D-Index & Metrics Best Publications
Eugene A. Fitzgerald

Eugene A. Fitzgerald

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 69 Citations 18,146 393 World Ranking 548 National Ranking 275
Materials Science D-index 76 Citations 22,087 437 World Ranking 1768 National Ranking 585

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Optoelectronics
  • Silicon

Eugene A. Fitzgerald mainly investigates Optoelectronics, Silicon, Substrate, Epitaxy and Semiconductor. His studies in Optoelectronics integrate themes in fields like Crystallography, Dislocation, Electronic engineering and MOSFET. Eugene A. Fitzgerald interconnects Luminescence, Wafer and Doping in the investigation of issues within Silicon.

His Substrate study combines topics from a wide range of disciplines, such as Semiconductor structure, Semiconductor device and Buffer. His Epitaxy research incorporates elements of Single crystal, Mineralogy and Silicon-germanium. Eugene A. Fitzgerald focuses mostly in the field of Semiconductor, narrowing it down to topics relating to Nanotechnology and, in certain cases, Insulator.

His most cited work include:

  • Strained Si, SiGe, and Ge channels for high-mobility metal-oxide-semiconductor field-effect transistors (779 citations)
  • Totally relaxed GexSi1−x layers with low threading dislocation densities grown on Si substrates (701 citations)
  • Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing (558 citations)

What are the main themes of his work throughout his whole career to date?

Eugene A. Fitzgerald mostly deals with Optoelectronics, Silicon, Epitaxy, Substrate and Layer. His is involved in several facets of Optoelectronics study, as is seen by his studies on Wafer, Heterojunction, Germanium, Semiconductor and Chemical vapor deposition. In his research, Analytical chemistry and Raman spectroscopy is intimately related to Annealing, which falls under the overarching field of Germanium.

His study in Silicon is interdisciplinary in nature, drawing from both Electronic engineering, Doping, Gallium arsenide and Lattice constant. His research investigates the connection between Epitaxy and topics such as Dislocation that intersect with issues in Surface roughness. When carried out as part of a general Substrate research project, his work on Strained silicon is frequently linked to work in Communication channel, therefore connecting diverse disciplines of study.

He most often published in these fields:

  • Optoelectronics (73.42%)
  • Silicon (31.86%)
  • Epitaxy (24.53%)

What were the highlights of his more recent work (between 2015-2021)?

  • Optoelectronics (73.42%)
  • Wafer (19.59%)
  • Silicon (31.86%)

In recent papers he was focusing on the following fields of study:

Eugene A. Fitzgerald spends much of his time researching Optoelectronics, Wafer, Silicon, Epitaxy and Metalorganic vapour phase epitaxy. Much of his study explores Optoelectronics relationship to Layer. His Wafer research includes elements of Transistor, High-electron-mobility transistor, Gallium nitride and Si substrate.

His Silicon research incorporates themes from Diode, Substrate, Silicon oxide, Etching and Surface roughness. The Epitaxy study combines topics in areas such as Annealing, Lattice constant, Superlattice and Dislocation. His Metalorganic vapour phase epitaxy research also works with subjects such as

  • Heterojunction that intertwine with fields like Bipolar junction transistor,
  • Gallium arsenide which connect with Semiconductor, Triple junction and Solar cell,
  • Residual stress, which have a strong connection to Insulator.

Between 2015 and 2021, his most popular works were:

  • Remote epitaxy through graphene enables two-dimensional material-based layer transfer (175 citations)
  • Low-threshold optically pumped lasing in highly strained germanium nanowires. (57 citations)
  • Low-threshold optically pumped lasing in highly strained Ge nanowires (47 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Silicon

Eugene A. Fitzgerald mainly focuses on Optoelectronics, Silicon, Epitaxy, Metalorganic vapour phase epitaxy and Wafer. His studies deal with areas such as Substrate and Si substrate as well as Optoelectronics. His research in Germanium and Silicon nitride are components of Silicon.

His Epitaxy study deals with Lattice constant intersecting with Heterojunction, Bipolar junction transistor, Breakdown voltage and Heterojunction bipolar transistor. Eugene A. Fitzgerald has researched Wafer in several fields, including Transistor, High-electron-mobility transistor and Compound semiconductor. Eugene A. Fitzgerald works mostly in the field of Dislocation, limiting it down to topics relating to Surface roughness and, in certain cases, Crystallography, Annealing, Analytical chemistry and Doping, as a part of the same area of interest.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Strained Si, SiGe, and Ge channels for high-mobility metal-oxide-semiconductor field-effect transistors

Minjoo L. Lee;Eugene A. Fitzgerald;Mayank T. Bulsara;Matthew T. Currie.
Journal of Applied Physics (2005)

1211 Citations

Totally relaxed GexSi1−x layers with low threading dislocation densities grown on Si substrates

E. A. Fitzgerald;Y.‐H. Xie;M. L. Green;D. Brasen.
Applied Physics Letters (1991)

933 Citations

Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing

M. T. Currie;S. B. Samavedam;T. A. Langdo;C. W. Leitz.
Applied Physics Letters (1998)

741 Citations

Dislocations in strained-layer epitaxy : theory, experiment, and applications

E.A. Fitzgerald.
Materials Science Reports (1991)

709 Citations

Relaxed GexSi1−x structures for III–V integration with Si and high mobility two‐dimensional electron gases in Si

E. A. Fitzgerald;Y.‐H. Xie;D. Monroe;P. J. Silverman.
Journal of Vacuum Science & Technology B (1992)

697 Citations

Impurity enhancement of the 1.54‐μm Er3+ luminescence in silicon

J. Michel;J. L. Benton;R. F. Ferrante;D. C. Jacobson.
Journal of Applied Physics (1991)

578 Citations

Coherent phonon heat conduction in superlattices.

Maria N. Luckyanova;Jivtesh Garg;Keivan Esfarjani;Adam Jandl.
Science (2012)

552 Citations

Semiconductor structures employing strained material layers with defined impurity gradients and methods for fabricating same

Matthew T. Currie;Anthony J. Lochtefeld;Richard Hammond;Eugene A. Fitzgerald.
(2002)

471 Citations

Strained-semiconductor-on-insulator device structures

Anthony Lochtefeld;Thomas Langdo;Richard Hammond;Matthew Currie.
(2003)

435 Citations

Nucleation mechanisms and the elimination of misfit dislocations at mismatched interfaces by reduction in growth area

E. A. Fitzgerald;G. P. Watson;R. E. Proano;D. G. Ast.
Journal of Applied Physics (1989)

412 Citations

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