World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
61
Citations
11519
World Ranking
6870
National Ranking
400

Jürgen Fassbender publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Jürgen Fassbender sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 323 publications — 65th percentile

65% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Jürgen Fassbender D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Jürgen Fassbender sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 61 D-Index — 48th percentile

48% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Jürgen Fassbender is affiliated with the Helmholtz-Zentrum Dresden-Rossendorf in Germany, contributing extensively to research in physics and engineering. Their research encompasses multiple subfields, particularly focusing on atomic and molecular physics, electrical and electronic engineering, biomedical engineering, condensed matter physics, and electronic, optical, and magnetic materials.

The main themes of Fassbender's research include magnetic properties of thin films, quantum and electron transport phenomena, physics of superconductivity and magnetism, magneto-optical properties and applications, characterization and applications of magnetic nanoparticles, magnetic properties and applications, and multiferroics and related materials.

Frequently publishing in scientific journals, Fassbender has contributed numerous works to the following venues:

  • IEEE Transactions on Magnetics
  • arXiv (Cornell University)
  • Physical Review B
  • Advanced Functional Materials
  • Nature Communications

The scientist has collaborated regularly with several co-authors, including Atsufumi Hirohata, Plamen Stamenov, Johannes Paulides, Nicoleta Lupu, and Lucian Prejbeanu, reflecting a consistent network of research partnerships.

Among their recent publications are:

  • "Untethered and ultrafast soft-bodied robots," 2020, Communications Materials
  • "Printable and Stretchable Giant Magnetoresistive Sensors for Highly Compliant and Skin-Conformal Electronics," 2021, Advanced Materials
  • "Flexible Magnetoreceptor with Tunable Intrinsic Logic for On-Skin Touchless Human-Machine Interfaces," 2021, Advanced Functional Materials
  • "Spin-wave frequency combs," 2022, Applied Physics Letters
  • "Flexomagnetism and vertically graded Néel temperature of antiferromagnetic Cr2O3 thin films," 2022, Nature Communications

The research contributions of Jürgen Fassbender span fields that merge physics with engineering disciplines, addressing fundamental and applied aspects of magnetic and electronic phenomena. Their work includes exploration of the magnetic behavior of thin films and nanoparticles, as well as development of devices and materials with potential applications in sensing, robotics, and human-machine interfacing technologies.

Best Publications

  • Tailoring magnetism by light-ion irradiation

    J Fassbender;D Ravelosona;D Ravelosona;Y Samson

  • Purely antiferromagnetic magnetoelectric random access memory

    Tobias Kosub;Martin Kopte;Ruben Hühne;Patrick Appel

  • Magnetic patterning by means of ion irradiation and implantation

    J. Fassbender;J. McCord

  • A bimodal soft electronic skin for tactile and touchless interaction in real time.

    Jin Ge;Xu Wang;Michael Drack;Oleksii Volkov

  • Magnetic vortex cores as tunable spin-wave emitters

    Sebastian Wintz;Sebastian Wintz;Vasil Tiberkevich;Markus Weigand;Jörg Raabe

  • Origin of magnetic moments in defective TiO 2 single crystals

    Shengqiang Zhou (周生强);E. Čižmár;K. Potzger;M. Krause

  • Room temperature ferromagnetism in carbon-implanted ZnO

    Shengqiang Zhou;Qingyu Xu;Kay Potzger;Georg Talut

  • Crystallographically oriented Co and Ni nanocrystals inside ZnO formed by ion implantation and postannealing

    Shengqiang Zhou;K. Potzger;J. von Borany;R. Grötzschel

  • Room temperature ferromagnetism in carbon-implanted ZnO

    Shengqiang Zhou;Qingyu Xu;Kay Potzger;Georg Talut

  • Local manipulation and reversal of the exchange bias field by ion irradiation in FeNi/FeMn double layers

    A. Mougin;T. Mewes;M. Jung;D. Engel

  • Emission and propagation of 1D and 2D spin waves with nanoscale wavelengths in anisotropic spin textures

    Volker Sluka;Tobias Schneider;Rodolfo A. Gallardo;Attila Kákay

  • Fe implanted ferromagnetic ZnO

    K. Potzger;Shengqiang Zhou;H. Reuther;A. Muecklich

  • Structural and magnetic properties of Mn-implanted Si

    Shengqiang Zhou;K. Potzger;Gufei Zhang;A. Mücklich

  • Intermixing and growth kinetics of the first Co monolayers on Cu(001)

    J. Fassbender;R. Allenspach;U. Dürig

  • Ferromagnetic Gd-implanted ZnO single crystals

    K. Potzger;Shengqiang Zhou;F. Eichhorn;M. Helm

  • Untethered and ultrafast soft-bodied robots

    Xu Wang;Guoyong Mao;Jin Ge;Michael Drack

  • Fe implanted ferromagnetic ZnO

    K. Potzger;Shengqiang Zhou;H. Reuther;A. Mücklich

  • Reconfigurable Spin-Wave Nonreciprocity Induced by Dipolar Interaction in a Coupled Ferromagnetic Bilayer

    R.A. Gallardo;T. Schneider;A.K. Chaurasiya;A. Oelschlägel;A. Oelschlägel

  • Oscillatory Surface In-Plane Lattice Spacing during Growth of Co and of Cu on a Cu(001) Single Crystal

    J. Fassbender;U. May;B. Schirmer;R. M. Jungblut

  • Suppression of magnetic-field pulse-induced magnetization precession by pulse tailoring

    M. Bauer;R. Lopusnik;J. Fassbender;B. Hillebrands

  • Electronic-skin compasses for geomagnetic field-driven artificial magnetoreception and interactive electronics

    Gilbert Santiago Cañón Bermúdez;Hagen Fuchs;Lothar Bischoff;Jürgen Fassbender

  • Structural and magnetic modifications of Cr-implanted Permalloy

    J. Fassbender;J. von Borany;A. Mücklich;K. Potzger

  • Introducing artificial length scales to tailor magnetic properties

    J Fassbender;T Strache;M O Liedke;D Markó

Frequent Co-Authors

Burkard Hillebrands
Burkard Hillebrands Technical University of Kaiserslautern
Shengqiang Zhou
Shengqiang Zhou Helmholtz-Zentrum Dresden-Rossendorf
Manfred Helm
Manfred Helm Helmholtz-Zentrum Dresden-Rossendorf
Denys Makarov
Denys Makarov Helmholtz-Zentrum Dresden-Rossendorf
Olav Hellwig
Olav Hellwig Chemnitz University of Technology
W. Skorupa
W. Skorupa Helmholtz-Zentrum Dresden-Rossendorf
René Hübner
René Hübner Helmholtz-Zentrum Dresden-Rossendorf
Franco Nori
Franco Nori University of Michigan–Ann Arbor
Heidemarie Schmidt
Heidemarie Schmidt Leibniz Institute of Photonic Technology

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