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D-Index & Metrics

Materials Science

D-Index
64
Citations
11442
World Ranking
6009
National Ranking
25

Timo Sajavaara publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Timo Sajavaara sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 273 publications — 53rd percentile

53% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Timo Sajavaara D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Timo Sajavaara sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 64 D-Index — 55th percentile

55% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Timo Sajavaara is a researcher affiliated with the University of Jyväskylä in Finland. Their academic work primarily spans the fields of Engineering and Materials Science, with a notable focus on subfields such as Electrical and Electronic Engineering, Materials Chemistry, Computational Mechanics, Biomedical Engineering, and Electronic, Optical and Magnetic Materials.

Their research interests cover various topics, including:

  • Semiconductor materials and devices
  • Electronic and Structural Properties of Oxides
  • Catalytic Processes in Materials Science
  • Ion-surface interactions and analysis
  • ZnO doping and properties
  • Diamond and Carbon-based Materials Research
  • Electrocatalysts for Energy Conversion

Recent publications by Sajavaara reflect a diverse scientific portfolio. Selected papers include:

  • "Droplet slipperiness despite surface heterogeneity at molecular scale," 2023, published in Nature Chemistry
  • "Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films," 2020, InfoMat
  • "Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition," 2021, Thin Solid Films
  • "Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering," 2020, Apollo (University of Cambridge)
  • "What Determines the Electrochemical Properties of Nitrogenated Amorphous Carbon Thin Films?," 2021, Chemistry of Materials

Frequent collaborators include colleagues who have coauthored multiple times, such as Jaakko Julin (13 papers), Kai Arstila (9 papers), Mikko Laitinen (9 papers), Mari Napari (6 papers), and Sami Kinnunen (6 papers).

Sajavaara's work often appears in publication venues such as:

  • Chemistry of Materials
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Nature Chemistry
  • Journal of Applied Physics
  • Materials Advances

The scope of Sajavaara's research outputs includes studies on semiconductor device engineering, oxide material properties, catalytic behaviors in materials science, and ion-surface interaction mechanisms. Their multidisciplinary approach draws on experimental and computational methods, reflected in the breadth of topics and venues.

Best Publications

  • Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

    Mikko Ritala;Kaupo Kukli;Antti Rahtu;Petri I. Räisänen

  • Atomic Layer Deposition of Platinum Thin Films

    Titta Aaltonen;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

  • Effect of water dose on the atomic layer deposition rate of oxide thin films

    Raija Matero;Antti Rahtu;Mikko Ritala;Markku Leskelä

  • Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water

    Viljami Pore;Antti Rahtu;Markku Leskelä;Mikko Ritala

  • Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water

    Kaupo Kukli;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

  • Potku - New analysis software for heavy ion elastic recoil detection analysis

    Kai Arstila;Jaakko Julin;Mikko Laitinen;Jarkko Aalto

  • Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

    Kaupo Kukli;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

  • Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

    Kaupo Kukli;Mikko Ritala;Jonas Sundqvist;Jaan Aarik

  • Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

    Oili M.E. Ylivaara;Xuwen Liu;Lauri Kilpi;Jussi Lyytinen

  • Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2

    Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Mikael Schuisky;Markku Leskelä

  • Detection efficiency of time-of-flight energy elastic recoil detection analysis systems

    Yanwen Zhang;Harry J. Whitlow;Thomas Winzell;Ian F. Bubb

  • Atomic Layer Deposition of SrTiO3 Thin Films from a Novel Strontium Precursor–Strontium‐bis(tri‐isopropyl cyclopentadienyl)

    Marko Vehkamäki;Timo Hänninen;Mikko Ritala;Markku Leskelä

  • Low-temperature ALE deposition of Y2O3 thin films from β-diketonate precursors

    Matti Putkonen;Timo Sajavaara;Leena-Sisko Johansson;Lauri Niinistö

  • Atomic layer deposition of polyimide thin films

    Matti Putkonen;Jenni Harjuoja;Timo Sajavaara;Lauri Niinistö

  • Properties of AlN grown by plasma enhanced atomic layer deposition

    Markus Bosund;Timo Sajavaara;Mikko Laitinen;Teppo Huhtio

  • Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films

    Maarit Kariniemi;Jaakko Niinistö;Timo Hatanpää;Marianna Kemell

  • Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation

    F Iacopi;Y Travaly;B Eyckens;C Waldfried

  • Atomic Layer Deposition of Ta(Al)N(C) Thin Films Using Trimethylaluminum as a Reducing Agent

    Petra Alén;Marika Juppo;Mikko Ritala;Timo Sajavaara

  • Low-temperature atomic layer deposition of ZnO thin films: Control of crystallinity and orientation

    Jari Malm;Elina Sahramo;Juho Perälä;Timo Sajavaara

  • Analysis of ALD-processed thin films by ion-beam techniques

    Matti Putkonen;Timo Sajavaara;Lauri Niinistö;Juhani Keinonen

  • Surface-controlled growth of LaAlO3 thin films by atomic layer epitaxy

    Minna Nieminen;Timo Sajavaara;Eero Rauhala;Matti Putkonen

Frequent Co-Authors

Mikko Ritala
Mikko Ritala University of Helsinki
Markku Leskelä
Markku Leskelä University of Helsinki
Juhani Keinonen
Juhani Keinonen University of Helsinki
Kaupo Kukli
Kaupo Kukli University of Tartu
Matti Putkonen
Matti Putkonen University of Helsinki
Harri Lipsanen
Harri Lipsanen Aalto University
Lauri Niinistö
Lauri Niinistö Aalto University
Maarit Karppinen
Maarit Karppinen Aalto University

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