World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
39
Citations
7733
World Ranking
7594
National Ranking
2086

Shahid Rauf publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Shahid Rauf sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 274 publications — 70th percentile

70% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Shahid Rauf D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Shahid Rauf sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 39 D-Index — 24th percentile

24% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Shahid Rauf is a researcher affiliated with Applied Materials in the United States, specializing in engineering with a focus on electrical and electronic engineering. Their work extensively covers plasma diagnostics and applications, with significant contributions to the study of dust and plasma wave phenomena, metal and thin film mechanics, and semiconductor materials and devices. Additional research interests include electrohydrodynamics, fluid dynamics, and particle accelerators and beam dynamics.

The scientist has a publication record that highlights key venues, including 11 papers in Plasma Sources Science and Technology, 7 papers on arXiv (Cornell University), 4 papers in the Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, and additional works in the Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena and Physics of Plasmas.

Notable recent publications by Shahid Rauf include:

  • On uniformity and non-local transport in low pressure capacitively coupled plasmas, 2020, Plasma Sources Science and Technology
  • Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation, 2021, Plasma Sources Science and Technology
  • The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions, 2022, Plasma Sources Science and Technology
  • Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge, 2023, Plasma Sources Science and Technology
  • Future of plasma etching for microelectronics: Challenges and opportunities, 2024, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Shahid Rauf has collaborated frequently with a group of coauthors, including Kallol Bera, Igor Kaganovich, Jason Kenney, Sathya Ganta, and Ihor Korolov. These collaborations have resulted in multiple joint publications and contributions to the field of plasma science and engineering.

In addition to journal articles, Rauf has published a book titled Electrical Engineering for Non-Electrical Engineers with River Publishers eBooks in 2021.

The researcher's work spans several subfields, such as mechanics of materials, atomic and molecular physics and optics, radiology, nuclear medicine and imaging, and aerospace engineering, reflecting a diverse scope within applied engineering disciplines.

Best Publications

  • The 2017 Plasma Roadmap: Low temperature plasma science and technology

    I. Adamovich;S. D. Baalrud;A. Bogaerts;P. J. Bruggeman

  • The 2012 Plasma Roadmap

    Seiji Samukawa;Masaru Hori;Shahid Rauf;Kunihide Tachibana

  • Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation

    Shahid Rauf;Mark J. Kushner

  • Dual mode inductively coupled plasma reactor with adjustable phase coil assembly

    Samer Banna;Valentin N. Todorow;Kenneth S. Collins;Andrew Nguyen

  • Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges

    Shahid Rauf;Mark J. Kushner

  • Etch method in the manufacture of an integrated circuit

    Terry G. Sparks;Shahid Rauf

  • Plasma reactor gas distribution plate with radially distributed path splitting manifold

    Kallol Bera;Shahid Rauf

  • Independent control of rf phases of separate coils of an inductively coupled plasma reactor

    Kenneth S. Collins;Satoru Kobayashi;Lawrence Wong;Jonathan Liu

  • Two-phase operation of plasma chamber by phase locked loop

    Satoru Kobayashi;Lawrence Wong;Jonathan Liu;Yang Yang

  • Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources

    S. Rauf;M.J. Kushner

  • Synchronized radio frequency pulsing for plasma etching

    Bryan Liao;Katsumasa Kawasaki;Yashaswini Pattar;Sergio Fukuda Shoji

  • Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

    S. Banna;A. Agarwal;K. Tokashiki;Hong Cho

  • Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution

    Kallol Bera;Shahid Rauf

  • Pulsed plasma high aspect ratio dielectric process

    Ankur Agarwal;Kenneth S. Collins;Shahid Rauf;Kartik Ramaswamy

  • Self-consistent simulation of very high frequency capacitively coupled plasmas

    Shahid Rauf;Kallol Bera;Ken Collins

  • SYMMETRICAL PLASMA PROCESSING CHAMBER

    James D Carducci;Hamid Tabassoli;Balakrishna Ajit;Chen Zhigang

  • A molecular dynamics investigation of fluorocarbon based layer-by-layer etching of silicon and SiO2

    S. Rauf;T. Sparks;P. L. G. Ventzek;V. V. Smirnov

  • Breakdown processes in metal halide lamps

    Brian Lay;Brian Lay;Richard S Moss;Shahid Rauf;Shahid Rauf;Mark J Kushner

  • The effect of radio frequency plasma processing reactor circuitry on plasma characteristics

    Shahid Rauf;Mark J. Kushner

  • Process for wafer backside polymer removal and wafer front side photoresist removal

    Kenneth S. Collins;Hiroji Hanawa;Andrew Nguyen;Shahid Rauf

Frequent Co-Authors

Kenneth S. Collins
Kenneth S. Collins Applied Materials (United States)
Kartik Ramaswamy
Kartik Ramaswamy Applied Materials (United States)
Andrew Nguyen
Andrew Nguyen Applied Materials (United States)
Hiroji Hanawa
Hiroji Hanawa Applied Materials (United States)
Mark J. Kushner
Mark J. Kushner University of Michigan–Ann Arbor
Julian Schulze
Julian Schulze Ruhr University Bochum
Matthew L. Miller
Matthew L. Miller NEC (United States)
Jonathan Tennyson
Jonathan Tennyson University College London
Annemie Bogaerts
Annemie Bogaerts University of Antwerp
Uwe R. Kortshagen
Uwe R. Kortshagen University of Minnesota

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