

  • Gate-all-around MOSFETs based on vertically stacked horizontal Si nanowires in a replacement metal gate process on bulk Si substrates

    H. Mertens;R. Ritzenthaler;A. Hikavyy;M. S. Kim

  • A Fully Printed Flexible MoS 2 Memristive Artificial Synapse with Femtojoule Switching Energy

    Xuewei Feng;Yida Li;Lin Wang;Shuai Chen

  • Fabrication and Analysis of a ${ m Si}/{ m Si}_{0.55}{ m Ge}_{0.45}$ Heterojunction Line Tunnel FET

    Amey M. Walke;Anne Vandooren;Rita Rooyackers;Daniele Leonelli

  • All WSe2 1T1R resistive RAM cell for future monolithic 3D embedded memory integration.

    Maheswari Sivan;Yida Li;Hasita Veluri;Yunshan Zhao

  • Self-powered glove-based intuitive interface for diversified control applications in real/cyber space

    Tianyiyi He;Zhongda Sun;Qiongfeng Shi;Minglu Zhu

  • Understanding Energy Efficiency Benefits of Carbon Nanotube Field-Effect Transistors for Digital VLSI

    Gage Hills;Marie Garcia Bardon;Gerben Doornbos;Dmitry Yakimets

  • CMOS Vertical Multiple Independent Gate Field Effect Transistor (MIGFET)

    L. Mathew;Y. Du;A.V.-Y. Thean;M. Sadd

  • A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

    X. Chen;S. Samavedam;V. Narayanan;K. Stein

  • Impact of Wire Geometry on Interconnect RC and Circuit Delay

    Ivan Ciofi;Antonino Contino;Philippe J. Roussel;Rogier Baert

  • Heteroepitaxy of InP on Si(001) by selective-area metal organic vapor-phase epitaxy in sub-50 nm width trenches: The role of the nucleation layer and the recess engineering

    Clement Merckling;Niamh Waldron;Sijia Jiang;W Guo

  • InGaAs Gate-All-Around Nanowire Devices on 300mm Si Substrates

    Niamh Waldron;Clement Merckling;Lieve Teugels;Patrick Ong

  • Low-Frequency Noise Analysis and Modeling in Vertical Tunnel FETs With Ge Source

    Felipe S. Neves;Paula G. D. Agopian;Joao Antonio Martino;Bogdan Cretu

  • An InGaAs/InP quantum well finfet using the replacement fin process integrated in an RMG flow on 300mm Si substrates

    N. Waldron;C. Merckling;W. Guo;P. Ong

  • Self-heating on bulk FinFET from 14nm down to 7nm node

    D. Jang;E. Bury;R. Ritzenthaler;M. Garcia Bardon

  • Polarity control in WSe2 double-gate transistors

    Giovanni V. Resta;Surajit Sutar;Surajit Sutar;Yashwanth Balaji;Dennis Lin

  • Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

    A. Delabie;M. Caymax;B. Groven;M. Heyne

  • Controlled Sulfurization Process for the Synthesis of Large Area MoS2 Films and MoS2/WS2 Heterostructures

    Daniele Chiappe;Inge Asselberghs;Surajit Sutar;Serena Iacovo

  • An Artificial Peripheral Neural System Based on Highly Stretchable and Integrated Multifunctional Sensors

    Xinqin Liao;Xinqin Liao;Weitao Song;Xiangyu Zhang;Haoran Jin

  • Low Subthreshold Swing and High Mobility Amorphous Indium–Gallium–Zinc-Oxide Thin-Film Transistor With Thin HfO 2 Gate Dielectric and Excellent Uniformity

    Subhranu Samanta;Umesh Chand;Shengqiang Xu;Kaizhen Han

  • Multiring Circular Transmission Line Model for Ultralow Contact Resistivity Extraction

    Hao Yu;Marc Schaekers;Tom Schram;Erik Rosseel

  • 32nm general purpose bulk CMOS technology for high performance applications at low voltage

    F. Arnaud;J. Liu;Y.M. Lee;K.Y. Lim

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Related Online Degrees & Career Pathways

For those interested in expanding their expertise beyond traditional Electronics and Electrical Engineering, several complementary online degree options can enhance career prospects. A bachelor of project management online offers essential skills in coordinating complex engineering projects, making graduates invaluable in multidisciplinary teams.

Many working professionals opt for online degree programs for working adults. These programs provide the flexibility to balance work and studies, allowing engineers to upskill without pausing their careers.

For those interested in educational technology, pursuing an instructional design masters online can open pathways into training and development roles within tech industries, helping to design effective learning for engineering teams.

Finally, competency based masters emphasize practical skills and mastery over coursework duration, ideal for engineers seeking targeted, career-relevant education tailored to their pace and experience.

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