Dmitry Lubomirsky mainly investigates Optoelectronics, Substrate, Remote plasma, Analytical chemistry and Etching. His biological study spans a wide range of topics, including Layer and Electrical engineering. The various areas that he examines in his Substrate study include Deposition, Mechanical engineering, Pedestal, Plasma etching and Electroless deposition.
Dmitry Lubomirsky interconnects Capacitive sensing, Titanium oxide, Polarity, Voltage and Ground in the investigation of issues within Remote plasma. He has researched Analytical chemistry in several fields, including Passivation, Patterned substrate, Dielectric, Plasma processing and Chemical engineering. His Etching research incorporates themes from Inorganic chemistry, Wafer, Titanium nitride and Silicon oxide.
His primary scientific interests are in Substrate, Optoelectronics, Composite material, Semiconductor and Layer. His Substrate research also works with subjects such as
His work in Composite material tackles topics such as Base which are related to areas like Structural engineering and Plasma processing. His work deals with themes such as Electrical conductor, Engineering drawing and Electroless deposition, which intersect with Layer. As a part of the same scientific family, he mostly works in the field of Plating, focusing on Metallurgy and, on occasion, Chemical engineering.
His scientific interests lie mostly in Semiconductor, Optoelectronics, Substrate, Composite material and Optics. His studies in Semiconductor integrate themes in fields like Manifold, Mechanics, Flow and Dielectric. Dmitry Lubomirsky combines subjects such as Ion, Conductive materials, Radio frequency, Etching and Substrate with his study of Optoelectronics.
His Substrate research is multidisciplinary, incorporating perspectives in Chemical engineering, Plasma display, Ground and Pedestal. In general Composite material study, his work on Layer, Porosity, Ceramic and Coating often relates to the realm of Volume, thereby connecting several areas of interest. His studies deal with areas such as Dynamical control, Rotation and Plasma processing as well as Optics.
Dmitry Lubomirsky focuses on Optoelectronics, Semiconductor, Substrate, Remote plasma and Layer. Optoelectronics is often connected to Electronic engineering in his work. His research integrates issues of Mechanics, Flow and Manifold in his study of Semiconductor.
His Substrate research is multidisciplinary, relying on both Etching and Dielectric. The Remote plasma study combines topics in areas such as Inorganic chemistry, Sodium, Potassium, Rubidium and Alkaline earth metal. His Layer study combines topics from a wide range of disciplines, such as Wafer and Deposition.
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Process chamber for dielectric gapfill
Dmitry Lubomirsky;Qiwei Liang;Soonam Park;Kien N Chuc.
Semiconductor processing system and methods using capacitively coupled plasma
Jang-Gyoo Yang;Matthew L. Miller;Xinglong Chen;Kien N. Chuc.
Integrated electroless deposition system
Dmitry Lubomirsky;Arulkumar Shanmugasundram;Allen D'Ambra;Timothy Weidman.
Semiconductor processing systems having multiple plasma configurations
드미트리 루보미르스키;싱롱 첸;샨카르 벤카타라만.
Multi-chemistry plating system
Michael X. Yang;Ming Xi;Russell C. Ellwanger;Eric B. Britcher.
Electroless deposition apparatus
Stevens Joseph J;Lubomirsky Dmitry;Pancham Ian;Olgado Donald J.
Remote plasma source seasoning
Soonam Park;Soo Jeon;Toan Q. Tran;Jang-Gyoo Yang.
Temperature control system for process chamber
Dmitry Lubomirsky;Allen I. D'ambra;Edward L Floyd;Qiwei Liang.
Flowable dielectric equipment and processes
Dmitry Lubomirsky;Qiwei Liang;Jang Gyoo Yang.
Methods and systems to enhance process uniformity
Saravjeet Singh;Alan Tso;Jingchun Zhang;Zihui Li.
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