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Materials Science
Estonia
2025

D-Index & Metrics

Materials Science

D-Index
52
Citations
9557
World Ranking
9589
National Ranking
4

Research.com Recognitions

  • 2025 - Research.com Materials Science in Estonia Leader Award

Overview

Jaan Aarik is affiliated with the University of Tartu in Estonia. Their research primarily focuses on Engineering and Materials Science, with a specialization in Electrical and Electronic Engineering and Materials Chemistry. The scientist's work extends into subfields such as Electronic, Optical and Magnetic Materials, Renewable Energy, Sustainability and the Environment, and Mechanics of Materials.

Their research centers around several main topics, including Semiconductor materials and devices, Electronic and Structural Properties of Oxides, ZnO doping and properties, Ferroelectric and Negative Capacitance Devices, Advanced Memory and Neural Computing, Metal and Thin Film Mechanics, and Ga2O3 and related materials.

Jaan Aarik has collaborated frequently with several coauthors, including Lauri Aarik, Hugo Mändar, Aivar Tarre, Peeter Ritslaid, and Jekaterina Kozlova. Their work has been published in multiple scientific venues, such as Crystal Growth & Design, Coatings, Surface and Coatings Technology, Journal of Crystal Growth, and Journal of Materials Chemistry C.

Some of their recent papers include:

  • Mechanical properties of crystalline and amorphous aluminum oxide thin films grown by atomic layer deposition, 2022, Surface and Coatings Technology
  • Low-Temperature Atomic Layer Deposition of α-Al2O3 Thin Films, 2021, Crystal Growth & Design
  • Platinum Sputtered on Nb-doped TiO2 Films Prepared by ALD: Highly Active and Durable Carbon-free ORR Electrocatalyst, 2020, Journal of The Electrochemical Society
  • Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes, 2020, Applied Surface Science
  • Atomic layer deposition of α-Al2O3 from trimethylaluminum and H2O: Effect of process parameters and plasma excitation on structure development, 2023, Journal of Crystal Growth

Best Publications

  • Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

    J Aarik;A Aidla;A.-A Kiisler;T Uustare

  • Morphology and structure of TiO2 thin films grown by atomic layer deposition

    Jaan Aarik;Aleks Aidla;Teet Uustare;Väino Sammelselg

  • Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition

    Jaan Aarik;Aleks Aidla;Alma-Asta Kiisler;Teet Uustare

  • Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

    J. Aarik;A. Aidla;H. Mändar;T. Uustare

  • Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Väino Sammelselg

  • Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

    Jaan Aarik;Aleks Aidla;Teet Uustare;Mikko Ritala

  • Optical characterization of HfO2 thin films grown by atomic layer deposition

    Jaan Aarik;Hugo Mändar;Marco Kirm;Lembit Pung

  • Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

    Kaupo Kukli;Mikko Ritala;Jonas Sundqvist;Jaan Aarik

  • Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Teet Uustare

  • Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Teet Uustare

  • In situ study of atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O

    Kaupo Kukli;Jaan Aarik;Aleks Aidla;Hele Siimon

  • Anomalous effect of temperature on atomic layer deposition of titanium dioxide

    Jaan Aarik;Aleks Aidla;Hugo Mändar;Väino Sammelselg

  • Properties of tantalum oxide thin films grown by atomic layer deposition

    Kaupo Kukli;Jaan Aarik;Aleks Aidla;Oksana Kohan

  • Thin films of HfO2 and ZrO2 as potential scintillators

    Marco Kirm;Jaan Aarik;Meelis Jürgens;Ilmo Sildos

  • Influence of structure development on atomic layer deposition of TiO2 thin films

    J. Aarik;J. Karlis;H. Mändar;T. Uustare

  • Atomic Layer Chemical Vapor Deposition of TiO2 Low Temperature Epitaxy of Rutile and Anatase

    Mikael Schuisky;Anders Hårsta;Aleks Aidla;Kaupo Kukli

  • Influence of growth temperature on properties of zirconium dioxide films grown by atomic layer deposition

    Kaupo Kukli;Mikko Ritala;Jaan Aarik;Teet Uustare

  • Ti 2p and O 1s X-ray absorption of TiO2 polymorphs

    R. Ruus;A. Kikas;A. Saar;A. Ausmees

  • Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

    Kaupo Kukli;Kaupo Kukli;Katarina Forsgren;Jaan Aarik;Teet Uustare

  • Dielectric Properties of Zirconium Oxide Grown by Atomic Layer Deposition from Iodide Precursor

    Kaupo Kukli;Katarina Forsgren;Mikko Ritala;Markku Leskelä

  • Atomic layer deposition of TiO2 thin films from TiI4 and H2O

    Jaan Aarik;Aleks Aidla;Teet Uustare;Kaupo Kukli

Frequent Co-Authors

Kaupo Kukli
Kaupo Kukli University of Tartu
Väino Sammelselg
Väino Sammelselg University of Tartu
Markku Leskelä
Markku Leskelä University of Helsinki
Mikko Ritala
Mikko Ritala University of Helsinki
Jun Lu
Jun Lu Zhejiang University
Timo Sajavaara
Timo Sajavaara University of Jyväskylä
Fred Roozeboom
Fred Roozeboom University of Twente
J. Ruud van Ommen
J. Ruud van Ommen Delft University of Technology
Robin H. A. Ras
Robin H. A. Ras Aalto University
Lars Hultman
Lars Hultman Linköping University

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