World's Best Scientists 2026 revealed!
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Materials Science
Estonia
2026

D-Index & Metrics

Materials Science

D-Index
62
Citations
11699
World Ranking
6585
National Ranking
2

Chemistry

D-Index
62
Citations
11501
World Ranking
8989
National Ranking
5

Kaupo Kukli publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Kaupo Kukli sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 256 publications — 48th percentile

48% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Kaupo Kukli D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Kaupo Kukli sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 62 D-Index — 51st percentile

51% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2026 - Research.com Materials Science in Estonia Leader Award
  • 2025 - Research.com Materials Science in Estonia Leader Award

Overview

Kaupo Kukli is affiliated with the University of Tartu in Estonia and has a research focus primarily in the field of engineering, with extensive work in electrical and electronic engineering. Their academic contributions span several subfields including renewable energy, sustainability and the environment, materials chemistry, atomic and molecular physics and optics, as well as biomedical engineering.

Their research topics cover a diverse range of areas including electrocatalysts for energy conversion, semiconductor materials and devices, fuel cells and related materials, advanced memory and neural computing, ferroelectric and negative capacitance devices, advanced battery technologies, and digital holography and microscopy.

Frequent collaborators in Kaupo Kukli's research include Aile Tamm, Jekaterina Kozlova, Kaido Tammeveski, Arvo Kikas, and Vambola Kisand. These coauthors have contributed to numerous joint projects and publications.

They have regularly published their work in several scientific venues. Notably, these include:

  • Preprints.org
  • Nanomaterials
  • ECS Meeting Abstracts
  • Electrochimica Acta
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Among their recent papers are:

  • Deep Deconvolution of Object Information Modulated by a Refractive Lens Using Lucy-Richardson-Rosen Algorithm, 2022, Photonics
  • Hybrid high-performance oxygen reduction reaction Fe-N-C electrocatalyst for anion exchange membrane fuel cells, 2024, International Journal of Hydrogen Energy
  • Bifunctional oxygen electrocatalyst based on Fe, Co, and nitrogen co-doped graphene-coated alumina nanofibers for Zn-air battery air electrode, 2024, Applied Surface Science
  • Lignin-Derived Precious Metal-Free Electrocatalysts for Anion-Exchange Membrane Fuel Cell Application, 2024, ACS Catalysis
  • Enhanced design of multiplexed coded masks for Fresnel incoherent correlation holography, 2023, Scientific Reports

Best Publications

  • Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

    Mikko Ritala;Kaupo Kukli;Antti Rahtu;Petri I. Räisänen

  • Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates

    Kaupo Kukli;Jarkko Ihanus;Mikko Ritala;Markku Leskela

  • Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films from Ta ( OC 2 H 5 ) 5 and H 2 O

    Kaupo Kukli;Mikko Ritala;Markku Leskelä

  • Method for growing thin oxide films

    Mikko Ritala;Antti Rahtu;Markku Leskela;Kaupo Kukli

  • Controlled Growth of TaN, Ta3N5, and TaOxNy Thin Films by Atomic Layer Deposition

    Mikko Ritala;Pia Kalsi;Diana Riihelä;Kaupo Kukli

  • Properties of Ta2 O 5‐Based Dielectric Nanolaminates Deposited by Atomic Layer Epitaxy

    Kaupo Kukli;Jarkko Ihanus;Mikko Ritala;Markku Leskelä

  • Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water

    Kaupo Kukli;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

  • Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

    Kaupo Kukli;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

  • Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

    Kaupo Kukli;Mikko Ritala;Jonas Sundqvist;Jaan Aarik

  • Rare-earth oxide thin films for gate dielectrics in microelectronics

    Markku Leskelä;Kaupo Kukli;Mikko Ritala

  • Influence of atomic layer deposition parameters on the phase content of Ta2O5 films

    Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Raija Matero;Markku Leskelä

  • Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Teet Uustare

  • In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

    Kaupo Kukli;Jaan Aarik;Aleks Aidla;Hele Siimon

  • Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2

    Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Mikael Schuisky;Markku Leskelä

  • Properties of tantalum oxide thin films grown by atomic layer deposition

    Kaupo Kukli;Jaan Aarik;Aleks Aidla;Oksana Kohan

  • Low‐Temperature Deposition of Zirconium Oxide–Based Nanocrystalline Films by Alternate Supply of Zr[OC(CH3)3]4 and H2O

    Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Markku Leskelä

  • Crystallization in hafnia- and zirconia-based systems

    S. V. Ushakov;A. Navrotsky;Y. Yang;S. Stemmer

  • Atomic Layer Deposition of High-k Oxides of the Group 4 Metals for Memory Applications**

    Jaakko Niinistö;Kaupo Kukli;Kaupo Kukli;Mikko Heikkilä;Mikko Ritala

  • Development of Dielectric Properties of Niobium Oxide, Tantalum Oxide, and Aluminum Oxide Based Nanolayered Materials

    Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Markku Leskelä

  • Recent developments in the MOCVD and ALD of rare earth oxides and silicates

    Anthony C. Jones;Helen C. Aspinall;Paul R. Chalker;Richard J. Potter

Frequent Co-Authors

Mikko Ritala
Mikko Ritala University of Helsinki
Markku Leskelä
Markku Leskelä University of Helsinki
Jaan Aarik
Jaan Aarik University of Tartu
Timo Sajavaara
Timo Sajavaara University of Jyväskylä
Marianna Kemell
Marianna Kemell University of Helsinki
Lauri Niinistö
Lauri Niinistö Aalto University
Juhani Keinonen
Juhani Keinonen University of Helsinki
Jun Lu
Jun Lu Zhejiang University
Anthony C. Jones
Anthony C. Jones University of Liverpool
Väino Sammelselg
Väino Sammelselg University of Tartu

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