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Materials Science

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46
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8311
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11419
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2682

Overview

John R. Abelson is affiliated with the University of Illinois at Urbana-Champaign in the United States. Their research focuses primarily on engineering and materials science, with significant contributions in electrical and electronic engineering, materials chemistry, and related subfields such as electronic, optical, and magnetic materials, mechanics of materials, and catalysis.

The main topics covered in their work include semiconductor materials and devices, copper interconnects and reliability, molecular junctions and nanostructures, metal and thin film mechanics, advancements in semiconductor devices and circuit design, electronic and structural properties of oxides, and ZnO doping and properties.

John R. Abelson's notable recent publications include:

  • New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition, 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH3, 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors: Synthesis and Characterization of Pt[CH2CMe2CH2CHCH2]2 and the Impact of Ligand Design on the Deposition Process, 2020, Chemistry of Materials
  • Ultrasmooth cobalt films on SiO2 by chemical vapor deposition using a nucleation promoter and a growth inhibitor, 2021, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Superconformal growth and trench filling using a consumable inhibitor in chemical vapor deposition of Hf1−xVxBy, 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

The frequent coauthors who have collaborated with John R. Abelson include:

  • Gregory S. Girolami
  • Zhejun V. Zhang
  • Sumeng Liu
  • Laurent Souqui
  • Kinsey L. Canova

Their works are frequently published in venues such as:

  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Organometallics
  • SSRN Electronic Journal
  • Chemistry of Materials

John R. Abelson's research covers a broad spectrum within semiconductor technology and thin film deposition, with a particular emphasis on chemical vapor deposition methods and thin film mechanics. Their research outputs contribute to understanding and advancing materials used in semiconductor devices and nanoscale structures.

Best Publications

  • Thermal conductivity of a -Si:H thin films

    David G Cahill;M. Katiyar;John R Abelson

  • Investigation of the optical and electronic properties of Ge2Sb2Te5 phase change material in its amorphous, cubic, and hexagonal phases

    Bong Sub Lee;John R Abelson;Stephen G. Bishop;Dae Hwan Kang

  • Thermal conductivity of phase-change material Ge2Sb2Te5

    Ho Ki Lyeo;Ho Ki Lyeo;David G. Cahill;Bong Sub Lee;John R. Abelson

  • Three-dimensional self-assembled photonic crystals with high temperature stability for thermal emission modification

    Kevin A. Arpin;Mark D. Losego;Andrew N. Cloud;Hailong Ning

  • Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixtures

    I. Petrov;A. Myers;J. E. Greene;John R Abelson

  • Observation of the Role of Subcritical Nuclei in Crystallization of a Glassy Solid

    Bong Sub Lee;Geoffrey W. Burr;Robert M. Shelby;Simone Raoux

  • Metal complex compositions and methods for making metal-containing films

    Gregory S. Girolami;Do Young Kim;John R. Abelson;Navneet Kumar

  • Remote-plasma chemical vapor deposition of conformal ZrB2 films at low temperature: A promising diffusion barrier for ultralarge scale integrated electronics

    Junghwan Sung;Dean M. Goedde;Gregory S. Girolami;John R. Abelson

  • Plasma deposition of hydrogenated amorphous silicon: Studies of the growth surface

    John R Abelson

  • Soft lithographic fabrication of an image sensor array on a curved substrate

    Hyun Chul Jin;John R. Abelson;Martin K. Erhardt;Ralph G. Nuzzo

  • Hydrogenated amorphous silicon films deposited by reactive sputtering: The electronic properties, hydrogen bonding and microstructure

    M. Pinarbasi;N. Maley;A. Myers;John R Abelson

  • Absence of an Abrupt Phase Change from Polycrystalline to Amorphous in Silicon with Deposition Temperature

    P. M. Voyles;P. M. Voyles;J. E. Gerbi;M. M. J. Treacy;J. M. Gibson

  • Medium-range order in amorphous silicon measured by fluctuation electron microscopy

    Paul M. Voyles;John R. Abelson

  • Improved transparent conductive oxide/p+/i junction in amorphous silicon solar cells by tailored hydrogen flux during growth

    A. Nuruddin;John R Abelson

  • Hafnium diboride thin films by chemical vapor deposition from a single source precursor

    Sreenivas Jayaraman;Yu Yang;Do Young Kim;Gregory S. Girolami

  • Disordered intermixing at the platinum:silicon interface demonstrated by high‐resolution cross‐sectional transmission electron microscopy, Auger electron spectroscopy, and MeV ion channeling

    John R. Abelson;Ki Bum Kim;Douglas E. Mercer;C. Robert Helms

  • HfB2 and Hf–B–N hard coatings by chemical vapor deposition

    S. Jayaraman;S. Jayaraman;J.E. Gerbi;J.E. Gerbi;Y. Yang;Y. Yang;D.Y. Kim;D.Y. Kim

  • Structural disorder induced in hydrogenated amorphous silicon by light soaking

    J. M. Gibson;M. M.J. Treacy;P. M. Voyles;H. C. Jin

  • Evidence for a time dependent excitation process in silane radio frequency glow discharges

    Gilles de Rosny;Earl R. Mosburg;John R. Abelson;Genevieve Devaud

  • Anomalously high thermal conductivity of amorphous Si deposited by hot-wire chemical vapor deposition

    Ho Soon Yang;David G. Cahill;X. Liu;J. L. Feldman

  • Epitaxial GexSi1−x/Si (100) structures produced by pulsed laser mixing of evaporated Ge on Si (100) substrates

    John R. Abelson;Thomas W. Sigmon;Ki Bum Kim;Kurt H. Weiner

Frequent Co-Authors

Gregory S. Girolami
Gregory S. Girolami University of Illinois at Urbana-Champaign
Paul M. Voyles
Paul M. Voyles University of Wisconsin–Madison
Andreas A. Polycarpou
Andreas A. Polycarpou Texas A&M University
Joseph E Greene
Joseph E Greene University of Illinois at Urbana-Champaign
Simone Raoux
Simone Raoux Helmholtz-Zentrum Berlin für Materialien und Energie
Joseph W. Lyding
Joseph W. Lyding University of Illinois at Urbana-Champaign
Pascal Bellon
Pascal Bellon University of Illinois at Urbana-Champaign
J. M. Gibson
J. M. Gibson Northeastern University
Ki-Bum Kim
Ki-Bum Kim Seoul National University
P. Roca i Cabarrocas
P. Roca i Cabarrocas École Polytechnique

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