World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
45
Citations
6777
World Ranking
11829
National Ranking
53

Matti Putkonen publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Matti Putkonen sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 180 publications — 24th percentile

24% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Matti Putkonen D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Matti Putkonen sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 45 D-Index — 10th percentile

10% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Matti Putkonen is affiliated with the University of Helsinki in Finland and has contributed extensively to the fields of materials science and engineering. Their research output reflects a focus on materials chemistry and electrical and electronic engineering, with a significant emphasis on semiconductor materials and devices as well as catalytic processes.

Their recent publications illustrate a wide range of interests within these domains. For instance, in 2020, a paper titled "HOR Activity of Pt-TiO2-Y at Unconventionally High Potentials Explained: The Influence of SMSI on the Electrochemical Behavior of Pt" appeared in the Journal of The Electrochemical Society. Other notable works include a 2022 article, "Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research", published in the Review of Scientific Instruments. In 2021, research on the oxidative molecular layer deposition (MLD) of conductive PEDOT thin films was published in ACS Omega under the title "Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl5 as Precursors". Other papers include a 2020 study in Coatings on zinc-sulfur hybrid films and a 2023 work in Chemistry of Materials about atomic layer deposition of zinc oxide on mesoporous zirconia.

The frequent co-authors associated with their work are:

  • Mikko Ritala (15 collaborations)
  • Mykhailo Chundak (7 collaborations)
  • Kenichiro Mizohata (7 collaborations)
  • Anton Vihervaara (7 collaborations)
  • Marko Vehkamäki (6 collaborations)

The primary publication venues for works by Matti Putkonen include:

  • ACS Omega (4 publications)
  • Advanced Materials Interfaces (4 publications)
  • Chemistry of Materials (3 publications)
  • Coatings (3 publications)
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 publications)

The research spans multiple subfields within materials science and engineering, highlighting the following areas:

  • Materials Chemistry
  • Electrical and Electronic Engineering
  • Renewable Energy, Sustainability and the Environment
  • Electronic, Optical and Magnetic Materials
  • Catalysis

Within these areas, specific topics addressed in their work include:

  • Semiconductor materials and devices
  • Catalytic Processes in Materials Science
  • Electronic and Structural Properties of Oxides
  • ZnO doping and properties
  • Electrocatalysts for Energy Conversion
  • Ga2O3 and related materials
  • Metal and Thin Film Mechanics

Best Publications

  • Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials

    Lauri Niinistö;Jani Päiväsaari;Jaakko Niinistö;Matti Putkonen

  • Process for producing zirconium oxide thin films

    Matti Putkonen

  • Formation and stability of lanthanum oxide thin films deposited from β-diketonate precursor

    Minna Nieminen;Matti Putkonen;Lauri Niinistö

  • A comparative study on lanthanide oxide thin films grown by atomic layer deposition

    Jani Päiväsaari;Matti Putkonen;Lauri Niinistö

  • Method of depositing rare earth oxide thin films

    Jaakko Niinisto;Matti Putkonen;Mikko Ritala;Petri Raisanen

  • Effect of annealing in processing of strontium titanate thin films by ALD

    Anne Kosola;Matti Putkonen;Leena-Sisko Johansson;Lauri Niinistö

  • Low-temperature ALE deposition of Y2O3 thin films from β-diketonate precursors

    Matti Putkonen;Timo Sajavaara;Leena-Sisko Johansson;Lauri Niinistö

  • Atomic layer deposition of polyimide thin films

    Matti Putkonen;Jenni Harjuoja;Timo Sajavaara;Lauri Niinistö

  • Properties of AlN grown by plasma enhanced atomic layer deposition

    Markus Bosund;Timo Sajavaara;Mikko Laitinen;Teppo Huhtio

  • Processing of Y2O3 Thin Films by Atomic Layer Deposition from Cyclopentadienyl-Type Compounds and Water as Precursors

    Jaakko Niinistö;Matti Putkonen;Lauri Niinistö

  • Analysis of ALD-processed thin films by ion-beam techniques

    Matti Putkonen;Timo Sajavaara;Lauri Niinistö;Juhani Keinonen

  • Surface-controlled growth of LaAlO3 thin films by atomic layer epitaxy

    Minna Nieminen;Timo Sajavaara;Eero Rauhala;Matti Putkonen

  • Zirconia thin films by atomic layer epitaxy. A comparative study on the use of novel precursors with ozone

    Matti Putkonen;Lauri Niinistö

  • Atomic layer deposition of lithium containing thin films

    Matti Putkonen;Titta Aaltonen;Mari Alnes;Timo Sajavaara

  • Structural and dielectric properties of thin ZrO2 films on silicon grown by atomic layer deposition from cyclopentadienyl precursor

    Jaakko Niinistö;Matti Putkonen;Lauri Niinistö;Kaupo Kukli

  • Atomic layer deposition of rare earth oxides: erbium oxide thin films from β-diketonate and ozone precursors

    Jani Päiväsaari;Matti Putkonen;Timo Sajavaara;Lauri Niinistö

  • Cerium dioxide buffer layers at low temperature by atomic layer deposition

    Jani Päiväsaari;Matti Putkonen;Lauri Niinistö

  • Synthesis, structure and properties of volatile lanthanide complexes containing amidinate ligands: application for Er2O3 thin film growth by atomic layer deposition

    Jani Päiväsaari;Charles L. Dezelah;Dwayne Back;Hani M. El-Kaderi

  • Surface-Controlled Deposition of Sc2O3 Thin Films by Atomic Layer Epitaxy Using β-Diketonate and Organometallic Precursors

    Matti Putkonen;Minna Nieminen;Jaakko Niinistö;Lauri Niinistö

  • Enhanced growth rate in atomic layer epitaxy deposition of magnesium oxide thin films

    Matti Putkonen;Timo Sajavaara;Lauri Niinistö

  • Gadolinium oxide thin films by atomic layer deposition

    Jaakko Niinistö;Nikolina Petrova;Matti Putkonen;Lauri Niinistö

Frequent Co-Authors

Lauri Niinistö
Lauri Niinistö Aalto University
Timo Sajavaara
Timo Sajavaara University of Jyväskylä
Maarit Karppinen
Maarit Karppinen Aalto University
Markku Leskelä
Markku Leskelä University of Helsinki
Mikko Ritala
Mikko Ritala University of Helsinki
Kaupo Kukli
Kaupo Kukli University of Tartu
Eero Kontturi
Eero Kontturi Aalto University
Leena-Sisko Johansson
Leena-Sisko Johansson Aalto University
Harri Lipsanen
Harri Lipsanen Aalto University
Helmer Fjellvåg
Helmer Fjellvåg University of Oslo

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