Kaupo Kukli

Research.com Recognitions

• 2026 - Research.com Materials Science in Estonia Leader Award
• 2025 - Research.com Materials Science in Estonia Leader Award

Overview

Best Publications

• Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

  Mikko Ritala;Kaupo Kukli;Antti Rahtu;Petri I. Räisänen

  666
  Citations

• Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates

  Kaupo Kukli;Jarkko Ihanus;Mikko Ritala;Markku Leskela

  365
  Citations

• Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films from Ta ( OC 2 H 5 ) 5 and H 2 O

  Kaupo Kukli;Mikko Ritala;Markku Leskelä

  358
  Citations

• Method for growing thin oxide films

  Mikko Ritala;Antti Rahtu;Markku Leskela;Kaupo Kukli

  337
  Citations

• Controlled Growth of TaN, Ta3N5, and TaOxNy Thin Films by Atomic Layer Deposition

  Mikko Ritala;Pia Kalsi;Diana Riihelä;Kaupo Kukli

  316
  Citations

• Properties of Ta2 O 5‐Based Dielectric Nanolaminates Deposited by Atomic Layer Epitaxy

  Kaupo Kukli;Jarkko Ihanus;Mikko Ritala;Markku Leskelä

  277
  Citations

• Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water

  Kaupo Kukli;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

  272
  Citations

• Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

  Kaupo Kukli;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

  242
  Citations

• Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

  Kaupo Kukli;Mikko Ritala;Jonas Sundqvist;Jaan Aarik

  229
  Citations

• Rare-earth oxide thin films for gate dielectrics in microelectronics

  Markku Leskelä;Kaupo Kukli;Mikko Ritala

  207
  Citations

• Influence of atomic layer deposition parameters on the phase content of Ta2O5 films

  Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Raija Matero;Markku Leskelä

  204
  Citations

• Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

  Jaan Aarik;Aleks Aidla;Hugo Mändar;Teet Uustare

  203
  Citations

• In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

  Kaupo Kukli;Jaan Aarik;Aleks Aidla;Hele Siimon

  203
  Citations

• Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2

  Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Mikael Schuisky;Markku Leskelä

  201
  Citations

• Properties of tantalum oxide thin films grown by atomic layer deposition

  Kaupo Kukli;Jaan Aarik;Aleks Aidla;Oksana Kohan

  199
  Citations

• Low‐Temperature Deposition of Zirconium Oxide–Based Nanocrystalline Films by Alternate Supply of Zr[OC(CH3)3]4 and H2O

  Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Markku Leskelä

  199
  Citations

• Crystallization in hafnia- and zirconia-based systems

  S. V. Ushakov;A. Navrotsky;Y. Yang;S. Stemmer

  196
  Citations

• Atomic Layer Deposition of High-k Oxides of the Group 4 Metals for Memory Applications**

  Jaakko Niinistö;Kaupo Kukli;Kaupo Kukli;Mikko Heikkilä;Mikko Ritala

  180
  Citations

• Development of Dielectric Properties of Niobium Oxide, Tantalum Oxide, and Aluminum Oxide Based Nanolayered Materials

  Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Markku Leskelä

  169
  Citations

• Recent developments in the MOCVD and ALD of rare earth oxides and silicates

  Anthony C. Jones;Helen C. Aspinall;Paul R. Chalker;Richard J. Potter

  161
  Citations