D-Index & Metrics Best Publications
Materials Science
Estonia
2023

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 50 Citations 8,293 177 World Ranking 7092 National Ranking 3

Research.com Recognitions

Awards & Achievements

2023 - Research.com Materials Science in Estonia Leader Award

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Thin film
  • Aluminium

Jaan Aarik spends much of his time researching Atomic layer deposition, Thin film, Analytical chemistry, Amorphous solid and Mineralogy. His work deals with themes such as Crystallization, Chemical vapor deposition, Silicon, Rutile and Substrate, which intersect with Atomic layer deposition. His biological study spans a wide range of topics, including Inorganic chemistry, Crystallite, Epitaxy and Titanium dioxide.

His research in Inorganic chemistry intersects with topics in Crystal chemistry and Atomic layer epitaxy. His Analytical chemistry research incorporates elements of Hafnium dioxide, Band gap, Refractive index and Permittivity. His work investigates the relationship between Amorphous solid and topics such as Optics that intersect with problems in Surface roughness, Morphology and Exciton.

His most cited work include:

  • Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films (292 citations)
  • Morphology and structure of TiO2 thin films grown by atomic layer deposition (229 citations)
  • Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition (227 citations)

What are the main themes of his work throughout his whole career to date?

Jaan Aarik mainly focuses on Atomic layer deposition, Thin film, Analytical chemistry, Dielectric and Silicon. His Atomic layer deposition research includes elements of Amorphous solid, Inorganic chemistry, Substrate and Mineralogy. His Carbon film study in the realm of Thin film connects with subjects such as Quartz crystal microbalance.

His study looks at the relationship between Analytical chemistry and fields such as Monoclinic crystal system, as well as how they intersect with chemical problems. His research integrates issues of Capacitance and Chemical vapor deposition in his study of Dielectric. His study in Silicon is interdisciplinary in nature, drawing from both Deposition and Semiconductor.

He most often published in these fields:

  • Atomic layer deposition (77.78%)
  • Thin film (60.00%)
  • Analytical chemistry (47.22%)

What were the highlights of his more recent work (between 2012-2021)?

  • Atomic layer deposition (77.78%)
  • Thin film (60.00%)
  • Analytical chemistry (47.22%)

In recent papers he was focusing on the following fields of study:

His primary scientific interests are in Atomic layer deposition, Thin film, Analytical chemistry, Substrate and Oxide. His Atomic layer deposition study is related to the wider topic of Layer. In general Thin film study, his work on Carbon film often relates to the realm of Quartz crystal microbalance, thereby connecting several areas of interest.

He has included themes like Tetragonal crystal system, Permittivity, Graphene and Monoclinic crystal system in his Analytical chemistry study. His Substrate study combines topics in areas such as Sapphire and Raman spectroscopy. His Oxide research also works with subjects such as

  • Doping and Titanium most often made with reference to Dysprosium,
  • Titanium oxide and related Orthorhombic crystal system.

Between 2012 and 2021, his most popular works were:

  • Atomic layer deposition of TiO2 from TiCl4 and O3 (45 citations)
  • Raman characterization of stacking in multi-layer graphene grown on Ni (25 citations)
  • Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films (22 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Aluminium
  • Atom

His primary areas of study are Atomic layer deposition, Analytical chemistry, Thin film, Substrate and Optoelectronics. His Atomic layer deposition research includes themes of Amorphous solid, Inorganic chemistry, Deposition and Titanium dioxide. His Amorphous solid research integrates issues from Relative permittivity, Dielectric and Permittivity.

His Analytical chemistry study combines topics from a wide range of disciplines, such as Annealing and Graphene. The Thin film study combines topics in areas such as Monoclinic crystal system, Tetragonal crystal system, Thermal treatment, Photoluminescence and Nanocrystalline material. The concepts of his Optoelectronics study are interwoven with issues in Capacitance, Transmission electron microscopy and Capacitor.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

J Aarik;A Aidla;A.-A Kiisler;T Uustare.
Thin Solid Films (1999)

455 Citations

Morphology and structure of TiO2 thin films grown by atomic layer deposition

Jaan Aarik;Aleks Aidla;Teet Uustare;Väino Sammelselg.
Journal of Crystal Growth (1995)

370 Citations

Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition

Jaan Aarik;Aleks Aidla;Alma-Asta Kiisler;Teet Uustare.
Thin Solid Films (1997)

351 Citations

Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition

Jaan Aarik;Aleks Aidla;Hugo Mändar;Väino Sammelselg.
Journal of Crystal Growth (2000)

288 Citations

Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

J. Aarik;A. Aidla;H. Mändar;T. Uustare.
Applied Surface Science (2001)

279 Citations

Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Jaan Aarik;Aleks Aidla;Teet Uustare;Mikko Ritala.
Applied Surface Science (2000)

275 Citations

Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

Kaupo Kukli;Mikko Ritala;Jonas Sundqvist;Jaan Aarik.
Journal of Applied Physics (2002)

219 Citations

Optical characterization of HfO2 thin films grown by atomic layer deposition

Jaan Aarik;Hugo Mändar;Marco Kirm;Lembit Pung.
Thin Solid Films (2004)

218 Citations

Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates

Jaan Aarik;Aleks Aidla;Hugo Mändar;Teet Uustare.
Journal of Crystal Growth (2002)

207 Citations

In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

Kaupo Kukli;Jaan Aarik;Aleks Aidla;Hele Siimon.
Applied Surface Science (1997)

202 Citations

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