World's Best Scientists 2026 revealed!
André Vantomme

André Vantomme

D-Index & Metrics

Materials Science

D-Index
50
Citations
11204
World Ranking
10123
National Ranking
114

André Vantomme publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where André Vantomme sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 542 publications — 89th percentile

89% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

André Vantomme D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where André Vantomme sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 50 D-Index — 22nd percentile

22% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

André Vantomme is affiliated with KU Leuven in Belgium and has contributed to numerous research areas primarily within engineering and physics. Their work spans multiple fields, including electrical and electronic engineering, atomic and molecular physics and optics, materials chemistry, computational mechanics, and radiation.

The scientist has a significant number of publications related to semiconductor materials and interfaces, silicon and solar cell technologies, ion-surface interactions and analysis, semiconductor materials and devices, electronic and structural properties of oxides, thin-film transistor technologies, and electron and X-ray spectroscopy techniques.

Frequent co-authors of André Vantomme include Clément Porret, L. M. C. Pereira, R. J. H. Morris, Roger Loo, and Andriy Hikavyy, reflecting ongoing collaborative research efforts.

André Vantomme's recent papers provide insight into various specialized study areas:

  • Observation of the radiative decay of the 229Th nuclear clock isomer, 2023, Nature
  • Acid-Base Mediated Ligand Exchange on Near-Infrared Absorbing, Indium-Based III-V Colloidal Quantum Dots, 2021, Journal of the American Chemical Society
  • Direct Structural Identification and Quantification of the Split-Vacancy Configuration for Implanted Sn in Diamond, 2020, Physical Review Letters
  • Magnesium-Vacancy Optical Centers in Diamond, 2022, ACS Photonics
  • The influence of phonon softening on the superconducting critical temperature of Sn nanostructures, 2020, Scientific Reports

They have frequently published in venues such as ECS Meeting Abstracts, Scientific Reports, ECS Transactions, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, and Chemistry of Materials.

Best Publications

  • Size-dependent optical properties of colloidal PbS quantum dots.

    Iwan Moreels;Karel Lambert;Dries Smeets;David De Muynck

  • Light Absorption Coefficient of CsPbBr3 Perovskite Nanocrystals.

    Jorick Maes;Lieve Balcaen;Emile Drijvers;Qiang Zhao

  • Binding of phosphonic acids to CdSe quantum dots : a solution NMR study

    Raquel Gomes;Antti Hassinen;Agnieszka Szczygiel;Qiang Zhao

  • Crystalline Properties and Strain Relaxation Mechanism of CVD Grown GeSn

    F. Gencarelli;B. Vincent;J. Demeulemeester;A. Vantomme

  • Selective Removal of N‐Heterocyclic Aromatic Contaminants from Fuels by Lewis Acidic Metal–Organic Frameworks

    Michael Maes;Maarten Trekels;Mohammed Boulhout;Stijn Schouteden

  • Cooperative Catalysis for Multistep Biomass Conversion with Sn/Al Beta Zeolite

    Jan Dijkmans;Michiel Dusselier;Dries Gabriëls;Kristof Houthoofd

  • Semiconducting Mg2Si thin films prepared by molecular-beam epitaxy.

    John E. Mahan;André Vantomme;Guido Langouche;James P. Becker

  • Characterization of GeSn materials for future Ge pMOSFETs source/drain stressors

    B. Vincent;Y. Shimura;S. Takeuchi;T. Nishimura

  • Multiferroic BaTiO 3 -BiFeO 3 composite thin films and multilayers: strain engineering and magnetoelectric coupling

    Michael Lorenz;Vera Lazenka;Peter Schwinkendorf;Francis Bern

  • Critical size for exchange bias in ferromagnetic-antiferromagnetic particles

    AN Dobrynin;DN Ievlev;Kristiaan Temst;Peter Lievens

  • Identification of the prime optical center in GaN:Eu3+

    I. S Roqan;K. P O'Donnell;R. W Martin;P. R Edwards

  • Compound phase formation in thin film structures

    René Pretorius;Christiaan C. Theron;André Vantomme;James W. Mayer

  • Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2

    Alessandra Satta;Alessandra Satta;J Schuhmacher;CM Whelan;Wilfried Vandervorst

  • Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition.

    Jolien Dendooven;Ranjith K. Ramachandran;Eduardo Solano;Mert Kurttepeli

  • An Inner-/Outer-Sphere Stabilized Sn Active Site in β-Zeolite: Spectroscopic Evidence and Kinetic Consequences

    Jan Dijkmans;Michiel Dusselier;Wout Janssens;Maarten Trekels

  • Site location of Co in beta-FeSi2

    I Dezsi;C Fetzer;M Kiss;S Degroote

  • DIRECT EVIDENCE FOR TETRAHEDRAL INTERSTITIAL ER IN SI

    U. Wahl;A. Vantomme;J. De Wachter;R. Moons

  • Epitaxial CoSi2 films on Si(100) by solid‐phase reaction

    André Vantomme;Marc‐A. Nicolet;N. David Theodore

  • The Removal of Copper Oxides by Ethyl Alcohol Monitored In Situ by Spectroscopic Ellipsometry

    Alessandra Satta;Denis Shamiryan;Mikhaı̈l R. Baklanov;Caroline M. Whelan

  • Thin film growth of semiconducting Mg2Si by codeposition

    André Vantomme;John E. Mahan;Guido Langouche;James P. Becker

  • Optical energies of AlInN epilayers

    K Wang;R W Martin;D Amabile;P R Edwards

Frequent Co-Authors

Christophe Detavernier
Christophe Detavernier Ghent University
Karen Maex
Karen Maex University of Amsterdam
João P. Araújo
João P. Araújo University of Porto
Eduardo Alves
Eduardo Alves Instituto Superior Técnico
Timo Sajavaara
Timo Sajavaara University of Jyväskylä
Christian Lavoie
Christian Lavoie IBM (United States)

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