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H. von Känel

H. von Känel

D-Index & Metrics

Materials Science

D-Index
53
Citations
8445
World Ranking
9333
National Ranking
132

Overview

H. von Känel is affiliated with ETH Zurich in Switzerland and has contributed to the fields of Engineering and Materials Science, with a specific focus on subfields such as Electrical and Electronic Engineering, Materials Chemistry, and Structural Biology.

The main topics explored in von Känel's research include:

  • Silicon Nanostructures and Photoluminescence
  • Advanced Electron Microscopy Techniques and Applications
  • Integrated Circuits and Semiconductor Failure Analysis
  • Thin-Film Transistor Technologies
  • Silicon and Solar Cell Technologies
  • 3D IC and TSV technologies
  • Advancements in Semiconductor Devices and Circuit Design

Von Känel's recent papers cover several specialized aspects of crystallography and semiconductor technologies. These publications are:

  • "The Radon transform as a tool for 3D reciprocal-space mapping of epitaxial microcrystals," 2022, Journal of Applied Crystallography
  • "X-ray rocking curve imaging on large arrays of extremely tall SiGe microcrystals epitaxial on Si," 2021, Journal of Applied Crystallography
  • "A GaAs/Si X-Ray Pixel Detector Based on Low Temperature Covalent Wafer Bonding," 2020, ECS Meeting Abstracts

The frequent coauthors collaborating with von Känel include:

  • Franco Bressan
  • Mojmír Meduňa
  • Fabio Isa
  • Ondřej Caha

Von Känel's work has been published most often in the following venues:

  • Journal of Applied Crystallography
  • ECS Meeting Abstracts

Best Publications

  • Growth and characterization of epitaxial Ni and Co silicides

    H. von Känel

  • Barrierless formation and faceting of SiGe islands on Si(001).

    J. Tersoff;B. J. Spencer;A. Rastelli;H. von Känel;H. von Känel

  • Structural and electronic properties of metastable epitaxial FeSi1+x films on Si(111).

    H. von Känel;K. A. Mäder;E. Müller;N. Onda

  • Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices

    G. Isella;D. Chrastina;B. Rössner;T. Hackbarth

  • Reversible shape evolution of Ge islands on Si(001).

    A. Rastelli;M. Kummer;H. von Känel

  • Silicon epitaxy by low-energy plasma enhanced chemical vapor deposition

    C. Rosenblad;H. R. Deller;A. Dommann;T. Meyer

  • High hole mobility in Si0.17Ge0.83 channel metal–oxide–semiconductor field-effect transistors grown by plasma-enhanced chemical vapor deposition

    G. Höck;E. Kohn;C. Rosenblad;H. von Känel

  • Atomic-scale pathway of the pyramid-to-dome transition during Ge growth on Si(001)

    F. Montalenti;P. Raiteri;D. B. Migas;H. von Känel

  • Epitaxy of fluorite-structure silicides: metastable cubic FeSi2 on Si(111)

    N. Onda;J. Henz;E. Müller;K.A. Mäder

  • Critical Role of the Surface Reconstruction in the Thermodynamic Stability of { 105 } Ge Pyramids on Si(001)

    P. Raiteri;D. B. Migas;Leo Miglio;A. Rastelli

  • Universal shapes of self-organized semiconductor quantum dots: Striking similarities between InAs∕GaAs(001) and Ge∕Si(001)

    G. Costantini;A. Rastelli;C. Manzano;R. Songmuang

  • Ultralow dark current Ge/Si(100) photodiodes with low thermal budget

    J. Osmond;G. Isella;D. Chrastina;R. Kaufmann

  • Very high hole mobilities in modulation-doped Ge quantum wells grown by low-energy plasma enhanced chemical vapor deposition

    Hans von Känel;Matthias Kummer;Giovanni Isella;Elisabeth Müller

  • Surface evolution of faceted islands

    Armando Rastelli;Hans von Känel;Hans von Känel

  • Phase transition from pseudomorphic FeSi 2 to β- FeSi 2 /Si(111) studied by in situ scanning tunneling microscopy

    H. Sirringhaus;N. Onda;E. Müller-Gubler;P. Müller

  • Alternatives to thick MBE-grown relaxed SiGe buffers

    T Hackbarth;H.-J Herzog;M Zeuner;G Höck

  • Scattering mechanisms in high-mobility strained Ge channels

    B. Rössner;D. Chrastina;G. Isella;H. von Känel

  • Raman spectroscopy determination of composition and strain in Si1-xGex/Si heterostructures

    F. Pezzoli;E. Bonera;E. Grilli;M. Guzzi

  • A plasma process for ultrafast deposition of SiGe graded buffer layers

    C. Rosenblad;H. von Känel;M. Kummer;A. Dommann

  • Monolayer resolution by means of x-ray interference in semiconductor heterostructures

    L. Tapfer;M. Ospelt;H. von Känel

  • Strain relaxation of GaAs/Ge crystals on patterned Si substrates

    A. G. Taboada;T. Kreiliger;C. V. Falub;F. Isa

Frequent Co-Authors

Giovanni Isella
Giovanni Isella Polytechnic University of Milan
Henning Sirringhaus
Henning Sirringhaus University of Cambridge
Armando Rastelli
Armando Rastelli Johannes Kepler University of Linz
Antonia Neels
Antonia Neels Swiss Federal Laboratories for Materials Science and Technology
Julian Stangl
Julian Stangl Johannes Kepler University of Linz
G. Bauer
G. Bauer Johannes Kepler University of Linz
Hans Sigg
Hans Sigg Paul Scherrer Institute
Douglas J. Paul
Douglas J. Paul University of Glasgow
Marco Fanciulli
Marco Fanciulli University of Milano-Bicocca
Jerry Tersoff
Jerry Tersoff IBM (United States)

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