World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
60
Citations
12647
World Ranking
7068
National Ranking
412

S. Mantl publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where S. Mantl sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 500 publications — 86th percentile

86% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

S. Mantl D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where S. Mantl sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 60 D-Index — 46th percentile

46% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

S. Mantl is affiliated with the Forschungszentrum Jülich in Germany. Their academic profile currently focuses on research contributions made within this institution.

There are no specific details available regarding recent papers, co-authors, publication venues, book publications, fields of study, subfields, or main research topics. Similarly, no awards or honors have been documented for S. Mantl.

Given the absence of these details, it is clear that further public documentation on S. Mantl's research output and academic contributions is limited or not available in the current dataset.

Best Publications

  • Lasing in direct-bandgap GeSn alloy grown on Si

    S. Wirths;R. Geiger;R. Geiger;N. von den Driesch;G. Mussler

  • Impact of the dimensionality on the performance of tunneling FETs: Bulk versus one-dimensional devices

    J. Knoch;S. Mantl;J. Appenzeller

  • Si–Ge–Sn alloys: From growth to applications

    S. Wirths;D. Buca;S. Mantl

  • Inverters With Strained Si Nanowire Complementary Tunnel Field-Effect Transistors

    L. Knoll;Qing-Tai Zhao;A. Nichau;S. Trellenkamp

  • Schottky barrier height modulation using dopant segregation in Schottky-barrier SOI-MOSFETs

    M. Zhang;J. Knoch;Q.T. Zhao;St. Lenk

  • Tuning of NiSi/Si Schottky barrier heights by sulfur segregation during Ni silicidation

    Q. T. Zhao;U. Breuer;E. Rije;St. Lenk

  • Strain relaxation mechanism for hydrogen-implanted Si1−xGex/Si(100) heterostructures

    H. Trinkaus;B. Holländer;St. Rongen;S. Mantl

  • Band engineering and growth of tensile strained Ge/(Si)GeSn heterostructures for tunnel field effect transistors

    S. Wirths;A. T. Tiedemann;Zoran Ikonic;P. Harrison

  • Direct Bandgap Group IV Epitaxy on Si for Laser Applications

    N. von den Driesch;D. Stange;S. Wirths;G. Mussler

  • Impact of electrostatics and doping concentration on the performance of silicon tunnel field-effect transistors

    C. Sandow;J. Knoch;C. Urban;Q.-T. Zhao

  • Strain relaxation of pseudomorphic heterostructures after hydrogen or helium ion implantation for virtual substrate fabrication

    B. Holländer;St. Lenk;S. Mantl;H. Trinkaus

  • Amorphous lanthanum lutetium oxide thin films as an alternative high-κ gate dielectric

    J. M. J. Lopes;M. Roeckerath;T. Heeg;E. Rije

  • Strain relaxation of epitaxial SiGe layers on Si(1 0 0) improved by hydrogen implantation

    S. Mantl;B. Holländer;R. Liedtke;S. Mesters

  • Effective Schottky barrier lowering in silicon-on-insulator Schottky-barrier metal-oxide-semiconductor field-effect transistors using dopant segregation

    J. Knoch;M. Zhang;Q. T. Zhao;St. Lenk

  • Ion beam synthesis of buried α-FeSi2 and β-FeSi2 layers

    K. Radermacher;S. Mantl;Ch. Dieker;H. Lüth

  • On the performance of single-gated ultrathin-body SOI Schottky-barrier MOSFETs

    J. Knoch;Min Zhang;S. Mantl;J. Appenzeller

  • Effect of helium ion implantation and annealing on the relaxation behavior of pseudomorphic Si1−xGex buffer layers on Si (100) substrates

    M. Luysberg;D. Kirch;H. Trinkaus;B. Holländer

  • GeSn/SiGeSn Heterostructure and Multi Quantum Well Lasers

    Daniela Stange;Nils von den Driesch;Nils von den Driesch;Thomas Zabel;Francesco Armand-Pilon

  • Short-wave infrared LEDs from GeSn/SiGeSn multiple quantum wells

    Daniela Stange;Nils von den Driesch;Denis Rainko;Søren Roesgaard

  • Optical Transitions in Direct-Bandgap Ge1–xSnx Alloys

    D. Stange;S. Wirths;N. von den Driesch;G. Mussler

  • Physics of ultrathin-body silicon-on-insulator Schottky-barrier field-effect transistors

    Joachim Knoch;M Zhang;Joerg Appenzeller;S Mantl

  • A vibrational study of ethanol adsorption on Si(100)

    Joseph Eng;Krishnan Raghavachari;Lisa M. Struck;Yves J. Chabal

Frequent Co-Authors

Qing-Tai Zhao
Qing-Tai Zhao Peking University
Jürgen Schubert
Jürgen Schubert Forschungszentrum Jülich
Zoran Ikonic
Zoran Ikonic University of Leeds
Joachim Knoch
Joachim Knoch RWTH Aachen University
Hans Lüth
Hans Lüth Forschungszentrum Jülich
Joerg Appenzeller
Joerg Appenzeller Purdue University West Lafayette
Hans Sigg
Hans Sigg Paul Scherrer Institute
Erich Kasper
Erich Kasper University of Stuttgart

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Best Scientists Citing S. Mantl

Trending Scientists

Recently Published Articles