World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
52
Citations
7248
World Ranking
2574
National Ranking
75

Julian Schulze publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Julian Schulze sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 281 publications — 53rd percentile

53% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Julian Schulze D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Julian Schulze sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 52 D-Index — 64th percentile

64% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Julian Schulze is affiliated with Ruhr University Bochum in Germany and has contributed extensively to the field of engineering, with a specialized focus on areas such as electrical and electronic engineering, radiology, nuclear medicine and imaging, atomic and molecular physics, optics, mechanics of materials, and materials chemistry. Their research predominantly addresses plasma-related phenomena and material sciences.

The main topics of Schulze's work include:

  • Plasma Diagnostics and Applications
  • Plasma Applications and Diagnostics
  • Dust and Plasma Wave Phenomena
  • Metal and Thin Film Mechanics
  • Electrohydrodynamics and Fluid Dynamics
  • Electrostatic Discharge in Electronics
  • Semiconductor materials and devices

Schulze has published numerous papers in both specialized journals and widely accessible platforms. Frequent publication venues include:

  • Plasma Sources Science and Technology
  • arXiv (Cornell University)
  • Journal of Physics D Applied Physics
  • Vacuum
  • Plasma Processes and Polymers

Notable recent papers authored by Schulze are:

  • Electron dynamics in low pressure capacitively coupled radio frequency discharges (2020, Journal of Applied Physics)
  • Helium metastable species generation in atmospheric pressure RF plasma jets driven by tailored voltage waveforms in mixtures of He and N2 (2020, Journal of Physics D Applied Physics)
  • Electron power absorption dynamics in magnetized capacitively coupled radio frequency oxygen discharges (2020, Plasma Sources Science and Technology)
  • Multi-diagnostic experimental validation of 1d3v PIC/MCC simulations of low pressure capacitive RF plasmas operated in argon (2021, Plasma Sources Science and Technology)
  • Charged particle dynamics and distribution functions in low pressure dual-frequency capacitively coupled plasmas operated at low frequencies and high voltages (2020, Plasma Sources Science and Technology)

Schulze frequently collaborates with other researchers. Some of the most frequent co-authors in their work include:

  • Zoltán Donkó
  • Ihor Korolov
  • Péter Hartmann
  • Quan-Zhi Zhang
  • Thomas Mussenbrock

The scope of Schulze's research spans advanced plasma physics and engineering disciplines, with a strong emphasis on experimental and theoretical analysis of plasma behavior, diagnostics, and applications relevant to both fundamental science and technological development. Their extensive publication record reflects significant engagement with the scientific community in these specialized fields.

Best Publications

  • Ionization by drift and ambipolar electric fields in electronegative capacitive radio frequency plasmas.

    J. Schulze;A. Derzsi;K. Dittmann;T. Hemke

  • PIC simulations of the separate control of ion flux and energy in CCRF discharges via the electrical asymmetry effect

    Z Donkó;J Schulze;B G Heil;U Czarnetzki

  • Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

    Timo Gans;J. Schulze;D. O'Connell;U. Czarnetzki

  • The electrical asymmetry effect in capacitively coupled radio frequency discharges ? measurements of dc self bias, ion energy and ion flux

    J Schulze;E Schüngel;U Czarnetzki

  • Space and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled radio-frequency discharge

    J. Schulze;Timo Gans;Timo Gans;Deborah O'Connell;U. Czarnetzki

  • Phase resolved optical emission spectroscopy: a non-intrusive diagnostic to study electron dynamics in capacitive radio frequency discharges

    J Schulze;E Schüngel;Z Donkó;D Luggenhölscher

  • Secondary electrons in dual-frequency capacitive radio frequency discharges

    J Schulze;J Schulze;Z Donkó;E Schüngel;U Czarnetzki

  • Stochastic heating in asymmetric capacitively coupled RF discharges

    J Schulze;B G Heil;D Luggenhölscher;R P Brinkmann

  • Electric field reversals in the sheath region of capacitively coupled radio frequency discharges at different pressures

    J Schulze;Z Donkó;B G Heil;D Luggenhölscher

  • The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges

    J Schulze;J Schulze;E Schüngel;Z Donkó;U Czarnetzki

  • The electrical asymmetry effect in capacitively coupled radio-frequency discharges

    U Czarnetzki;J Schulze;J Schulze;E Schüngel;Z Donkó

  • Self-excited nonlinear plasma series resonance oscillations in geometrically symmetric capacitively coupled radio frequency discharges

    Z. Donkó;J. Schulze;U. Czarnetzki;D. Luggenhölscher

  • Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments

    Z Donkó;J Schulze;U Czarnetzki;A Derzsi

  • The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges

    Z. Donkó;J. Schulze;J. Schulze;P. Hartmann;I. Korolov

  • Electron beams in asymmetric capacitively coupled radio frequency discharges at low pressures

    J Schulze;B G Heil;D Luggenhölscher;T Mussenbrock

  • The role of electron induced secondary electron emission from SiO2 surfaces in capacitively coupled radio frequency plasmas operated at low pressures

    Benedek Horváth;Manaswi Daksha;Manaswi Daksha;Ihor Korolov;Aranka Derzsi;Aranka Derzsi

  • Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas

    A. Derzsi;I. Korolov;E. Schuengel;Z. Donko

  • Electron dynamics in low pressure capacitively coupled radio frequency discharges

    Sebastian Wilczek;Julian Schulze;Julian Schulze;Ralf Peter Brinkmann;Zoltan Donkó

  • Electron heating and control of ion properties in capacitive discharges driven by customized voltage waveforms

    A Derzsi;I Korolov;E Schüngel;Z Donkó

  • Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model

    J. Schulze;E. Schüngel;U. Czarnetzki;Z. Donkó

  • The effect of the driving frequency on the confinement of beam electrons and plasma density in low-pressure capacitive discharges

    Sebastian Wilczek;Jan Trieschmann;Julian Schulze;Edmund Schuengel

  • Different modes of electron heating in dual-frequency capacitively coupled radio frequency discharges

    J Schulze;Z Donkó;D Luggenhölscher;U Czarnetzki

Frequent Co-Authors

Daniel P Cronin-Hennessy
Daniel P Cronin-Hennessy University of Minnesota

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

For students pursuing Electronics and Electrical Engineering in the USA, expanding your skill set with related online degrees can unlock diverse career opportunities. Fields like project management are highly relevant, particularly for engineers who aspire to lead technical teams and oversee complex projects. Exploring the best online accelerated project management degree programs can help you develop leadership and organizational skills in a shorter timeframe.

Many professionals also consider earning a bachelor of project management online to complement their engineering background. This degree focuses on essential project planning and execution techniques, which are crucial when managing engineering projects successfully.

Balancing work with study is another challenge addressed by accelerated degree programs for working adults. These programs offer flexible schedules and faster completion times, making them an excellent option for engineers continuing professional development while working full-time.

Additionally, professionals interested in educational technology and training within the engineering field might consider an instructional design degree online. This degree equips students with skills to design effective learning experiences, benefiting those who want to train others in technical topics.

Best Scientists Citing Julian Schulze

Trending Scientists

Recently Published Articles