2023 - Research.com Materials Science in Estonia Leader Award
Jaan Aarik spends much of his time researching Atomic layer deposition, Thin film, Analytical chemistry, Amorphous solid and Mineralogy. His work deals with themes such as Crystallization, Chemical vapor deposition, Silicon, Rutile and Substrate, which intersect with Atomic layer deposition. His biological study spans a wide range of topics, including Inorganic chemistry, Crystallite, Epitaxy and Titanium dioxide.
His research in Inorganic chemistry intersects with topics in Crystal chemistry and Atomic layer epitaxy. His Analytical chemistry research incorporates elements of Hafnium dioxide, Band gap, Refractive index and Permittivity. His work investigates the relationship between Amorphous solid and topics such as Optics that intersect with problems in Surface roughness, Morphology and Exciton.
Jaan Aarik mainly focuses on Atomic layer deposition, Thin film, Analytical chemistry, Dielectric and Silicon. His Atomic layer deposition research includes elements of Amorphous solid, Inorganic chemistry, Substrate and Mineralogy. His Carbon film study in the realm of Thin film connects with subjects such as Quartz crystal microbalance.
His study looks at the relationship between Analytical chemistry and fields such as Monoclinic crystal system, as well as how they intersect with chemical problems. His research integrates issues of Capacitance and Chemical vapor deposition in his study of Dielectric. His study in Silicon is interdisciplinary in nature, drawing from both Deposition and Semiconductor.
His primary scientific interests are in Atomic layer deposition, Thin film, Analytical chemistry, Substrate and Oxide. His Atomic layer deposition study is related to the wider topic of Layer. In general Thin film study, his work on Carbon film often relates to the realm of Quartz crystal microbalance, thereby connecting several areas of interest.
He has included themes like Tetragonal crystal system, Permittivity, Graphene and Monoclinic crystal system in his Analytical chemistry study. His Substrate study combines topics in areas such as Sapphire and Raman spectroscopy. His Oxide research also works with subjects such as
His primary areas of study are Atomic layer deposition, Analytical chemistry, Thin film, Substrate and Optoelectronics. His Atomic layer deposition research includes themes of Amorphous solid, Inorganic chemistry, Deposition and Titanium dioxide. His Amorphous solid research integrates issues from Relative permittivity, Dielectric and Permittivity.
His Analytical chemistry study combines topics from a wide range of disciplines, such as Annealing and Graphene. The Thin film study combines topics in areas such as Monoclinic crystal system, Tetragonal crystal system, Thermal treatment, Photoluminescence and Nanocrystalline material. The concepts of his Optoelectronics study are interwoven with issues in Capacitance, Transmission electron microscopy and Capacitor.
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Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
J Aarik;A Aidla;A.-A Kiisler;T Uustare.
Thin Solid Films (1999)
Morphology and structure of TiO2 thin films grown by atomic layer deposition
Jaan Aarik;Aleks Aidla;Teet Uustare;Väino Sammelselg.
Journal of Crystal Growth (1995)
Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition
Jaan Aarik;Aleks Aidla;Alma-Asta Kiisler;Teet Uustare.
Thin Solid Films (1997)
Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition
Jaan Aarik;Aleks Aidla;Hugo Mändar;Väino Sammelselg.
Journal of Crystal Growth (2000)
Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism
J. Aarik;A. Aidla;H. Mändar;T. Uustare.
Applied Surface Science (2001)
Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process
Jaan Aarik;Aleks Aidla;Teet Uustare;Mikko Ritala.
Applied Surface Science (2000)
Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen
Kaupo Kukli;Mikko Ritala;Jonas Sundqvist;Jaan Aarik.
Journal of Applied Physics (2002)
Optical characterization of HfO2 thin films grown by atomic layer deposition
Jaan Aarik;Hugo Mändar;Marco Kirm;Lembit Pung.
Thin Solid Films (2004)
Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates
Jaan Aarik;Aleks Aidla;Hugo Mändar;Teet Uustare.
Journal of Crystal Growth (2002)
In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O
Kaupo Kukli;Jaan Aarik;Aleks Aidla;Hele Siimon.
Applied Surface Science (1997)
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