D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 44 Citations 6,147 184 World Ranking 8909 National Ranking 2301

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Silicon
  • Organic chemistry

John Tolle mostly deals with Chemical vapor deposition, Optoelectronics, Epitaxy, Germanium and Tin. John Tolle has included themes like Optics, Semiconductor, Specific detectivity, Responsivity and Electronic band structure in his Chemical vapor deposition study. In his study, Wavelength is strongly linked to Laser, which falls under the umbrella field of Optoelectronics.

His Dislocation research extends to Epitaxy, which is thematically connected. His Tin research also works with subjects such as

  • Chemical engineering which connect with Germane and Deposition,
  • Inorganic chemistry and related Dopant. While the research belongs to areas of Silicon, John Tolle spends his time largely on the problem of Photoluminescence, intersecting his research to questions surrounding Thin film and Alloy.

His most cited work include:

  • Method for preparing Ge1-x-ySnxEy (E=P, As, Sb) semiconductors and related Si-Ge-Sn-E and Si-Ge-E analogs (160 citations)
  • Direct-gap photoluminescence with tunable emission wavelength in Ge1−ySny alloys on silicon (141 citations)
  • Methods of forming films including germanium tin and structures and devices including the films (139 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of investigation include Optoelectronics, Chemical vapor deposition, Epitaxy, Silicon and Analytical chemistry. His Optoelectronics study often links to related topics such as Laser. His Chemical vapor deposition research includes elements of Double heterostructure, Lattice constant, Optics and Germanium.

His work investigates the relationship between Epitaxy and topics such as Transmission electron microscopy that intersect with problems in Crystallography and Diffraction. John Tolle combines subjects such as Thin film, Temperature measurement and Substrate with his study of Silicon. John Tolle interconnects Ellipsometry and Doping in the investigation of issues within Analytical chemistry.

He most often published in these fields:

  • Optoelectronics (59.00%)
  • Chemical vapor deposition (32.50%)
  • Epitaxy (25.50%)

What were the highlights of his more recent work (between 2018-2021)?

  • Optoelectronics (59.00%)
  • Laser (15.00%)
  • Photodetector (10.50%)

In recent papers he was focusing on the following fields of study:

Optoelectronics, Laser, Photodetector, Epitaxy and Photonics are his primary areas of study. His Optoelectronics research focuses on Wavelength, Chemical vapor deposition and Silicon. His studies in Chemical vapor deposition integrate themes in fields like Reactivity, Metastability and Thermochemistry.

His Silicon research is multidisciplinary, incorporating elements of Band gap and Gallium. His Laser study integrates concerns from other disciplines, such as Direct and indirect band gaps, Operating temperature and Heterojunction. His research integrates issues of Nanowire, Doping, Semiconductor and Boron in his study of Epitaxy.

Between 2018 and 2021, his most popular works were:

  • Optically Pumped GeSn Lasers Operating at 270 K with Broad Waveguide Structures on Si (40 citations)
  • Si-Based GeSn Photodetectors toward Mid-Infrared Imaging Applications (29 citations)
  • METHOD FOR SELECTIVELY DEPOSITING A GROUP IV SEMICONDUCTOR AND RELATED SEMICONDUCTOR DEVICE STRUCTURES (28 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Organic chemistry
  • Laser

John Tolle mainly investigates Optoelectronics, Laser, Semiconductor, Direct and indirect band gaps and Lasing threshold. His biological study spans a wide range of topics, including In situ, Infrared and Detector. His Laser study combines topics from a wide range of disciplines, such as Photonics and Silicon.

His work in the fields of Silicon, such as Silicon photonics, intersects with other areas such as Mixing. His study on Direct and indirect band gaps also encompasses disciplines like

  • Substrate, Thin film, Ellipsometry and Analytical chemistry most often made with reference to Relaxation,
  • Chemical vapor deposition most often made with reference to Waveguide. The study incorporates disciplines such as Diode, Heterojunction, Laser linewidth and Quantum efficiency in addition to Lasing threshold.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Method for preparing Ge1-x-ySnxEy (E=P, As, Sb) semiconductors and related Si-Ge-Sn-E and Si-Ge-E analogs

John Kouvetakis;Matthew Bauer;John Tolle;Candi Cook.
(2004)

232 Citations

Methods of forming films including germanium tin and structures and devices including the films

John Tolle.
(2013)

221 Citations

Tin precursors for vapor deposition and deposition processes

John Tolle.
(2013)

221 Citations

Direct-gap photoluminescence with tunable emission wavelength in Ge1−ySny alloys on silicon

J. Mathews;R. T. Beeler;J. Tolle;C. Xu.
Applied Physics Letters (2010)

217 Citations

An optically pumped 2.5 μm GeSn laser on Si operating at 110 K

Sattar Al-Kabi;Seyed Amir Ghetmiri;Joe Margetis;Thach Pham.
Applied Physics Letters (2016)

209 Citations

Removable substrate tray and assembly and reactor including same

Eric Hill;John Tolle;Matthew Goodman.
(2014)

203 Citations

Method and system for in situ formation of gas-phase compounds

John Tolle;Eric Hill;Jereld Lee Winkler.
(2014)

196 Citations

Direct-bandgap GeSn grown on silicon with 2230 nm photoluminescence

Seyed Amir Ghetmiri;Wei Du;Joe Margetis;Aboozar Mosleh.
Applied Physics Letters (2014)

185 Citations

Methods of forming highly p-type doped germanium tin films and structures and devices including the films

Joe Margetis;John Tolle.
(2015)

165 Citations

Formation of epitaxial layers via dislocation filtering

Joe Margetis;John Tolle.
(2017)

145 Citations

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