World's Best Scientists 2026 revealed!

D-Index & Metrics

Chemistry

D-Index
40
Citations
6366
World Ranking
17880
National Ranking
976

Anthony C. Jones publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Anthony C. Jones sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 216 publications — 38th percentile

38% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Anthony C. Jones D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Anthony C. Jones sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 40 D-Index — 1st percentile

1% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

Anthony C. Jones is affiliated with the University of Liverpool in the United Kingdom. Their academic profile does not list recent papers, frequent co-authors, or specific publication venues, indicating a potential focus apart from highly publicized research output or collaborations commonly indexed in large databases.

There is no available information regarding their main fields or subfields of study, which may suggest either a broad interdisciplinary approach or work in emerging or less documented areas.

Similarly, no specific main topics of research have been identified, which limits the detailed understanding of their research focus or thematic specialization within their field.

Anthony C. Jones has not been noted for any book publications linked to a particular publisher, which might imply an emphasis on articles, reports, or other forms of academic communication rather than monographs or edited volumes.

There are no recorded awards or distinctions associated with Anthony C. Jones, which could be due to various factors including the stage of career or the nature of their work.

Best Publications

  • CVD of Compound Semiconductors

    Anthony C. Jones;Paul O'Brien

  • Molecular design of improved precursors for the MOCVD of electroceramic oxides

    Anthony C. Jones

  • Recent developments in the MOCVD and ALD of rare earth oxides and silicates

    Anthony C. Jones;Helen C. Aspinall;Paul R. Chalker;Richard J. Potter

  • Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films

    Paul A. Williams;John L. Roberts;Anthony C. Jones;Paul R. Chalker

  • Some recent developments in the chemical vapour deposition of electroceramic oxides

    Anthony C Jones;Paul R Chalker

  • Some recent developments in the MOCVD and ALD of high-κ dielectric oxides

    Anthony C. Jones;Helen C. Aspinall;Paul R. Chalker;Richard J. Potter

  • Nickel oxide sol-gel films from nickel diacetate for electrochromic applications

    J.L Garcia-Miquel;Q Zhang;S.J Allen;A Rougier

  • Growth of ZnO by MOCVD using alkylzinc alkoxides as single-source precursors

    John Auld;David J. Houlton;Anthony C. Jones;Simon A. Rushworth

  • Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques†

    Richard Potter;Paid R. Chalker;Troy D. Manning;Helen C. Aspinall

  • Response behaviour of tin oxide thin film gas sensors grown by MOCVD

    J.R Brown;P.W Haycock;L.M Smith;A.C Jones

  • Synthesis and characterisation of two novel titanium isopropoxides stabilised with a chelating alkoxide: their use in the liquid injection MOCVD of titanium dioxide thin films

    Anthony C. Jones;Timothy J. Leedham;Peter J. Wright;Michael J. Crosbie

  • MOCVD of Zirconia Thin Films by Direct Liquid Injection Using a New Class of Zirconium Precursor

    Anthony C. Jones;Timothy J. Leedham;Peter J. Wright;Michael J. Crosbie

  • Thermal stability of neodymium aluminates high-κ dielectric deposited by liquid injection MOCVD using single-source heterometallic alkoxide precursors

    P. Taechakumput;C. Z. Zhao;S. Taylor;M. Werner

  • Atomic layer deposition of hafnium dioxide films from 1-methoxy-2-methyl-2-propanolate complex of hafnium

    Kaupo Kukli;Mikko Ritala;Markku Leskelä;Timo Sajavaara

  • MOCVD and ALD of High-k Dielectric Oxides Using Alkoxide Precursors†

    Anthony C. Jones;Helen C. Aspinall;Paul R. Chalker;Richard J. Potter

  • Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films†

    Kaupo Kukli;Kaupo Kukli;Mikko Ritala;Viljami Pore;Markku Leskelä

  • Chemical vapour deposition precursors

    Timothy J Leedham;Anthony C Jones;Michael J Crosbie;Dennis J Williams

  • Structural studies of some Group 12 metal alkyl adducts: the X-ray crystal structures of Me2Zn[Me2N(CH2)2NMe 2], Me2Cd[Me2N(CH2)2NMe2], (Me3CCH2)2Zn[Me2N(CH2)2NMe2] and (Me3CCH2)2Cd[Me2N(CH2)2NMe2]

    Paul O'Brien;Michael B. Hursthouse;Majid Motevalli;John R. Walsh

  • MOCVD of electroceramic oxides : A precursor manufacturer's perspective

    Anthony C. Jones

  • Crystal Structure of Bi(OCMe2CH2OMe)3 and Its Use in the MOCVD of Bi2O3

    Paul A. Williams;Anthony C. Jones;Michael J. Crosbie;Peter J. Wright

  • Atomic Layer Epitaxy

    Anthony C. Jones;Paul O'Brien

Frequent Co-Authors

Paul R. Chalker
Paul R. Chalker University of Liverpool
Paul O'Brien
Paul O'Brien University of Manchester
Alexander Steiner
Alexander Steiner University of Liverpool
Mikko Ritala
Mikko Ritala University of Helsinki
Markku Leskelä
Markku Leskelä University of Helsinki
John Bacsa
John Bacsa Emory University
Martyn E. Pemble
Martyn E. Pemble Tyndall National Institute
Kaupo Kukli
Kaupo Kukli University of Tartu
Timo Sajavaara
Timo Sajavaara University of Jyväskylä
Majid Motevalli
Majid Motevalli Queen Mary University of London

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