2026 Markku Leskelä: Materials Science Researcher – H-Index, Publications & Awards

Discipline name	D-Index	World Ranking	Current World Ranking	National Ranking	Current National Ranking	Publications	Citations
Materials Science	115	574	547	1	1	874	52646
Chemistry	114	663	583	1	1	883	51773

Markku Leskelä publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Markku Leskelä sits on this spectrum.

50 publications 1,163+

This scientist: 874 publications — 98th percentile

98% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Markku Leskelä D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Markku Leskelä sits on this spectrum.

40 D-Index 165+

This scientist: 115 D-Index — 96th percentile

96% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

2026 - Research.com Chemistry in Finland Leader Award
2026 - Research.com Materials Science in Finland Leader Award
2025 - Research.com Chemistry in Finland Leader Award
2025 - Research.com Materials Science in Finland Leader Award
2023 - Research.com Chemistry in Finland Leader Award
2023 - Research.com Materials Science in Finland Leader Award
2022 - Research.com Chemistry in Finland Leader Award
2022 - Research.com Materials Science in Finland Leader Award

Overview

Markku Leskelä is affiliated with the University of Helsinki in Finland. Their research primarily spans the fields of Materials Science and Engineering, with a strong focus on Materials Chemistry and Electrical and Electronic Engineering. The subfields of their research include Electronic, Optical and Magnetic Materials, Polymers and Plastics, and Renewable Energy, Sustainability and the Environment.

The main topics of their work include:

Crystallization and Solubility Studies
X-ray Diffraction in Crystallography
Semiconductor materials and devices
ZnO doping and properties
Electronic and Structural Properties of Oxides
Perovskite Materials and Applications
Quantum Dots Synthesis And Properties

Leskelä has contributed significantly to several publication venues, with numerous papers appearing in:

The Cambridge Structural Database
Advanced Materials Interfaces
Chemistry of Materials
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Dalton Transactions

The most recent papers authored or coauthored by Leskelä include:

"Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond," published in 2021 in Advanced Materials Interfaces
"Role of ALD Al₂O₃ Surface Passivation on the Performance of p-Type Cu₂O Thin Film Transistors," published in 2021 in ACS Applied Materials & Interfaces
"Atomic Layer Deposition of PbS Thin Films at Low Temperatures," published in 2020 in Chemistry of Materials
"Area-Selective Molecular Layer Deposition of Polyimide on Cu through Cu-Catalyzed Formation of a Crystalline Interchain Polyimide," published in 2020 in Chemistry of Materials
"Synthesis, molecular docking studies, and larvicidal activity evaluation of new fluorinated neonicotinoids against Anopheles darlingi larvae," published in 2020 in PLoS ONE

Frequent coauthors collaborating with Leskelä include:

Mikko Ritala
Martin Nieger
Timo Repo
Ahlam Sibaouih
Kenichiro Mizohata

Best Publications

Atomic layer deposition (ALD): from precursors to thin film structures

Markku Leskelä;Mikko Ritala

1771
Citations
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Ville Miikkulainen;Markku Leskelä;Mikko Ritala;Riikka L. Puurunen

1678
Citations
Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges†

Markku Leskelä;Mikko Ritala

1389
Citations
Atomic layer deposition

Mikko Ritala;Markku Leskelä

797
Citations
Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

Mikko Ritala;Kaupo Kukli;Antti Rahtu;Petri I. Räisänen

666
Citations
Atomic Layer Deposition of Platinum Thin Films

Titta Aaltonen;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

520
Citations
Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

Mikko Ritala;Markku Leskelä;Jan-Pieter Dekker;Cees Mutsaers

459
Citations
WO3 photocatalysts: Influence of structure and composition

Imre M. Szilágyi;Imre M. Szilágyi;Balázs Fórizs;Olivier Rosseler;Ágnes Szegedi

442
Citations
Thin Film Deposition Methods for CuInSe2Solar Cells

Marianna Kemell;Mikko Ritala;Markku Leskelä

423
Citations
Growth of titanium dioxide thin films by atomic layer epitaxy

Mikko Ritala;Markku Leskelä;Erja Nykänen;Pekka Soininen

423
Citations
A frustrated-Lewis-pair approach to catalytic reduction of alkynes to cis -alkenes

Konstantin Chernichenko;Ádám Madarász;Imre Pápai;Martin Nieger

414
Citations
Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applications

Lauri Niinistö;Mikko Ritala;Markku Leskelä

413
Citations
Atomic layer epitaxy—a valuable tool for nanotechnology?

Mikko Ritala;Markku Leskelä

413
Citations
Molecular tweezers for hydrogen: synthesis, characterization, and reactivity.

Victor Sumerin;Felix Schulz;Michiko Atsumi;Cong Wang

407
Citations
Atomic Layer Deposition of Noble Metals and Their Oxides

Jani Hämäläinen;Mikko Ritala;Markku Leskelä

407
Citations
Facile heterolytic H2 activation by amines and B(C6F5)3.

Victor Sumerin;Felix Schulz;Martin Nieger;Markku Leskelä

406
Citations
Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

Mikko Ritala;Markku Leskela;Lauri Niinisto;Pekka Haussalo

403
Citations
Ruthenium Thin Films Grown by Atomic Layer Deposition

Titta Aaltonen;Petra Alen;Mikko Ritala;Markku Leskelä

381
Citations
Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates

Kaupo Kukli;Jarkko Ihanus;Mikko Ritala;Markku Leskela

365
Citations
Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films from Ta ( OC 2 H 5 ) 5 and H 2 O

Kaupo Kukli;Mikko Ritala;Markku Leskelä

358
Citations