2026 Suvi Haukka: Materials Science Researcher – H-Index, Publications & Awards

Discipline name	D-Index	World Ranking	Current World Ranking	National Ranking	Current National Ranking	Publications	Citations
Materials Science	63	6138	5940	1567	1466	141	15021

Discipline name

D-Index

World Ranking

Current World Ranking

National Ranking

Current National Ranking

Publications

Citations

Materials Science

6138

5940

1567

1466

141

15021

Overview

Suvi Haukka is affiliated with ASM International in the United States and specializes in Engineering with a focus on Electrical and Electronic Engineering, Materials Chemistry, and Mechanics of Materials. Their research primarily revolves around semiconductor materials and devices, plasma diagnostics and applications, electronic and structural properties of oxides, metal and thin film mechanics, advancements in semiconductor devices and circuit design, and molecular junctions and nanostructures.

Haukka's recent publications include:

Thermal Atomic Layer Etching of Aluminum Oxide (Al₂O₃) Using Sequential Exposures of Niobium Pentafluoride (NbF₅) and Carbon Tetrachloride (CCl₄): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism, 2021, Chemistry of Materials
Thermal gas-phase etching of titanium nitride (TiN) by thionyl chloride (SOCl₂), 2020, Applied Surface Science
Combining Experimental and DFT Investigation of the Mechanism Involved in Thermal Etching of Titanium Nitride Using Alternate Exposures of NbF₅ and CCl₄, or CCl₄ Only, 2021, Advanced Materials Interfaces
Erratum: "History of atomic layer deposition and its relationship with the American Vacuum Society" [J. Vac. Sci. Technol. A 31, 050818 (2013)], 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Frequent co-authors in Haukka's research include:

Mikko Ritala
Varun Sharma
Tom Blomberg
Michael Givens
M. Tuominen

Publications by Haukka have appeared in venues such as:

Chemistry of Materials
Applied Surface Science
Advanced Materials Interfaces
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Best Publications

Methods for making a dielectric stack in an integrated circuit

Suvi P. Haukka;Jarmo Skarp;Marko Tuominen

797
Citations
Conformal thin films over textured capacitor electrodes

Ivo Raaijmakers;Suvi P. Haukka;Ernst H. A. Granneman

630
Citations
Method for bottomless deposition of barrier layers in integrated circuit metallization schemes

Alessandra Satta;Karen Maex;Kai-Erik Elers;Ville Antero Saanila

579
Citations
Method of growing oxide thin films

Eva Tois;Suvi Haukka;Marko Tuominen

496
Citations
Trap-assisted tunneling in high permittivity gate dielectric stacks

Michel Houssa;M Tuominen;M Naili;Valeri Afanas'ev

451
Citations
Method of depositing barrier layer from metal gates

Suvi Haukka;Hannu Huotari

433
Citations
Method of growing electrical conductors

Juhana Kostamo;Pekka J. Soininen;Kai-Erik Elers;Suvi Haukka

409
Citations
Method for depositing nanolaminate thin films on sensitive surfaces

Kai-Erik Elers;Suvi P. Haukka;Ville Antero Saanila;Sari Johanna Kaipio

355
Citations
Low temperature gate stack

Suvi Haukka;Eric Shero;Christophe Pomarede;Jan Hub Maes

349
Citations
Deposition of transition metal carbides

Kai-Erik Elers;Suvi P. Haukka;Ville Antero Saanila;Sari Johanna Kaipio

341
Citations
Method for depositing thin films by mixed pulsed CVD and ALD

Menso Hendriks;Martin Knapp;Suvi Haukka

300
Citations
Film Uniformity in Atomic Layer Deposition

Kai-Erik Elers;Tom Blomberg;Marko Peussa;Brad Aitchison

293
Citations
Electrical and materials properties of ZrO2 gate dielectrics grown by atomic layer chemical vapor deposition

Charles M. Perkins;Baylor B. Triplett;Paul C. McIntyre;Krishna C. Saraswat

290
Citations
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES

Antti J. Niskanen;Shang Chen;Viljami Pore;Atsuki Fukazawa

288
Citations
PROCESS FOR PRODUCING A THIN FILM COMPRISING SILICON DIOXIDE

Matero Raija H;Haukka Suvi P

285
Citations
Selective formation of metallic films on metallic surfaces

Suvi P. Haukka;Antti Niskanen;Marko Tuominen

247
Citations
Deposition of complex nitride films

Suvi P. Haukka;Tanja Claasen;Peter Zagwijn

244
Citations
Method of producing thin films

Suvi Haukka;Hannu Huotari

238
Citations
Method for forming Si-containing film using two precursors by ALD

Naoto Tsuji;Atsuki Fukazawa;Noboru Takamure;Suvi Haukka

229
Citations
Deposition of silicon dioxide on hydrophobic surfaces

Suvi Haukka;Marko Tuominen

225
Citations