World's Best Scientists 2026 revealed!
Jurgen Michel

Jurgen Michel

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
67
Citations
22877
World Ranking
1053
National Ranking
446

Materials Science

D-Index
69
Citations
23731
World Ranking
4543
National Ranking
1203

Jurgen Michel publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Jurgen Michel sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 405 publications — 75th percentile

75% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Jurgen Michel D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Jurgen Michel sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 67 D-Index — 85th percentile

85% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Jurgen Michel is a researcher affiliated with MIT in the United States, specializing in engineering and physics domains. Their work predominantly spans electrical and electronic engineering as well as atomic and molecular physics, and optics. The scientific contributions cover a variety of topics within photonic and optical devices, semiconductor materials and devices, and semiconductor quantum structures and devices, alongside thin-film transistor technologies and nanowire synthesis and applications.

Their recent publications reflect this diverse scope in semiconductor and photonics research. Selected papers include:

  • A review of silicon-based wafer bonding processes, an approach to realize the monolithic integration of Si-CMOS and III-V-on-Si wafers, 2021, Journal of Semiconductors
  • Sub-mA/cm2 Dark Current Density, Buffer-Less Germanium (Ge) Photodiodes on a 200-mm Ge-on-Insulator Substrate, 2021, IEEE Transactions on Electron Devices
  • PIC-integrable, uniformly tensile-strained Ge-on-insulator photodiodes enabled by recessed SiNx stressor, 2021, Photonics Research
  • Effectiveness of InGaAs/GaAs superlattice dislocation filter layers epitaxially grown on 200 mm Si wafers with and without Ge buffers, 2020, Semiconductor Science and Technology
  • Trapping threading dislocations in germanium trenches on silicon wafer, 2020, Journal of Crystal Growth

Their frequent coauthors include Lionel C. Kimerling, Rui-Tao Wen, Kwang Hong Lee, Danhao Ma, and Chuan Seng Tan. These collaborations appear regularly in their work, with several joint publications primarily related to materials and device engineering.

Publication venues where Jurgen Michel often contributes include Applied Physics Letters, Journal of Lightwave Technology, Journal of Semiconductors, IEEE Transactions on Electron Devices, and Photonics Research. These publications serve as platforms for dissemination in the fields of photonics and semiconductor technology.

Their research spans several main fields of study:

  • Engineering
  • Physics and Astronomy

More detailed subfields of study cover:

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Biomedical Engineering
  • Artificial Intelligence
  • Materials Chemistry

Core topics consistently addressed in their research are:

  • Photonic and Optical Devices
  • Semiconductor materials and devices
  • Semiconductor Quantum Structures and Devices
  • Thin-Film Transistor Technologies
  • Nanowire Synthesis and Applications
  • Neural Networks and Reservoir Computing
  • Advanced Photonic Communication Systems

Best Publications

  • A Dielectric Omnidirectional Reflector

    Yoel Fink;Joshua N. Winn;Shanhui Fan;Chiping Chen

  • High-performance Ge-on-Si photodetectors

    Jurgen Michel;Jifeng Liu;Lionel C. Kimerling

  • Ge-on-Si laser operating at room temperature.

    Jifeng Liu;Xiaochen Sun;Rodolfo Camacho-Aguilera;Lionel C. Kimerling

  • An electrically pumped germanium laser

    Rodolfo E. Camacho-Aguilera;Yan Cai;Neil Patel;Jonathan T. Bessette

  • Totally relaxed GexSi1−x layers with low threading dislocation densities grown on Si substrates

    E. A. Fitzgerald;Y.‐H. Xie;M. L. Green;D. Brasen

  • Tensile-strained, n-type Ge as a gain medium for monolithic laser integration on Si

    Jifeng Liu;Xiaochen Sun;Dong Pan;Xiaoxin Wang

  • Waveguide-integrated, ultralow-energy GeSi electro-absorption modulators

    Jifeng Liu;Mark Beals;Andrew Pomerene;Sarah Bernardis

  • On-chip light sources for silicon photonics

    Zhiping Zhou;Bing Yin;Jurgen Michel

  • Impurity enhancement of the 1.54‐μm Er3+ luminescence in silicon

    J. Michel;J. L. Benton;R. F. Ferrante;D. C. Jacobson

  • High performance, waveguide integrated Ge photodetectors

    Donghwan Ahn;Ching-yin Hong;Jifeng Liu;Wojciech Giziewicz

  • Room‐temperature sharp line electroluminescence at λ=1.54 μm from an erbium‐doped, silicon light‐emitting diode

    B. Zheng;J. Michel;F. Y. G. Ren;L. C. Kimerling

  • Electrical properties of dislocations and point defects in plastically deformed silicon.

    P. Omling;E. R. Weber;L. Montelius;H. Alexander

  • Direct gap photoluminescence of n-type tensile-strained Ge-on-Si

    Xiaochen Sun;Jifeng Liu;Lionel C. Kimerling;Jurgen Michel

  • ELECTROLUMINESCENCE OF ERBIUM-DOPED SILICON

    J. Palm;F. Gan;B. Zheng;J. Michel

  • Nonlinear Group IV photonics based on silicon and germanium: from near-infrared to mid-infrared

    Lin Zhang;Anuradha M. Agarwal;Lionel C. Kimerling;Jurgen Michel

  • High-performance, tensile-strained Ge p-i-n photodetectors on a Si platform

    Jifeng Liu;Jurgen Michel;Wojciech Giziewicz;Dong Pan

  • Room-temperature direct bandgap electroluminesence from Ge-on-Si light-emitting diodes

    Xiaochen Sun;Jifeng Liu;Lionel C. Kimerling;Jurgen Michel

  • Tensile strained Ge p-i-n photodetectors on Si platform for C and L band telecommunications

    Jifeng Liu;Douglas D. Cannon;Kazumi Wada;Yasuhiko Ishikawa

  • ATAC: a 1000-core cache-coherent processor with on-chip optical network

    George Kurian;Jason E. Miller;James Psota;Jonathan Eastep

  • Horizontal single and multiple slot waveguides: optical transmission at λ=1550 nm

    Rong Sun;Po Dong;Ning-ning Feng;Ching-yin Hong

Frequent Co-Authors

Jifeng Liu
Jifeng Liu Dartmouth College
Lin Zhang
Lin Zhang Tianjin University
Guifang Li
Guifang Li University of Central Florida
Chuan Seng Tan
Chuan Seng Tan Nanyang Technological University
Mahmoud Rasras
Mahmoud Rasras New York University Abu Dhabi
Douglas M. Gill
Douglas M. Gill IBM (United States)
Xing Sheng
Xing Sheng Tsinghua University

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