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H. von Känel

H. von Känel

ETH Zurich
Switzerland

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 53 9331 9009 133 126 350 8445

H. von Känel publications per year

The chart shows the history of publications by H. von Känel between 1976 and 2022, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. H. von Känel published across 47 years, from 1976 to 2022, averaging 7.6 papers a year. Output peaked at 20 publications in 1995. 2 of the 356 publications appeared in the last two years.

No. of publications
5 10 15 20
Bar chart. Horizontal axis: year, 1976 to 2022. Vertical axis: number of publications, 0 to 20. Peak 20 publications in 1995. 1976: 1 publication 1977: 1 publication 1978: 2 publications 1979: 1 publication 1980: 0 publications 1981: 3 publications 1982: 1 publication 1983: 0 publications 1984: 4 publications 1985: 3 publications 1986: 1 publication 1987: 6 publications 1988: 5 publications 1989: 11 publications 1990: 7 publications 1991: 13 publications 1992: 8 publications 1993: 12 publications 1994: 15 publications 1995: 20 publications 1996: 11 publications 1997: 8 publications 1998: 14 publications 1999: 7 publications 2000: 13 publications 2001: 5 publications 2002: 13 publications 2003: 18 publications 2004: 18 publications 2005: 11 publications 2006: 14 publications 2007: 8 publications 2008: 17 publications 2009: 11 publications 2010: 5 publications 2011: 5 publications 2012: 6 publications 2013: 10 publications 2014: 15 publications 2015: 4 publications 2016: 10 publications 2017: 7 publications 2018: 7 publications 2019: 2 publications 2020: 1 publication 2021: 1 publication 2022: 1 publication
1976 2022

356 publications in total across all disciplines

View publications per year as a table
H. von Känel: publications per year, 1976 to 2022
Year Publications
1976 1
1977 1
1978 2
1979 1
1980 0
1981 3
1982 1
1983 0
1984 4
1985 3
1986 1
1987 6
1988 5
1989 11
1990 7
1991 13
1992 8
1993 12
1994 15
1995 20
1996 11
1997 8
1998 14
1999 7
2000 13
2001 5
2002 13
2003 18
2004 18
2005 11
2006 14
2007 8
2008 17
2009 11
2010 5
2011 5
2012 6
2013 10
2014 15
2015 4
2016 10
2017 7
2018 7
2019 2
2020 1
2021 1
2022 1
Total 356
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H. von Känel publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where H. von Känel sits on this spectrum.

No. of scientists
200 400 600 800
Bar chart with 57 bars. Horizontal axis: publications, 50–69 to 1,163+. Vertical axis: number of scientists, 0 to 891. Most scientists, 891, have 190–209 publications. The last bar groups every scientist with 1,163 publications or more. The highlighted bar, 350–369 publications, is where this scientist sits. 50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50–69 publications 1,163+

This scientist: 350 publications — 70th percentile

70% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table
Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications Scientists This scientist
50–69 28
70–89 152
90–109 356
110–129 487
130–149 723
150–169 835
170–189 850
190–209 891
210–229 862
230–249 766
250–269 726
270–289 665
290–309 593
310–329 537
330–349 477
350–369 440 350
370–389 356
390–409 321
410–429 256
430–449 246
450–469 216
470–489 212
490–509 174
510–529 194
530–549 162
550–569 131
570–589 111
590–609 103
610–629 99
630–649 77
650–669 92
670–689 56
690–709 53
710–729 53
730–749 38
750–769 52
770–789 43
790–809 38
810–829 34
830–849 25
850–869 18
870–889 20
890–909 24
910–929 27
930–949 20
950–969 17
970–989 10
990–1,009 16
1,010–1,029 13
1,030–1,049 12
1,050–1,069 9
1,070–1,089 8
1,090–1,109 7
1,110–1,129 9
1,130–1,149 2
1,150–1,162 5
1,163+ 100
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H. von Känel D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where H. von Känel sits on this spectrum.

No. of scientists
200 400 600
Bar chart with 64 bars. Horizontal axis: D-Index, 40–41 to 165+. Vertical axis: number of scientists, 0 to 667. Most scientists, 667, have 52–53 D-Index. The last bar groups every scientist with 165 D-Index or more. The highlighted bar, 52–53 D-Index, is where this scientist sits. 40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40–41 D-Index 165+

This scientist: 53 D-Index — 30th percentile

30% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table
Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index Scientists This scientist
40–41 211
42–43 450
44–45 612
46–47 612
48–49 598
50–51 657
52–53 667 53
54–55 621
56–57 597
58–59 610
60–61 587
62–63 606
64–65 533
66–67 490
68–69 469
70–71 378
72–73 421
74–75 359
76–77 323
78–79 299
80–81 230
82–83 210
84–85 195
86–87 203
88–89 175
90–91 175
92–93 142
94–95 121
96–97 117
98–99 107
100–101 88
102–103 85
104–105 68
106–107 62
108–109 57
110–111 45
112–113 49
114–115 50
116–117 34
118–119 38
120–121 37
122–123 29
124–125 28
126–127 24
128–129 33
130–131 28
132–133 21
134–135 20
136–137 23
138–139 17
140–141 12
142–143 17
144–145 21
146–147 13
148–149 11
150–151 14
152–153 13
154–155 9
156–157 10
158–159 7
160–161 4
162–163 4
164 3
165+ 98
Download as CSV

Overview

H. von Känel is affiliated with ETH Zurich in Switzerland and has contributed to the fields of Engineering and Materials Science, with a specific focus on subfields such as Electrical and Electronic Engineering, Materials Chemistry, and Structural Biology.

The main topics explored in von Känel's research include:

  • Silicon Nanostructures and Photoluminescence
  • Advanced Electron Microscopy Techniques and Applications
  • Integrated Circuits and Semiconductor Failure Analysis
  • Thin-Film Transistor Technologies
  • Silicon and Solar Cell Technologies
  • 3D IC and TSV technologies
  • Advancements in Semiconductor Devices and Circuit Design

Von Känel's recent papers cover several specialized aspects of crystallography and semiconductor technologies. These publications are:

  • "The Radon transform as a tool for 3D reciprocal-space mapping of epitaxial microcrystals," 2022, Journal of Applied Crystallography
  • "X-ray rocking curve imaging on large arrays of extremely tall SiGe microcrystals epitaxial on Si," 2021, Journal of Applied Crystallography
  • "A GaAs/Si X-Ray Pixel Detector Based on Low Temperature Covalent Wafer Bonding," 2020, ECS Meeting Abstracts

The frequent coauthors collaborating with von Känel include:

  • Franco Bressan
  • Mojmír Meduňa
  • Fabio Isa
  • Ondřej Caha

Von Känel's work has been published most often in the following venues:

  • Journal of Applied Crystallography
  • ECS Meeting Abstracts

Best Publications

  • Growth and characterization of epitaxial Ni and Co silicides

    H. von Känel

  • Barrierless formation and faceting of SiGe islands on Si(001).

    J. Tersoff;B. J. Spencer;A. Rastelli;H. von Känel;H. von Känel

  • Structural and electronic properties of metastable epitaxial FeSi1+x films on Si(111).

    H. von Känel;K. A. Mäder;E. Müller;N. Onda

  • Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices

    G. Isella;D. Chrastina;B. Rössner;T. Hackbarth

  • Reversible shape evolution of Ge islands on Si(001).

    A. Rastelli;M. Kummer;H. von Känel

  • Silicon epitaxy by low-energy plasma enhanced chemical vapor deposition

    C. Rosenblad;H. R. Deller;A. Dommann;T. Meyer

  • High hole mobility in Si0.17Ge0.83 channel metal–oxide–semiconductor field-effect transistors grown by plasma-enhanced chemical vapor deposition

    G. Höck;E. Kohn;C. Rosenblad;H. von Känel

  • Atomic-scale pathway of the pyramid-to-dome transition during Ge growth on Si(001)

    F. Montalenti;P. Raiteri;D. B. Migas;H. von Känel

  • Epitaxy of fluorite-structure silicides: metastable cubic FeSi2 on Si(111)

    N. Onda;J. Henz;E. Müller;K.A. Mäder

  • Critical Role of the Surface Reconstruction in the Thermodynamic Stability of { 105 } Ge Pyramids on Si(001)

    P. Raiteri;D. B. Migas;Leo Miglio;A. Rastelli

  • Universal shapes of self-organized semiconductor quantum dots: Striking similarities between InAs∕GaAs(001) and Ge∕Si(001)

    G. Costantini;A. Rastelli;C. Manzano;R. Songmuang

  • Ultralow dark current Ge/Si(100) photodiodes with low thermal budget

    J. Osmond;G. Isella;D. Chrastina;R. Kaufmann

  • Very high hole mobilities in modulation-doped Ge quantum wells grown by low-energy plasma enhanced chemical vapor deposition

    Hans von Känel;Matthias Kummer;Giovanni Isella;Elisabeth Müller

  • Surface evolution of faceted islands

    Armando Rastelli;Hans von Känel;Hans von Känel

  • Phase transition from pseudomorphic FeSi 2 to β- FeSi 2 /Si(111) studied by in situ scanning tunneling microscopy

    H. Sirringhaus;N. Onda;E. Müller-Gubler;P. Müller

  • Alternatives to thick MBE-grown relaxed SiGe buffers

    T Hackbarth;H.-J Herzog;M Zeuner;G Höck

  • Scattering mechanisms in high-mobility strained Ge channels

    B. Rössner;D. Chrastina;G. Isella;H. von Känel

  • Raman spectroscopy determination of composition and strain in Si1-xGex/Si heterostructures

    F. Pezzoli;E. Bonera;E. Grilli;M. Guzzi

  • A plasma process for ultrafast deposition of SiGe graded buffer layers

    C. Rosenblad;H. von Känel;M. Kummer;A. Dommann

  • Monolayer resolution by means of x-ray interference in semiconductor heterostructures

    L. Tapfer;M. Ospelt;H. von Känel

  • Strain relaxation of GaAs/Ge crystals on patterned Si substrates

    A. G. Taboada;T. Kreiliger;C. V. Falub;F. Isa

Frequent Co-Authors

Giovanni Isella
Giovanni Isella Polytechnic University of Milan
Henning Sirringhaus
Henning Sirringhaus University of Cambridge
Armando Rastelli
Armando Rastelli Johannes Kepler University of Linz
Antonia Neels
Antonia Neels Swiss Federal Laboratories for Materials Science and Technology
Julian Stangl
Julian Stangl Johannes Kepler University of Linz
G. Bauer
G. Bauer Johannes Kepler University of Linz
Hans Sigg
Hans Sigg Paul Scherrer Institute
Douglas J. Paul
Douglas J. Paul University of Glasgow
Marco Fanciulli
Marco Fanciulli University of Milano-Bicocca
Jerry Tersoff
Jerry Tersoff IBM (United States)

External Links

Personal website of H. von Känel

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Best Scientists Citing H. von Känel

Giovanni Isella

Giovanni Isella

Polytechnic University of Milan

Publications: 183

Oliver G. Schmidt

Oliver G. Schmidt

Chemnitz University of Technology

Publications: 51

Eugene A. Fitzgerald

Eugene A. Fitzgerald

MIT

Publications: 51

Douglas J. Paul

Douglas J. Paul

University of Glasgow

Publications: 46

Armando Rastelli

Armando Rastelli

Johannes Kepler University of Linz

Publications: 37

Laurent Vivien

Laurent Vivien

University of Paris-Saclay

Publications: 36

Matthew T. Currie

Matthew T. Currie

Morgan, Lewis & Bockius LLP

Publications: 35

Giovanni Capellini

Giovanni Capellini

Roma Tre University

Publications: 33

G. Bauer

G. Bauer

Johannes Kepler University of Linz

Publications: 25

Julian Stangl

Julian Stangl

Johannes Kepler University of Linz

Publications: 22

Delphine Marris-Morini

Delphine Marris-Morini

University of Paris-Saclay

Publications: 22

André Vantomme

André Vantomme

KU Leuven

Publications: 22

Candido Pirri

Candido Pirri

Polytechnic University of Turin

Publications: 20

Friedrich Schäffler

Friedrich Schäffler

Johannes Kepler University of Linz

Publications: 20

S. Mantl

S. Mantl

Forschungszentrum Jülich

Publications: 17

Jose Menendez

Jose Menendez

Arizona State University

Publications: 15

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