World's Best Scientists 2026 revealed!

D-Index & Metrics

Chemistry

D-Index
40
Citations
6366
World Ranking
17882
National Ranking
976

Overview

Anthony C. Jones is affiliated with the University of Liverpool in the United Kingdom. Their academic profile does not list recent papers, frequent co-authors, or specific publication venues, indicating a potential focus apart from highly publicized research output or collaborations commonly indexed in large databases.

There is no available information regarding their main fields or subfields of study, which may suggest either a broad interdisciplinary approach or work in emerging or less documented areas.

Similarly, no specific main topics of research have been identified, which limits the detailed understanding of their research focus or thematic specialization within their field.

Anthony C. Jones has not been noted for any book publications linked to a particular publisher, which might imply an emphasis on articles, reports, or other forms of academic communication rather than monographs or edited volumes.

There are no recorded awards or distinctions associated with Anthony C. Jones, which could be due to various factors including the stage of career or the nature of their work.

Best Publications

  • CVD of Compound Semiconductors

    Anthony C. Jones;Paul O'Brien

  • Molecular design of improved precursors for the MOCVD of electroceramic oxides

    Anthony C. Jones

  • Recent developments in the MOCVD and ALD of rare earth oxides and silicates

    Anthony C. Jones;Helen C. Aspinall;Paul R. Chalker;Richard J. Potter

  • Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films

    Paul A. Williams;John L. Roberts;Anthony C. Jones;Paul R. Chalker

  • Some recent developments in the chemical vapour deposition of electroceramic oxides

    Anthony C Jones;Paul R Chalker

  • Some recent developments in the MOCVD and ALD of high-κ dielectric oxides

    Anthony C. Jones;Helen C. Aspinall;Paul R. Chalker;Richard J. Potter

  • Nickel oxide sol-gel films from nickel diacetate for electrochromic applications

    J.L Garcia-Miquel;Q Zhang;S.J Allen;A Rougier

  • Growth of ZnO by MOCVD using alkylzinc alkoxides as single-source precursors

    John Auld;David J. Houlton;Anthony C. Jones;Simon A. Rushworth

  • Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques†

    Richard Potter;Paid R. Chalker;Troy D. Manning;Helen C. Aspinall

  • Response behaviour of tin oxide thin film gas sensors grown by MOCVD

    J.R Brown;P.W Haycock;L.M Smith;A.C Jones

  • Synthesis and characterisation of two novel titanium isopropoxides stabilised with a chelating alkoxide: their use in the liquid injection MOCVD of titanium dioxide thin films

    Anthony C. Jones;Timothy J. Leedham;Peter J. Wright;Michael J. Crosbie

  • MOCVD of Zirconia Thin Films by Direct Liquid Injection Using a New Class of Zirconium Precursor

    Anthony C. Jones;Timothy J. Leedham;Peter J. Wright;Michael J. Crosbie

  • Thermal stability of neodymium aluminates high-κ dielectric deposited by liquid injection MOCVD using single-source heterometallic alkoxide precursors

    P. Taechakumput;C. Z. Zhao;S. Taylor;M. Werner

  • Atomic layer deposition of hafnium dioxide films from 1-methoxy-2-methyl-2-propanolate complex of hafnium

    Kaupo Kukli;Mikko Ritala;Markku Leskelä;Timo Sajavaara

  • MOCVD and ALD of High-k Dielectric Oxides Using Alkoxide Precursors†

    Anthony C. Jones;Helen C. Aspinall;Paul R. Chalker;Richard J. Potter

  • Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films†

    Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Viljami Pore;Markku Leskelä

  • Chemical vapour deposition precursors

    Timothy J Leedham;Anthony C Jones;Michael J Crosbie;Dennis J Williams

  • Structural studies of some Group 12 metal alkyl adducts: the X-ray crystal structures of Me2Zn[Me2N(CH2)2NMe 2], Me2Cd[Me2N(CH2)2NMe2], (Me3CCH2)2Zn[Me2N(CH2)2NMe2] and (Me3CCH2)2Cd[Me2N(CH2)2NMe2]

    Paul O'Brien;Michael B. Hursthouse;Majid Motevalli;John R. Walsh

  • MOCVD of electroceramic oxides : A precursor manufacturer's perspective

    Anthony C. Jones

  • Crystal Structure of Bi(OCMe2CH2OMe)3 and Its Use in the MOCVD of Bi2O3

    Paul A. Williams;Anthony C. Jones;Michael J. Crosbie;Peter J. Wright

  • Atomic Layer Epitaxy

    Anthony C. Jones;Paul O'Brien

Frequent Co-Authors

Paul R. Chalker
Paul R. Chalker University of Liverpool
Paul O'Brien
Paul O'Brien University of Manchester
Alexander Steiner
Alexander Steiner University of Liverpool
Mikko Ritala
Mikko Ritala University of Helsinki
Markku Leskelä
Markku Leskelä University of Helsinki
John Bacsa
John Bacsa Emory University
Martyn E. Pemble
Martyn E. Pemble Tyndall National Institute
Kaupo Kukli
Kaupo Kukli University of Tartu
Timo Sajavaara
Timo Sajavaara University of Jyväskylä
Majid Motevalli
Majid Motevalli Queen Mary University of London

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Best Scientists Citing Anthony C. Jones