D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 52 Citations 12,544 1,041 World Ranking 1564 National Ranking 701
Materials Science D-index 54 Citations 13,018 1,061 World Ranking 5882 National Ranking 1627

Research.com Recognitions

Awards & Achievements

2019 - IEEE Fellow For contributions to fully depleted Silicon-on-Insulator Complementary Metal-Oxide Semiconductor process technology

Overview

What is he best known for?

The fields of study he is best known for:

  • Optoelectronics
  • Semiconductor
  • Electrical engineering

Optoelectronics, Semiconductor device, Electrical engineering, Layer and Semiconductor are his primary areas of study. His Optoelectronics research incorporates elements of Substrate, Gate oxide, Electronic engineering and Epitaxy. Kangguo Cheng combines subjects such as Fin, High-κ dielectric, Nanowire and Substrate with his study of Semiconductor device.

His biological study deals with issues like Transistor, which deal with fields such as Etching and Air gap. His Semiconductor research is multidisciplinary, incorporating elements of Structural engineering, Doping, Dopant and Insulator. Within one scientific family, Kangguo Cheng focuses on topics pertaining to Trench under Dielectric, and may sometimes address concerns connected to Geotechnical engineering.

His most cited work include:

  • Smooth and vertical semiconductor fin structure (235 citations)
  • High-k/metal gate cmos finfet with improved pfet threshold voltage (157 citations)
  • Integrated circuit with a thin body field effect transistor and capacitor (134 citations)

What are the main themes of his work throughout his whole career to date?

Kangguo Cheng spends much of his time researching Optoelectronics, Layer, Semiconductor device, Semiconductor and Transistor. His biological study spans a wide range of topics, including Electronic engineering, Substrate, Electrical engineering and Epitaxy. His Layer study combines topics in areas such as Fin, Doping and Field-effect transistor.

His Semiconductor device research integrates issues from Nanowire, Dielectric layer, Etching, Electrical conductor and Gate stack. His work deals with themes such as Silicon on insulator, Fin and Insulator, which intersect with Semiconductor. His Transistor study incorporates themes from Nanosheet and CMOS.

He most often published in these fields:

  • Optoelectronics (87.35%)
  • Layer (36.38%)
  • Semiconductor device (30.93%)

What were the highlights of his more recent work (between 2018-2021)?

  • Optoelectronics (87.35%)
  • Transistor (26.50%)
  • Semiconductor device (30.93%)

In recent papers he was focusing on the following fields of study:

Kangguo Cheng mostly deals with Optoelectronics, Transistor, Semiconductor device, Layer and Dielectric. His research on Optoelectronics focuses in particular on Semiconductor. His studies in Transistor integrate themes in fields like Parasitic capacitance, Trench and Epitaxy.

His work carried out in the field of Semiconductor device brings together such families of science as Semiconductor materials, Second source, Dielectric layer, Silicon-germanium and Insulator. His study in Layer is interdisciplinary in nature, drawing from both Oxide and Doping. The study incorporates disciplines such as Air gap and Resistive random-access memory in addition to Dielectric.

Between 2018 and 2021, his most popular works were:

  • Exploring the Limits of Cobalt Liner Thickness in Advanced Copper Interconnects (8 citations)
  • Inner spacer formation and contact resistance reduction in nanosheet transistors (6 citations)
  • Nanosheet transistors with different gate dielectrics and workfunction metals (6 citations)

In his most recent research, the most cited papers focused on:

  • Transistor
  • Semiconductor
  • Optoelectronics

Kangguo Cheng focuses on Optoelectronics, Transistor, Semiconductor device, Layer and Dielectric. The concepts of his Optoelectronics study are interwoven with issues in Nanosheet, Substrate, Field-effect transistor, Fin and Substrate. His Transistor research includes themes of Parasitic capacitance, Semiconductor and Epitaxy.

His research integrates issues of Resistor and Electrical engineering, Insulator in his study of Semiconductor device. His Layer study integrates concerns from other disciplines, such as Semiconductor materials, Doping and Band gap. His research in Dielectric intersects with topics in Semiconductor structure, Trench, Conductive materials and Air gap.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Smooth and vertical semiconductor fin structure

Kangguo Cheng;Bruce B. Doris;Johnathan E. Faltermeier;Ying Zhang.
(2008)

363 Citations

Integrated circuit with a thin body field effect transistor and capacitor

Kangguo Cheng;Bruce Doris;Ali Khakifirooz;Ghavam G. Shahidi.
(2012)

206 Citations

Extrem-dünner-Halbleiter-auf-Isolator(ETSOI)-FET mit einem Rück-Gate und verringerter Parasitärkapazität sowie Verfahren zu dessen Herstellung

Khakifirooz Ali;Doris Bruce B;Cheng Kangguo.
(2012)

203 Citations

High-k/metal gate cmos finfet with improved pfet threshold voltage

Veeraraghavan S. Basker;Kangguo Cheng;Bruce B. Doris;Johnathan E. Faltermeier.
(2009)

203 Citations

Semiconductor fin isolation by a well trapping fin portion

Henry K. Utomo;Kangguo Cheng;Ramachandra Divakaruni;Ravikumar Ramachandran.
(2013)

180 Citations

Structure of vertical strained silicon devices

Kangguo Cheng;Dureseti Chidambarrao;Rama Divakaruni;Oleg G. Gluschenkov.
(2003)

163 Citations

Method for fabricating an integrated circuit

Bruce Doris;Ying Zhang;Kangguo Cheng.
(2010)

152 Citations

Method of forming a bottle-shaped trench by ion implantation

Kangguo Cheng;Johnathan E. Faltermeier;Carl Radens.
(2008)

151 Citations

Method of forming extremely thin semiconductor on insulator (ETSOI) device without ion implantation

Kangguo Cheng;Bruce B. Doris;Pranita Kulkarni;Ghavam Shahidi.
(2009)

128 Citations

FinFET spacer formation by oriented implantation

Veeraraghavan S. Basker;Kangguo Cheng;Bruce B. Doris;Johnathan E. Faltermeier.
(2012)

121 Citations

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