Analytical chemistry, Thin film, Transmission electron microscopy, Optoelectronics and Nanotechnology are his primary areas of study. His Analytical chemistry research incorporates elements of Amorphous solid and Silicon. His research integrates issues of Stress, Hysteresis and Capacitor in his study of Optoelectronics.
His Nanotechnology research focuses on Atomic layer deposition in particular. His biological study spans a wide range of topics, including Substrate, Chemical vapor deposition and Chemical engineering. Ki-Bum Kim has included themes like Diffusion barrier and Sputtering in his Auger electron spectroscopy study.
Ki-Bum Kim mainly investigates Analytical chemistry, Optoelectronics, Nanotechnology, Chemical engineering and Layer. His Analytical chemistry research integrates issues from Amorphous solid, Thin film, Annealing, Transmission electron microscopy and Diffusion barrier. His study looks at the intersection of Diffusion barrier and topics like Auger electron spectroscopy with Tantalum.
His work carried out in the field of Optoelectronics brings together such families of science as Electrical conductor, Nanocrystal, Semiconductor device and Phase-change memory. Ki-Bum Kim studied Nanotechnology and Lithography that intersect with Resist and Electron-beam lithography. His Chemical engineering study combines topics from a wide range of disciplines, such as Inorganic chemistry, Nucleation, Chemical vapor deposition and Atomic layer deposition.
Ki-Bum Kim focuses on Graphene, Nanopore, Optoelectronics, Water supply and Nanotechnology. His research in Graphene intersects with topics in Layer, Sheet resistance, Chemical vapor deposition and Grain boundary. As part of his studies on Optoelectronics, he often connects relevant areas like Laser.
His Nanotechnology study frequently links to related topics such as Silicon. His studies in Chemical engineering integrate themes in fields like Substrate, Optical microscope, Scanning electron microscope and Thin film, Atomic layer deposition. His study in Ambipolar diffusion is interdisciplinary in nature, drawing from both Oxide and Analytical chemistry.
His primary areas of study are Nanopore, Graphene, Chemical engineering, Optoelectronics and Nanotechnology. The various areas that Ki-Bum Kim examines in his Chemical engineering study include Thin film, Atomic layer deposition and Optical microscope, Scanning electron microscope. His Thin film research is multidisciplinary, relying on both Working electrode, Amorphous solid and Electrochemical cell.
His work deals with themes such as Halide and Hysteresis, which intersect with Optoelectronics. His Nanotechnology study focuses mostly on Layer and Biomolecule. As a part of the same scientific family, he mostly works in the field of Capacitance, focusing on Oxide and, on occasion, Analytical chemistry.
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Synthesis of a new mesoporous carbon and its application to electrochemical double-layer capacitors
Jinwoo Lee;Songhun Yoon;Taeghwan Hyeon;Seung M. Oh.
Chemical Communications (1999)
Investigation of the optical and electronic properties of Ge2Sb2Te5 phase change material in its amorphous, cubic, and hexagonal phases
Bong Sub Lee;John R Abelson;Stephen G. Bishop;Dae Hwan Kang.
Journal of Applied Physics (2005)
Fabrication of Hierarchical Structures on a Polymer Surface to Mimic Natural Superhydrophobic Surfaces
Yuwon Lee;Sang-Hyun Park;Ki-Bum Kim;Jin-Kyu Lee.
Advanced Materials (2007)
Fatigue-free samarium-modified bismuth titanate (Bi4−xSmxTi3O12) film capacitors having large spontaneous polarizations
Uong Chon;Ki-Bum Kim;Hyun M. Jang;Gyu-Chul Yi.
Applied Physics Letters (2001)
Thermal conductivity of phase-change material Ge2Sb2Te5
Ho Ki Lyeo;Ho Ki Lyeo;David G. Cahill;Bong Sub Lee;John R. Abelson.
Applied Physics Letters (2006)
Comparative study of tantalum and tantalum nitrides (Ta2N and TaN) as a diffusion barrier for Cu metallization
Kyung‐Hoon Min;Kyu‐Chang Chun;Ki‐Bum Kim.
Journal of Vacuum Science & Technology B (1996)
Review paper: Transparent amorphous oxide semiconductor thin film transistor
Jang Yeon Kwon;Do Joong Lee;Ki Bum Kim.
Electronic Materials Letters (2011)
Reactively sputtered TiN as a diffusion barrier between Cu and Si
Shi‐Qing Wang;Ivo Raaijmakers;Brad J. Burrow;Sailesh Suthar.
Journal of Applied Physics (1990)
Ionic field effect transistors with sub-10 nm multiple nanopores.
Sung-Wook Nam;Michael J. Rooks;Ki-Bum Kim;Stephen M. Rossnagel.
Nano Letters (2009)
Structural and Electrical Properties of Atomic Layer Deposited Al-Doped ZnO Films
Do Joong Lee;Hyun Mi Kim;Jang Yeon Kwon;Hyoji Choi.
Advanced Functional Materials (2011)
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