World's Best Scientists 2026 revealed!
Geert Eneman

Geert Eneman

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
40
Citations
6286
World Ranking
4517
National Ranking
97

Overview

Geert Eneman is affiliated with Imec in Belgium and has a significant publication record in engineering, with a specialized focus on electrical and electronic engineering. Their research spans various subfields, including biomedical engineering, atomic and molecular physics and optics, mechanics of materials, and condensed matter physics.

The main topics covered in Geert Eneman's work include:

  • Semiconductor materials and devices
  • Advancements in semiconductor devices and circuit design
  • Silicon carbide semiconductor technologies
  • Nanowire synthesis and applications
  • Ferroelectric and negative capacitance devices
  • Integrated circuits and semiconductor failure analysis
  • Semiconductor quantum structures and devices

Geert Eneman has contributed numerous papers in respected publication venues. Frequent venues of publication include:

  • IEEE Transactions on Electron Devices (7 publications)
  • ECS Meeting Abstracts (6 publications)
  • ECS Transactions (5 publications)
  • ECS Journal of Solid State Science and Technology (2 publications)
  • 2022 IEEE International Reliability Physics Symposium (IRPS) (2 publications)

Among recent papers authored or co-authored by Geert Eneman are:

  • Comparison of Electrical Performance of Co-Integrated Forksheets and Nanosheets Transistors for the 2nm Technological Node and Beyond, 2021, 2021 IEEE International Electron Devices Meeting (IEDM)
  • Monte Carlo Comparison of n-Type and p-Type Nanosheets With FinFETs: Effect of the Number of Sheets, 2020, IEEE Transactions on Electron Devices
  • (Invited) Stress Simulations of Fins, Wires, and Nanosheets, 2020, ECS Transactions
  • Gate-Induced-Drain-Leakage (GIDL) in CMOS Enhanced by Mechanical Stress, 2022, IEEE Transactions on Electron Devices
  • Stress in Silicon-Germanium Nanowires: Layout Dependence and Imperfect Source/Drain Epitaxial Stressors, 2021, IEEE Transactions on Electron Devices

Frequent co-authors in their research collaborations include Naoto Horiguchi, A. Veloso, Philippe Matagne, A. De Keersgieter, and Eddy Simoen.

Best Publications

  • Germanium MOSFET Devices: Advances in Materials Understanding, Process Development, and Electrical Performance

    D. P. Brunco;B. De Jaeger;G. Eneman;J. Mitard

  • Device Exploration of NanoSheet Transistors for Sub-7-nm Technology Node

    Doyoung Jang;Dmitry Yakimets;Geert Eneman;Pieter Schuddinck

  • Vertical GAAFETs for the Ultimate CMOS Scaling

    Dmitry Yakimets;Geert Eneman;Pieter Schuddinck;Trong Huynh Bao

  • Characterization of GeSn materials for future Ge pMOSFETs source/drain stressors

    B. Vincent;Y. Shimura;S. Takeuchi;T. Nishimura

  • Record I ON /I OFF performance for 65nm Ge pMOSFET and novel Si passivation scheme for improved EOT scalability

    J. Mitard;B. De Jaeger;F.E. Leys;G. Hellings

  • Electrical TCAD Simulations of a Germanium pMOSFET Technology

    Geert Hellings;Geert Eneman;Raymond Krom;B De Jaeger

  • High-Performance Deep Submicron Ge pMOSFETs With Halo Implants

    G. Nicholas;B. De Jaeger;D.P. Brunco;P. Zimmerman

  • Vertically stacked gate-all-around Si nanowire transistors: Key Process Optimizations and Ring Oscillator Demonstration

    H. Mertens;R. Ritzenthaler;V. Pena;G. Santoro

  • Impact of Donor Concentration, Electric Field, and Temperature Effects on the Leakage Current in Germanium p $+/$ n Junctions

    G. Eneman;M. Wiot;A. Brugere;O.S.I. Casain

  • Challenges and opportunities in advanced Ge pMOSFETs

    E Simoen;J Mitard;Geert Hellings;Geert Eneman

  • pMOSFET with 200% mobility enhancement induced by multiple stressors

    L. Washington;F. Nouri;S. Thirupapuliyur;G. Eneman

  • Scalability of the Si/sub 1-x/Ge/sub x/ source/drain technology for the 45-nm technology node and beyond

    G. Eneman;P. Verheyen;R. Rooyackers;F. Nouri

  • Exploring the limits of stress-enhanced hole mobility

    L. Smith;V. Moroz;G. Eneman;P. Verheyen

  • Layout impact on the performance of a locally strained PMOSFET

    G. Eneman;P. Verheyen;R. Rooyackers;F. Nouri

  • Germanium for advanced CMOS anno 2009: a SWOT analysis

    M. Caymax;G. Eneman;F. Bellenger;C. Merckling

  • Advancing CMOS beyond the Si roadmap with Ge and III/V devices

    M. Heyns;A. Alian;G. Brammertz;M. Caymax

  • Strained Germanium Gate-All-Around pMOS Device Demonstration Using Selective Wire Release Etch Prior to Replacement Metal Gate Deposition

    L. Witters;H. Arimura;F. Sebaai;A. Hikavyy

  • Advancing CMOS beyond the Si roadmap with Ge and III/V devices

    Marc Heyns;Ali Reza Alian;Guy Brammertz;Matty Caymax

  • A systematic study of trade-offs in engineering a locally strained pMOSFET

    F. Nouri;P. Verheyen;L. Washington;V. Moroz

  • Scalability of Stress Induced by Contact-Etch-Stop Layers: A Simulation Study

    G. Eneman;P. Verheyen;A. De Keersgieter;M. Jurczak

  • Nanowire & nanosheet FETs for ultra-scaled, high-density logic and memory applications

    A. Veloso;T. Huynh-Bao;P. Matagne;D. Jang

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

For those interested in expanding their expertise beyond traditional studies in Electronics and Electrical Engineering, exploring accelerated online degree programs can be an efficient option. These programs cater especially to working adults who wish to advance their skills without pausing their careers.

In addition, fields such as instructional design offer complementary skills that enhance technical knowledge. Some of the best online instructional design master's programs provide affordable options for engineers looking to pivot towards educational roles or corporate training.

Competency-based education is another growing trend, focusing on mastery of practical skills over time spent in class. Many competency based universities offer flexible learning tailored to individual progress, which can be particularly beneficial for students balancing studies with professional responsibilities.

Finally, military families seeking advanced degrees will find targeted support through specially designed programs. Online colleges for military spouses provide accessible and accommodating pathways to higher education, ensuring that service-related challenges do not hinder academic and career goals.

Best Scientists Citing Geert Eneman

Trending Scientists

Recently Published Articles