2013 - Fellow of the Materials Research Society
2003 - Member of the National Academy of Engineering For pioneering studies in the synthesis and characterization of epitaxial and highly ordered polycrystalline materials.
1999 - David Turnbull Lectureship, Materials Research Society "For contributions to the use of non-thermal methods in the growth of thin films and the engineering of their phase, composition, and microstructure; and for excellence in teaching and writing."
1998 - Fellow of American Physical Society (APS) Citation For original contributions to the experimental development, modeling, and understanding of Si, Ge, and Si1xGex atomiclayer epitaxy and gassource molecularbeam epitaxy
1956 - Fellow of the American Association for the Advancement of Science (AAAS)
Joseph E Greene mainly focuses on Analytical chemistry, Sputtering, Sputter deposition, Epitaxy and Thin film. Joseph E Greene interconnects Transmission electron microscopy, Tin and Texture in the investigation of issues within Analytical chemistry. His Sputtering research includes elements of Metallurgy, Microstructure, Substrate and Wurtzite crystal structure.
His Sputter deposition research incorporates elements of Lattice constant, Optoelectronics, Condensed matter physics, Mineralogy and Physical vapor deposition. His Epitaxy study incorporates themes from Crystallography, Crystal growth, Electron mobility, Silicon and Electron diffraction. The study incorporates disciplines such as Amorphous solid and Atomic physics in addition to Thin film.
His primary areas of investigation include Analytical chemistry, Sputter deposition, Epitaxy, Thin film and Sputtering. His Analytical chemistry research includes themes of Molecular beam epitaxy, Tin and Substrate. His Sputter deposition study integrates concerns from other disciplines, such as Amorphous solid, Scanning transmission electron microscopy, Physical vapor deposition and Lattice constant.
His research integrates issues of Crystallography, Crystal growth, Molecular physics, Transmission electron microscopy and Condensed matter physics in his study of Epitaxy. His Thin film study combines topics in areas such as Chemical vapor deposition, Nanostructure, Mineralogy, Composite material and Solid-state chemistry. He combines subjects such as Optoelectronics, Metallurgy and Nitride with his study of Sputtering.
Joseph E Greene spends much of his time researching Thin film, Sputter deposition, High-power impulse magnetron sputtering, Composite material and Sputtering. Joseph E Greene has researched Thin film in several fields, including Substrate, Melting point, Crystal structure and Nanostructure. His Sputter deposition study also includes fields such as
His High-power impulse magnetron sputtering research integrates issues from Microstructure, Nitride and Analytical chemistry. His Analytical chemistry research is multidisciplinary, relying on both Scattering and Transition metal. His study focuses on the intersection of Sputtering and fields such as Optoelectronics with connections in the field of Annealing.
The scientist’s investigation covers issues in Thin film, Sputter deposition, High-power impulse magnetron sputtering, Sputtering and Epitaxy. His Thin film study combines topics from a wide range of disciplines, such as Alloy, Composite material, Toughness and Ceramic. His biological study spans a wide range of topics, including Nitride and Analytical chemistry.
As a member of one scientific family, he mostly works in the field of Analytical chemistry, focusing on Substrate and, on occasion, Microstructure and Titanium. Joseph E Greene studies Cavity magnetron which is a part of Sputtering. His Epitaxy research is multidisciplinary, incorporating elements of Molecular physics, Atom, Tin and Condensed matter physics.
This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.
Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition
G. Håkansson;J.-E. Sundgren;D. McIntyre;J.E. Greene.
Thin Solid Films (1987)
Growth of poly- and single-crystal ScN on MgO(001): Role of low-energy N2+ irradiation in determining texture, microstructure evolution, and mechanical properties
D. Gall;I. Petrov;N. Hellgren;L. Hultman.
Journal of Applied Physics (1998)
Use of an externally applied axial magnetic field to control ion/neutral flux ratios incident at the substrate during magnetron sputter deposition
I. Petrov;F. Adibi;J. E. Greene;W. D. Sproul.
Journal of Vacuum Science and Technology (1992)
Microstructure and oxidation-resistance of Ti1 − x − y −zAlxCryYzN layers grown by combined steered-arc/unbalanced-magnetron-sputter deposition
L.A. Donohue;I.J. Smith;W.-D. Münz;I. Petrov.
Surface & Coatings Technology (1997)
Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixtures
I. Petrov;A. Myers;J. E. Greene;John R Abelson.
Journal of Vacuum Science and Technology (1994)
Self-organized nanocolumnar structure in superhard TiB2 thin films
P. H. Mayrhofer;C. Mitterer;J. G. Wen;J. E. Greene.
Applied Physics Letters (2005)
Microstructures of TiN films grown by various physical vapour deposition techniques
G. Håkansson;L. Hultman;J.-E. Sundgren;J.E. Greene.
Surface & Coatings Technology (1991)
Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering
F. Adibi;I. Petrov;J. E. Greene;L. Hultman.
Journal of Applied Physics (1993)
Reactive magnetron sputter deposited CNx: Effects of N2 pressure and growth temperature on film composition, bonding, and microstructure
W. T. Zheng;H. Sjöström;I. Ivanov;K. Z. Xing.
Journal of Vacuum Science and Technology (1996)
Defect structure and phase transitions in epitaxial metastable cubic Ti0.5Al0.5N alloys grown on MgO(001) by ultra‐high‐vacuum magnetron sputter deposition
F. Adibi;I. Petrov;L. Hultman;U. Wahlström.
Journal of Applied Physics (1991)
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