Kartik Ramaswamy

Applied Materials (United States)
United States

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name Citations Publications World Ranking National Ranking

Engineering and Technology D-index 40 Citations 6,873 167 World Ranking 3606 National Ranking 1237

Overview

What are the main themes of his work throughout his whole career to date

Kartik Ramaswamy combines Plasma and Nuclear physics in his research. He integrates many fields, such as Nuclear physics and Atomic physics, in his works. He conducts interdisciplinary study in the fields of Atomic physics and Quantum mechanics through his works. His Quantum mechanics study frequently links to other fields, such as Inductively coupled plasma atomic emission spectroscopy. His Inductively coupled plasma atomic emission spectroscopy study frequently draws connections between adjacent fields such as Plasma. He performs multidisciplinary study in the fields of Optics and Wavenumber via his papers. With his scientific publications, his incorporates both Optoelectronics and Semiconductor. His work blends Semiconductor and Optoelectronics studies together. His Composite material study often links to related topics such as Vacuum chamber.

Kartik Ramaswamy most often published in these fields:

Plasma (100.00%)
Nuclear physics (50.00%)
Optics (50.00%)

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask

Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S. Collins.
(2005)

362 Citations

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Kenneth S. Collins;Hiroji Hanawa;Kartik Ramaswamy;Andrew Nguyen.
(2003)

346 Citations

Method for ion implanting insulator material to reduce dielectric constant

Amir Al-Bayati;Rick J. Roberts;Kenneth S. Collins;Ken MacWilliams.
(2004)

314 Citations

Chemical vapor deposition plasma process using an ion shower grid

Hiroji Hanawa;Tsutomu Tanaka;Kenneth S. Collins;Amir Al-Bayati.
(2004)

293 Citations

Plasma immersion ion implantation process

Kenneth S. Collins;Hiroji Hanawa;Kartik Ramaswamy;Andrew Nguyen.
(2005)

278 Citations

Low temperature CVD process with selected stress of the CVD layer on CMOS devices

Hiroji Hanawa;Kartik Ramaswamy;Kenneth S. Collins;Amir Al-Bayati.
(2007)

272 Citations

Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer

Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S. Collins.
(2005)

266 Citations

Substrate support having heat transfer system

Andrew Nguyen;Wing Lau Cheng;Hiroji Hanawa;Semyon L. Kats.
(2007)

266 Citations

Low temperature plasma deposition process for carbon layer deposition

Ramaswamy Kartik;Hanawa Hiroji;Gallo Biagio;Collins Kenneth S.
(2005)

261 Citations

Copper barrier reflow process employing high speed optical annealing

Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S Collins.
(2005)

259 Citations

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Frequent Co-Authors

External Links

Personal Website for Kartik Ramaswamy