World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
36
Citations
4988
World Ranking
5375
National Ranking
87

Overview

Xiao Gong is affiliated with the National University of Singapore, where their research primarily focuses on engineering with a concentration in electrical and electronic engineering. Their scholarly contributions span multiple subfields including materials chemistry, biomedical engineering, atomic and molecular physics, optics, and artificial intelligence.

Their work encompasses several main research topics, including:

  • Semiconductor materials and devices
  • Ferroelectric and Negative Capacitance Devices
  • Advanced Memory and Neural Computing
  • Photonic and Optical Devices
  • Thin-Film Transistor Technologies
  • Advanced Photonic Communication Systems
  • Advancements in Semiconductor Devices and Circuit Design

Xiao Gong has contributed to numerous publications across a range of scientific journals and venues. Frequent publication venues include:

  • IEEE Transactions on Electron Devices
  • IEEE Electron Device Letters
  • Nature Communications
  • arXiv (Cornell University)
  • Optics Express

Among recent papers featuring Xiao Gong's work are:

  • High-efficiency GeSn/Ge multiple-quantum-well photodetectors with photon-trapping microstructures operating at 2 µm, 2020, Optics Express
  • Wafer-scale functional circuits based on two dimensional semiconductors with fabrication optimized by machine learning, 2021, Nature Communications
  • An Electronic Synapse Based on 2D Ferroelectric CuInP2S6, 2020, Advanced Electronic Materials
  • A van der Waals Synaptic Transistor Based on Ferroelectric Hf0.5Zr0.5O2 and 2D Tungsten Disulfide, 2020, Advanced Electronic Materials
  • Low Subthreshold Swing and High Mobility Amorphous Indium-Gallium-Zinc-Oxide Thin-Film Transistor With Thin HfO2 Gate Dielectric and Excellent Uniformity, 2020, IEEE Electron Device Letters

Collaborations have featured frequent coauthors including:

  • Chen Sun
  • Kaizhen Han
  • Zijie Zheng
  • Zuopu Zhou
  • Qiwen Kong

Xiao Gong's research contributions address a range of topics at the intersection of semiconductor technology and device engineering, often incorporating techniques from materials chemistry and artificial intelligence to optimize device fabrication and performance. Their interdisciplinary approach covers both theoretical and applied aspects of emerging semiconductor devices, memory systems, and photonic components.

Best Publications

  • Monolithic infrared silicon photonics: The rise of (Si)GeSn semiconductors

    O. Moutanabbir;S. Assali;X. Gong;E. O'Reilly

  • Artificial Synapses Based on Multiterminal Memtransistors for Neuromorphic Application

    Lin Wang;Wugang Liao;Swee Liang Wong;Zhi Gen Yu

  • A Fully Printed Flexible MoS 2 Memristive Artificial Synapse with Femtojoule Switching Energy

    Xuewei Feng;Yida Li;Lin Wang;Shuai Chen

  • Large-scale two-dimensional MoS 2 photodetectors by magnetron sputtering

    Z. P. Ling;R. Yang;J. W. Chai;S. J. Wang

  • Germanium–Tin (GeSn) p-Channel MOSFETs Fabricated on (100) and (111) Surface Orientations With Sub-400 $^{\circ}\hbox{C}\ \hbox{Si}_{2}\hbox{H}_{6}$ Passivation

    Xiao Gong;Genquan Han;Fan Bai;Shaojian Su

  • High-speed photo detection at two-micron-wavelength: technology enablement by GeSn/Ge multiple-quantum-well photodiode on 300 mm Si substrate.

    Shengqiang Xu;Wei Wang;Yi-Chiau Huang;Yuan Dong

  • Two-micron-wavelength germanium-tin photodiodes with low dark current and gigahertz bandwidth.

    Yuan Dong;Wei Wang;Shengqiang Xu;Dian Lei

  • Wafer-scale functional circuits based on two dimensional semiconductors with fabrication optimized by machine learning.

    Xinyu Chen;Yufeng Xie;Yaochen Sheng;Hongwei Tang

  • Suppression of dark current in germanium-tin on silicon p-i-n photodiode by a silicon surface passivation technique.

    Yuan Dong;Wei Wang;Dian Lei;Xiao Gong

  • High-efficiency GeSn/Ge multiple-quantum-well photodetectors with photon-trapping microstructures operating at 2 µm.

    Hao Zhou;Shengqiang Xu;Yiding Lin;Yi-Chiau Huang

  • An Electronic Synapse Based on 2D Ferroelectric CuInP2S6

    Bochang Li;Sifan Li;Han Wang;Li Chen

  • Relaxed and Strained Patterned Germanium-Tin Structures: A Raman Scattering Study

    Ran Cheng;Wei Wang;Xiao Gong;Linfeng Sun

  • A van der Waals Synaptic Transistor Based on Ferroelectric Hf 0.5 Zr 0.5 O 2 and 2D Tungsten Disulfide

    Li Chen;Lin Wang;Yue Peng;Xuewei Feng

  • III–V Multiple-Gate Field-Effect Transistors With High-Mobility $\hbox{In}_{0.7}\hbox{Ga}_{0.3}\hbox{As}$ Channel and Epi-Controlled Retrograde-Doped Fin

    Hock-Chun Chin;Xiao Gong;Lanxiang Wang;Hock Koon Lee

  • Low Subthreshold Swing and High Mobility Amorphous Indium–Gallium–Zinc-Oxide Thin-Film Transistor With Thin HfO 2 Gate Dielectric and Excellent Uniformity

    Subhranu Samanta;Umesh Chand;Shengqiang Xu;Kaizhen Han

  • Silane and Ammonia Surface Passivation Technology for High-Mobility $\hbox{In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ MOSFETs

    Hock-Chun Chin;Xinke Liu;Xiao Gong;Yee-Chia Yeo

  • Evaluation of Negative Capacitance Ferroelectric MOSFET for Analog Circuit Applications

    Yang Li;Yuye Kang;Xiao Gong

  • Towards direct band-to-band tunneling in P-channel tunneling field effect transistor (TFET): Technology enablement by Germanium-tin (GeSn)

    Yue Yang;Shaojian Su;Pengfei Guo;Wei Wang

  • Lattice-Mismatched $\hbox{In}_{0.4}\hbox{Ga}_{0.6} \hbox{As}$ Source/Drain Stressors With In Situ Doping for Strained $\hbox{In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ Channel n-MOSFETs

    Hock-Chun Chin;Xiao Gong;Xinke Liu;Yee-Chia Yeo

  • Germanium-Tin on Si Avalanche Photodiode: Device Design and Technology Demonstration

    Yuan Dong;Wei Wang;Xin Xu;Xiao Gong

  • In0.7Ga0.3As Channel n-MOSFET with Self-Aligned Ni–InGaAs Source and Drain

    Xingui Zhang;Huaxin Guo;Xiao Gong;Qian Zhou

  • Germanium–Tin P-Channel Tunneling Field-Effect Transistor: Device Design and Technology Demonstration

    Yue Yang;Genquan Han;Pengfei Guo;Wei Wang

Frequent Co-Authors

Yee-Chia Yeo
Yee-Chia Yeo National University of Singapore
Ying Wu
Ying Wu Northwestern University
Genquan Han
Genquan Han Xidian University
Chuan Seng Tan
Chuan Seng Tan Nanyang Technological University
Bin Liu
Bin Liu National University of Singapore
Aaron Thean
Aaron Thean National University of Singapore
Kah-Wee Ang
Kah-Wee Ang National University of Singapore
Clement Hsingjen Wann
Clement Hsingjen Wann Taiwan Semiconductor Manufacturing Company (Taiwan)
Jisheng Pan
Jisheng Pan Agency for Science, Technology and Research
Bich-Yen Nguyen
Bich-Yen Nguyen Soitec (France)

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