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D-Index & Metrics

Materials Science

D-Index
56
Citations
11805
World Ranking
8227
National Ranking
473

W. Skorupa publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where W. Skorupa sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 678 publications — 95th percentile

95% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

W. Skorupa D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where W. Skorupa sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 56 D-Index — 37th percentile

37% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

W. Skorupa is affiliated with the Helmholtz-Zentrum Dresden-Rossendorf in Germany. Their research primarily focuses on materials science, with particular emphasis on materials chemistry and electronic, optical, and magnetic materials.

Their recent publication record includes the paper titled Methane as a novel doping precursor for deposition of highly conductive ZnO thin films by magnetron sputtering, published in 2020 in the journal Vacuum.

Frequent co-authors collaborating with Skorupa include:

  • A. V. Vasin
  • A.V. Rusavsky
  • Eugene G. Bortchagovsky
  • Y. V. Gomeniuk
  • А.С. Ніколенко

They have contributed to topics including:

  • ZnO doping and properties
  • Copper-based nanomaterials and applications
  • Ga2O3 and related materials

Skorupa's work has appeared in the journal Vacuum, reflecting a contribution in that venue.

Best Publications

  • Strong blue and violet photoluminescence and electroluminescence from germanium-implanted and silicon-implanted silicon-dioxide layers

    L. Rebohle;J. von Borany;R. A. Yankov;W. Skorupa

  • Blue photo- and electroluminescence of silicon dioxide layers ion-implanted with group IV elements

    L. Rebohle;J. von Borany;H. Fröb;W. Skorupa

  • Crystallographically oriented Co and Ni nanocrystals inside ZnO formed by ion implantation and postannealing

    Shengqiang Zhou;K. Potzger;J. von Borany;R. Grötzschel

  • Amorphization and recrystallization of 6H‐SiC by ion‐beam irradiation

    V. Heera;J. Stoemenos;R. Kögler;W. Skorupa

  • Defects in virgin and N + -implanted ZnO single crystals studied by positron annihilation, Hall effect, and deep-level transient spectroscopy

    G. Brauer;W. Anwand;W. Skorupa;J. Kuriplach

  • Fe implanted ferromagnetic ZnO

    K. Potzger;Shengqiang Zhou;H. Reuther;A. Muecklich

  • Bright green electroluminescence from Tb3+ in silicon metal-oxide-semiconductor devices

    Jiaming Sun;Wolfgang Skorupa;Thomas Dekorsy;Manfred Helm

  • Structural and magnetic properties of Mn-implanted Si

    Shengqiang Zhou;K. Potzger;Gufei Zhang;A. Mücklich

  • Room‐temperature, short‐wavelength (400–500 nm) photoluminescence from silicon‐implanted silicon dioxide films

    W. Skorupa;R. A. Yankov;I. E. Tyschenko;H. Fröb

  • p-Type doping of SiC by high dose Al implantation—problems and progress

    V. Heera;D. Panknin;W. Skorupa

  • Positron studies of defects in ion-implanted SiC.

    G. Brauer;W. Anwand;P. G. Coleman;A. P. Knights

  • Ferromagnetic Gd-implanted ZnO single crystals

    K. Potzger;Shengqiang Zhou;F. Eichhorn;M. Helm

  • Identification of Zn-vacancy-hydrogen complexes in ZnO single crystals: A challenge to positron annihilation spectroscopy

    G. Brauer;W. Anwand;D. Grambole;J. Grenzer

  • Multimodal impurity redistribution and nanocluster formation in Ge implanted silicon dioxide films

    J. von Borany;R. Grötzschel;K. H. Heinig;A. Markwitz

  • Superconducting state in a gallium-doped germanium layer at low temperatures.

    T. Herrmannsdörfer;V. Heera;O. Ignatchik;M. Uhlarz

  • Density and structural changes in SiC after amorphization and annealing

    V. Heera;F. Prokert;N. Schell;H. Seifarth

  • Room-temperature short-wavelength infrared Si photodetector

    Yonder Berencén;Slawomir Prucnal;Fang Liu;Ilona Skorupa

  • Advanced Thermal Processing of Ultrashallow Implanted Junctions Using Flash Lamp Annealing

    Wolfgang Skorupa;Thoralf Gebel;Rossen A. Yankov;Silke Paul

  • VISIBLE AND NEAR-INFRARED LUMINESCENCE FROM SILICON NANOSTRUCTURES FORMED BY ION IMPLANTATION AND PULSE ANNEALING

    G.A. Kachurin;I.E. Tyschenko;K.S. Zhuravlev;N.A. Pazdnikov

  • A review of thermal processing in the subsecond range: semiconductors and beyond

    Lars Rebohle;Slawomir Prucnal;Wolfgang Skorupa

  • ION-BEAM SYNTHESIS OF AMORPHOUS SIC FILMS : STRUCTURAL ANALYSIS AND RECRYSTALLIZATION

    C. Serre;L. Calvo‐Barrio;A. Pérez‐Rodríguez;A. Romano‐Rodríguez

Frequent Co-Authors

Alejandro Pérez-Rodríguez
Alejandro Pérez-Rodríguez University of Barcelona
Shengqiang Zhou
Shengqiang Zhou Helmholtz-Zentrum Dresden-Rossendorf
Joan Ramon Morante
Joan Ramon Morante Catalonia Institute for Energy Research
Albert Romano-Rodriguez
Albert Romano-Rodriguez University of Barcelona
Jürgen Fassbender
Jürgen Fassbender Helmholtz-Zentrum Dresden-Rossendorf
Peter Werner
Peter Werner Max Planck Society
Aleksandra B. Djurišić
Aleksandra B. Djurišić University of Hong Kong
Karl Leo
Karl Leo TU Dresden
Michael Lorenz
Michael Lorenz Leipzig University
Richard A. McMahon
Richard A. McMahon University of Warwick

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