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Materials Science
Estonia
2025

D-Index & Metrics

Materials Science

D-Index
52
Citations
9557
World Ranking
9587
National Ranking
4

Jaan Aarik publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Jaan Aarik sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 208 publications — 33rd percentile

33% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Jaan Aarik D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Jaan Aarik sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 52 D-Index — 27th percentile

27% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2025 - Research.com Materials Science in Estonia Leader Award

Overview

Jaan Aarik is affiliated with the University of Tartu in Estonia. Their research primarily focuses on Engineering and Materials Science, with a specialization in Electrical and Electronic Engineering and Materials Chemistry. The scientist's work extends into subfields such as Electronic, Optical and Magnetic Materials, Renewable Energy, Sustainability and the Environment, and Mechanics of Materials.

Their research centers around several main topics, including Semiconductor materials and devices, Electronic and Structural Properties of Oxides, ZnO doping and properties, Ferroelectric and Negative Capacitance Devices, Advanced Memory and Neural Computing, Metal and Thin Film Mechanics, and Ga2O3 and related materials.

Jaan Aarik has collaborated frequently with several coauthors, including Lauri Aarik, Hugo Mändar, Aivar Tarre, Peeter Ritslaid, and Jekaterina Kozlova. Their work has been published in multiple scientific venues, such as Crystal Growth & Design, Coatings, Surface and Coatings Technology, Journal of Crystal Growth, and Journal of Materials Chemistry C.

Some of their recent papers include:

  • Mechanical properties of crystalline and amorphous aluminum oxide thin films grown by atomic layer deposition, 2022, Surface and Coatings Technology
  • Low-Temperature Atomic Layer Deposition of α-Al2O3 Thin Films, 2021, Crystal Growth & Design
  • Platinum Sputtered on Nb-doped TiO2 Films Prepared by ALD: Highly Active and Durable Carbon-free ORR Electrocatalyst, 2020, Journal of The Electrochemical Society
  • Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes, 2020, Applied Surface Science
  • Atomic layer deposition of α-Al2O3 from trimethylaluminum and H2O: Effect of process parameters and plasma excitation on structure development, 2023, Journal of Crystal Growth

Best Publications

  • Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

    J Aarik;A Aidla;A.-A Kiisler;T Uustare

  • Morphology and structure of TiO2 thin films grown by atomic layer deposition

    Jaan Aarik;Aleks Aidla;Teet Uustare;Väino Sammelselg

  • Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition

    Jaan Aarik;Aleks Aidla;Alma-Asta Kiisler;Teet Uustare

  • Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

    J. Aarik;A. Aidla;H. Mändar;T. Uustare

  • Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Väino Sammelselg

  • Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

    Jaan Aarik;Aleks Aidla;Teet Uustare;Mikko Ritala

  • Optical characterization of HfO2 thin films grown by atomic layer deposition

    Jaan Aarik;Hugo Mändar;Marco Kirm;Lembit Pung

  • Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

    Kaupo Kukli;Mikko Ritala;Jonas Sundqvist;Jaan Aarik

  • Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Teet Uustare

  • Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Teet Uustare

  • In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

    Kaupo Kukli;Jaan Aarik;Aleks Aidla;Hele Siimon

  • Anomalous effect of temperature on atomic layer deposition of titanium dioxide

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Väino Sammelselg

  • Properties of tantalum oxide thin films grown by atomic layer deposition

    Kaupo Kukli;Jaan Aarik;Aleks Aidla;Oksana Kohan

  • Thin films of HfO2 and ZrO2 as potential scintillators

    Marco Kirm;Jaan Aarik;Meelis Jürgens;Ilmo Sildos

  • Influence of structure development on atomic layer deposition of TiO2 thin films

    J. Aarik;J. Karlis;H. Mändar;T. Uustare

  • Atomic Layer Chemical Vapor Deposition of TiO2 Low Temperature Epitaxy of Rutile and Anatase

    Mikael Schuisky;Anders Hårsta;Aleks Aidla;Kaupo Kukli

  • Influence of growth temperature on properties of zirconium dioxide films grown by atomic layer deposition

    Kaupo Kukli;Mikko Ritala;Jaan Aarik;Teet Uustare

  • Ti 2p and O 1s X-ray absorption of TiO2 polymorphs

    R. Ruus;A. Kikas;A. Saar;A. Ausmees

  • Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

    Kaupo Kukli;Kaupo Kukli;Katarina Forsgren;Jaan Aarik;Teet Uustare

  • Dielectric Properties of Zirconium Oxide Grown by Atomic Layer Deposition from Iodide Precursor

    Kaupo Kukli;Katarina Forsgren;Mikko Ritala;Markku Leskelä

  • Atomic layer deposition of TiO2 thin films from TiI4 and H2O

    Jaan Aarik;Aleks Aidla;Teet Uustare;Kaupo Kukli

Frequent Co-Authors

Kaupo Kukli
Kaupo Kukli University of Tartu
Väino Sammelselg
Väino Sammelselg University of Tartu
Markku Leskelä
Markku Leskelä University of Helsinki
Mikko Ritala
Mikko Ritala University of Helsinki
Jun Lu
Jun Lu Zhejiang University
Timo Sajavaara
Timo Sajavaara University of Jyväskylä
Fred Roozeboom
Fred Roozeboom University of Twente
J. Ruud van Ommen
J. Ruud van Ommen Delft University of Technology
Robin H. A. Ras
Robin H. A. Ras Aalto University
Lars Hultman
Lars Hultman Linköping University

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