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D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Engineering and Technology 39 7594 7324 2086 1935 274 7733

Shahid Rauf publications per year

The chart shows the history of publications by Shahid Rauf between 1994 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Shahid Rauf published across 32 years, from 1994 to 2025, averaging 10.9 papers a year. Output peaked at 23 publications in 2011. 21 of the 350 publications appeared in the last two years.

No. of publications
5 10 15 20
Bar chart. Horizontal axis: year, 1994 to 2025. Vertical axis: number of publications, 0 to 23. Peak 23 publications in 2011. 1994: 2 publications 1995: 6 publications 1996: 7 publications 1997: 8 publications 1998: 6 publications 1999: 11 publications 2000: 4 publications 2001: 11 publications 2002: 11 publications 2003: 7 publications 2004: 6 publications 2005: 6 publications 2006: 12 publications 2007: 20 publications 2008: 14 publications 2009: 16 publications 2010: 15 publications 2011: 23 publications 2012: 20 publications 2013: 19 publications 2014: 14 publications 2015: 6 publications 2016: 5 publications 2017: 14 publications 2018: 13 publications 2019: 12 publications 2020: 18 publications 2021: 7 publications 2022: 5 publications 2023: 11 publications 2024: 15 publications 2025: 6 publications
1994 2025

350 publications in total across all disciplines

View publications per year as a table
Shahid Rauf: publications per year, 1994 to 2025
Year Publications
1994 2
1995 6
1996 7
1997 8
1998 6
1999 11
2000 4
2001 11
2002 11
2003 7
2004 6
2005 6
2006 12
2007 20
2008 14
2009 16
2010 15
2011 23
2012 20
2013 19
2014 14
2015 6
2016 5
2017 14
2018 13
2019 12
2020 18
2021 7
2022 5
2023 11
2024 15
2025 6
Total 350
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Shahid Rauf publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Shahid Rauf sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 78 bars. Horizontal axis: publications, 38–47 to 804+. Vertical axis: number of scientists, 0 to 457. Most scientists, 457, have 148–157 publications. The last bar groups every scientist with 804 publications or more. The highlighted bar, 268–277 publications, is where this scientist sits. 38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38–47 publications 804+

This scientist: 274 publications — 70th percentile

70% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

View publications distribution as a table
Number of Engineering and Technology scientists by publication count, Research.com 2026 ranking edition. Based on 9,796 ranked scientists.
Publications Scientists This scientist
38–47 20
48–57 35
58–67 96
68–77 135
78–87 190
88–97 259
98–107 283
108–117 369
118–127 341
128–137 386
138–147 372
148–157 457
158–167 415
168–177 407
178–187 421
188–197 378
198–207 403
208–217 317
218–227 346
228–237 321
238–247 260
248–257 280
258–267 240
268–277 214 274
278–287 242
288–297 203
298–307 166
308–317 154
318–327 175
328–337 159
338–347 99
348–357 131
358–367 106
368–377 118
378–387 97
388–397 108
398–407 82
408–417 71
418–427 64
428–437 55
438–447 54
448–457 60
458–467 47
468–477 40
478–487 30
488–497 29
498–507 38
508–517 40
518–527 32
528–537 23
538–547 28
548–557 23
558–567 19
568–577 16
578–587 17
588–597 18
598–607 22
608–617 15
618–627 9
628–637 11
638–647 21
648–657 12
658–667 9
668–677 11
678–687 9
688–697 6
698–707 14
708–717 7
718–727 8
728–737 10
738–747 9
748–757 5
758–767 5
768–777 11
778–787 7
788–797 2
798–803 4
804+ 100
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Shahid Rauf D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Shahid Rauf sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 78 bars. Horizontal axis: D-Index, 30 to 107+. Vertical axis: number of scientists, 0 to 426. Most scientists, 426, have 42 D-Index. The last bar groups every scientist with 107 D-Index or more. The highlighted bar, 39 D-Index, is where this scientist sits. 30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 39 D-Index — 24th percentile

24% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

View D-Index distribution as a table
Number of Engineering and Technology scientists by D-index, Research.com 2026 ranking edition. Based on 9,796 ranked scientists.
D-Index Scientists This scientist
30 59
31 114
32 129
33 189
34 200
35 262
36 311
37 312
38 350
39 385 39
40 348
41 362
42 426
43 380
44 310
45 341
46 301
47 306
48 271
49 246
50 210
51 253
52 213
53 221
54 195
55 186
56 170
57 167
58 166
59 144
60 152
61 141
62 138
63 131
64 118
65 114
66 119
67 95
68 87
69 77
70 89
71 69
72 54
73 46
74 55
75 54
76 49
77 53
78 46
79 28
80 39
81 36
82 24
83 26
84 36
85 18
86 25
87 19
88 26
89 27
90 23
91 15
92 12
93 9
94 15
95 10
96 13
97 13
98 9
99 7
100 7
101 8
102 7
103 7
104 9
105 6
106 9
107+ 99
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Overview

Shahid Rauf is a researcher affiliated with Applied Materials in the United States, specializing in engineering with a focus on electrical and electronic engineering. Their work extensively covers plasma diagnostics and applications, with significant contributions to the study of dust and plasma wave phenomena, metal and thin film mechanics, and semiconductor materials and devices. Additional research interests include electrohydrodynamics, fluid dynamics, and particle accelerators and beam dynamics.

The scientist has a publication record that highlights key venues, including 11 papers in Plasma Sources Science and Technology, 7 papers on arXiv (Cornell University), 4 papers in the Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, and additional works in the Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena and Physics of Plasmas.

Notable recent publications by Shahid Rauf include:

  • On uniformity and non-local transport in low pressure capacitively coupled plasmas, 2020, Plasma Sources Science and Technology
  • Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation, 2021, Plasma Sources Science and Technology
  • The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions, 2022, Plasma Sources Science and Technology
  • Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge, 2023, Plasma Sources Science and Technology
  • Future of plasma etching for microelectronics: Challenges and opportunities, 2024, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Shahid Rauf has collaborated frequently with a group of coauthors, including Kallol Bera, Igor Kaganovich, Jason Kenney, Sathya Ganta, and Ihor Korolov. These collaborations have resulted in multiple joint publications and contributions to the field of plasma science and engineering.

In addition to journal articles, Rauf has published a book titled Electrical Engineering for Non-Electrical Engineers with River Publishers eBooks in 2021.

The researcher's work spans several subfields, such as mechanics of materials, atomic and molecular physics and optics, radiology, nuclear medicine and imaging, and aerospace engineering, reflecting a diverse scope within applied engineering disciplines.

Best Publications

  • The 2017 Plasma Roadmap: Low temperature plasma science and technology

    I. Adamovich;S. D. Baalrud;A. Bogaerts;P. J. Bruggeman

  • The 2012 Plasma Roadmap

    Seiji Samukawa;Masaru Hori;Shahid Rauf;Kunihide Tachibana

  • Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation

    Shahid Rauf;Mark J. Kushner

  • Dual mode inductively coupled plasma reactor with adjustable phase coil assembly

    Samer Banna;Valentin N. Todorow;Kenneth S. Collins;Andrew Nguyen

  • Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges

    Shahid Rauf;Mark J. Kushner

  • Etch method in the manufacture of an integrated circuit

    Terry G. Sparks;Shahid Rauf

  • Plasma reactor gas distribution plate with radially distributed path splitting manifold

    Kallol Bera;Shahid Rauf

  • Independent control of rf phases of separate coils of an inductively coupled plasma reactor

    Kenneth S. Collins;Satoru Kobayashi;Lawrence Wong;Jonathan Liu

  • Two-phase operation of plasma chamber by phase locked loop

    Satoru Kobayashi;Lawrence Wong;Jonathan Liu;Yang Yang

  • Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources

    S. Rauf;M.J. Kushner

  • Synchronized radio frequency pulsing for plasma etching

    Bryan Liao;Katsumasa Kawasaki;Yashaswini Pattar;Sergio Fukuda Shoji

  • Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

    S. Banna;A. Agarwal;K. Tokashiki;Hong Cho

  • Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution

    Kallol Bera;Shahid Rauf

  • Pulsed plasma high aspect ratio dielectric process

    Ankur Agarwal;Kenneth S. Collins;Shahid Rauf;Kartik Ramaswamy

  • Self-consistent simulation of very high frequency capacitively coupled plasmas

    Shahid Rauf;Kallol Bera;Ken Collins

  • SYMMETRICAL PLASMA PROCESSING CHAMBER

    James D Carducci;Hamid Tabassoli;Balakrishna Ajit;Chen Zhigang

  • A molecular dynamics investigation of fluorocarbon based layer-by-layer etching of silicon and SiO2

    S. Rauf;T. Sparks;P. L. G. Ventzek;V. V. Smirnov

  • Breakdown processes in metal halide lamps

    Brian Lay;Brian Lay;Richard S Moss;Shahid Rauf;Shahid Rauf;Mark J Kushner

  • The effect of radio frequency plasma processing reactor circuitry on plasma characteristics

    Shahid Rauf;Mark J. Kushner

  • Process for wafer backside polymer removal and wafer front side photoresist removal

    Kenneth S. Collins;Hiroji Hanawa;Andrew Nguyen;Shahid Rauf

Frequent Co-Authors

Kenneth S. Collins
Kenneth S. Collins Applied Materials (United States)
Kartik Ramaswamy
Kartik Ramaswamy Applied Materials (United States)
Andrew Nguyen
Andrew Nguyen Applied Materials (United States)
Hiroji Hanawa
Hiroji Hanawa Applied Materials (United States)
Mark J. Kushner
Mark J. Kushner University of Michigan–Ann Arbor
Julian Schulze
Julian Schulze Ruhr University Bochum
Matthew L. Miller
Matthew L. Miller NEC (United States)
Jonathan Tennyson
Jonathan Tennyson University College London
Annemie Bogaerts
Annemie Bogaerts University of Antwerp
Uwe R. Kortshagen
Uwe R. Kortshagen University of Minnesota

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