Dmitry Lubomirsky

What is he best known for?

The fields of study he is best known for:

• Mechanical engineering
• Electrical engineering
• Oxygen

Dmitry Lubomirsky mainly investigates Optoelectronics, Substrate, Remote plasma, Analytical chemistry and Etching. His biological study spans a wide range of topics, including Layer and Electrical engineering. The various areas that he examines in his Substrate study include Deposition, Mechanical engineering, Pedestal, Plasma etching and Electroless deposition.

Dmitry Lubomirsky interconnects Capacitive sensing, Titanium oxide, Polarity, Voltage and Ground in the investigation of issues within Remote plasma. He has researched Analytical chemistry in several fields, including Passivation, Patterned substrate, Dielectric, Plasma processing and Chemical engineering. His Etching research incorporates themes from Inorganic chemistry, Wafer, Titanium nitride and Silicon oxide.

His most cited work include:

• Process chamber for dielectric gapfill (241 citations)
• Semiconductor processing system and methods using capacitively coupled plasma (230 citations)
• Remote plasma source seasoning (229 citations)

What are the main themes of his work throughout his whole career to date?

His primary scientific interests are in Substrate, Optoelectronics, Composite material, Semiconductor and Layer. His Substrate research also works with subjects such as

• Pedestal and related Optics,
• Dielectric and related Mask layer. The concepts of his Optoelectronics study are interwoven with issues in Etching, Substrate, Electronic engineering and Electrical engineering.

His work in Composite material tackles topics such as Base which are related to areas like Structural engineering and Plasma processing. His work deals with themes such as Electrical conductor, Engineering drawing and Electroless deposition, which intersect with Layer. As a part of the same scientific family, he mostly works in the field of Plating, focusing on Metallurgy and, on occasion, Chemical engineering.

He most often published in these fields:

• Substrate (32.21%)
• Optoelectronics (26.44%)
• Composite material (26.44%)

What were the highlights of his more recent work (between 2015-2021)?

• Semiconductor (15.38%)
• Optoelectronics (26.44%)
• Substrate (32.21%)

In recent papers he was focusing on the following fields of study:

His scientific interests lie mostly in Semiconductor, Optoelectronics, Substrate, Composite material and Optics. His studies in Semiconductor integrate themes in fields like Manifold, Mechanics, Flow and Dielectric. Dmitry Lubomirsky combines subjects such as Ion, Conductive materials, Radio frequency, Etching and Substrate with his study of Optoelectronics.

His Substrate research is multidisciplinary, incorporating perspectives in Chemical engineering, Plasma display, Ground and Pedestal. In general Composite material study, his work on Layer, Porosity, Ceramic and Coating often relates to the realm of Volume, thereby connecting several areas of interest. His studies deal with areas such as Dynamical control, Rotation and Plasma processing as well as Optics.

Between 2015 and 2021, his most popular works were:

• Systems and methods for improved semiconductor etching and component protection (104 citations)
• Dual-channel showerhead with improved profile (51 citations)
• Oxygen compatible plasma source (51 citations)

In his most recent research, the most cited papers focused on:

• Mechanical engineering
• Electrical engineering
• Oxygen

Dmitry Lubomirsky focuses on Optoelectronics, Semiconductor, Substrate, Remote plasma and Layer. Optoelectronics is often connected to Electronic engineering in his work. His research integrates issues of Mechanics, Flow and Manifold in his study of Semiconductor.

His Substrate research is multidisciplinary, relying on both Etching and Dielectric. The Remote plasma study combines topics in areas such as Inorganic chemistry, Sodium, Potassium, Rubidium and Alkaline earth metal. His Layer study combines topics from a wide range of disciplines, such as Wafer and Deposition.