What is she best known for?
The fields of study she is best known for:
- Semiconductor
- Aluminium
- Silicon
Suvi Haukka mostly deals with Thin film, Atomic layer deposition, Inorganic chemistry, Oxide and Substrate.
Her Thin film research is multidisciplinary, relying on both Metal and Silicon.
The Atomic layer deposition study combines topics in areas such as Monolayer, Chemical engineering, Electrical conductor and Copper interconnect.
Her Inorganic chemistry study combines topics from a wide range of disciplines, such as Carbide and Transition metal.
Her work in Oxide tackles topics such as Dielectric which are related to areas like Low voltage.
Her studies deal with areas such as Deposition and Silicon dioxide as well as Substrate.
Her most cited work include:
- Conformal thin films over textured capacitor electrodes (391 citations)
- Method for bottomless deposition of barrier layers in integrated circuit metallization schemes (373 citations)
- Trap-assisted tunneling in high permittivity gate dielectric stacks (302 citations)
What are the main themes of her work throughout her whole career to date?
Her main research concerns Atomic layer deposition, Chemical engineering, Thin film, Metal and Layer.
Her Atomic layer deposition research is multidisciplinary, incorporating perspectives in Inorganic chemistry, Optoelectronics, Chemical vapor deposition and Analytical chemistry.
Her Chemical engineering study integrates concerns from other disciplines, such as Deposition, Deposition, Doping and Substrate.
Her Thin film study combines topics in areas such as Silicon, Aluminium, Silicon dioxide, Substrate and Nitride.
Her Substrate research includes themes of Passivation and Dielectric.
Her study focuses on the intersection of Metal and fields such as Oxide with connections in the field of Semiconductor.
She most often published in these fields:
- Atomic layer deposition (45.45%)
- Chemical engineering (41.96%)
- Thin film (40.56%)
What were the highlights of her more recent work (between 2016-2021)?
- Chemical engineering (41.96%)
- Substrate (26.57%)
- Thin film (40.56%)
In recent papers she was focusing on the following fields of study:
Chemical engineering, Substrate, Thin film, Metal and Layer are her primary areas of study.
Her research integrates issues of Oxide, Deposition, Substrate, Silicon and Atomic layer deposition in her study of Chemical engineering.
Her Atomic layer deposition study combines topics from a wide range of disciplines, such as Chemical vapor deposition and Surface reaction.
In her study, which falls under the umbrella issue of Substrate, Silane, Borane, Carbide and Silicon oxide is strongly linked to Nitride.
Suvi Haukka integrates Thin film and Science, technology and society in her research.
Her Metal research focuses on Dielectric and how it relates to Cluster.
Between 2016 and 2021, her most popular works were:
- Plasma enhanced deposition processes for controlled formation of metal oxide thin films (47 citations)
- Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process (40 citations)
- Selective deposition using hydrophobic precursors (11 citations)
In her most recent research, the most cited papers focused on:
- Semiconductor
- Aluminium
- Silicon
Her primary areas of investigation include Chemical engineering, Substrate, Atomic layer deposition, Thin film and Oxide.
Her studies deal with areas such as Layer, Substrate, Molybdenum, Nickel and Ruthenium as well as Chemical engineering.
Her Substrate study frequently links to other fields, such as Metal.
Her research on Atomic layer deposition frequently links to adjacent areas such as Chemical vapor deposition.
She has researched Thin film in several fields, including Titanium and Deposition.
In most of her Oxide studies, her work intersects topics such as Silicon.
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