D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 84 Citations 25,450 450 World Ranking 1174 National Ranking 418

Research.com Recognitions

Awards & Achievements

2013 - Fellow of the Materials Research Society

2003 - Member of the National Academy of Engineering For pioneering studies in the synthesis and characterization of epitaxial and highly ordered polycrystalline materials.

1999 - David Turnbull Lectureship, Materials Research Society "For contributions to the use of non-thermal methods in the growth of thin films and the engineering of their phase, composition, and microstructure; and for excellence in teaching and writing."

1998 - Fellow of American Physical Society (APS) Citation For original contributions to the experimental development, modeling, and understanding of Si, Ge, and Si1xGex atomiclayer epitaxy and gassource molecularbeam epitaxy

1956 - Fellow of the American Association for the Advancement of Science (AAAS)

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Thin film
  • Thermodynamics

Joseph E Greene mainly focuses on Analytical chemistry, Sputtering, Sputter deposition, Epitaxy and Thin film. Joseph E Greene interconnects Transmission electron microscopy, Tin and Texture in the investigation of issues within Analytical chemistry. His Sputtering research includes elements of Metallurgy, Microstructure, Substrate and Wurtzite crystal structure.

His Sputter deposition research incorporates elements of Lattice constant, Optoelectronics, Condensed matter physics, Mineralogy and Physical vapor deposition. His Epitaxy study incorporates themes from Crystallography, Crystal growth, Electron mobility, Silicon and Electron diffraction. The study incorporates disciplines such as Amorphous solid and Atomic physics in addition to Thin film.

His most cited work include:

  • Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition (209 citations)
  • Growth of poly- and single-crystal ScN on MgO(001): Role of low-energy N2+ irradiation in determining texture, microstructure evolution, and mechanical properties (177 citations)
  • Microstructure and oxidation-resistance of Ti1 − x − y −zAlxCryYzN layers grown by combined steered-arc/unbalanced-magnetron-sputter deposition (171 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of investigation include Analytical chemistry, Sputter deposition, Epitaxy, Thin film and Sputtering. His Analytical chemistry research includes themes of Molecular beam epitaxy, Tin and Substrate. His Sputter deposition study integrates concerns from other disciplines, such as Amorphous solid, Scanning transmission electron microscopy, Physical vapor deposition and Lattice constant.

His research integrates issues of Crystallography, Crystal growth, Molecular physics, Transmission electron microscopy and Condensed matter physics in his study of Epitaxy. His Thin film study combines topics in areas such as Chemical vapor deposition, Nanostructure, Mineralogy, Composite material and Solid-state chemistry. He combines subjects such as Optoelectronics, Metallurgy and Nitride with his study of Sputtering.

He most often published in these fields:

  • Analytical chemistry (45.66%)
  • Sputter deposition (43.16%)
  • Epitaxy (35.07%)

What were the highlights of his more recent work (between 2016-2021)?

  • Thin film (44.89%)
  • Sputter deposition (43.16%)
  • High-power impulse magnetron sputtering (17.15%)

In recent papers he was focusing on the following fields of study:

Joseph E Greene spends much of his time researching Thin film, Sputter deposition, High-power impulse magnetron sputtering, Composite material and Sputtering. Joseph E Greene has researched Thin film in several fields, including Substrate, Melting point, Crystal structure and Nanostructure. His Sputter deposition study also includes fields such as

  • Epitaxy that connect with fields like Tin,
  • Scanning transmission electron microscopy which is related to area like Crystal.

His High-power impulse magnetron sputtering research integrates issues from Microstructure, Nitride and Analytical chemistry. His Analytical chemistry research is multidisciplinary, relying on both Scattering and Transition metal. His study focuses on the intersection of Sputtering and fields such as Optoelectronics with connections in the field of Annealing.

Between 2016 and 2021, his most popular works were:

  • Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017 (81 citations)
  • Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film (29 citations)
  • Enhanced Ti0.84Ta0.16N diffusion barriers, grown by a hybrid sputtering technique with no substrate heating, between Si(001) wafers and Cu overlayers. (21 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Atom
  • Thermodynamics

The scientist’s investigation covers issues in Thin film, Sputter deposition, High-power impulse magnetron sputtering, Sputtering and Epitaxy. His Thin film study combines topics from a wide range of disciplines, such as Alloy, Composite material, Toughness and Ceramic. His biological study spans a wide range of topics, including Nitride and Analytical chemistry.

As a member of one scientific family, he mostly works in the field of Analytical chemistry, focusing on Substrate and, on occasion, Microstructure and Titanium. Joseph E Greene studies Cavity magnetron which is a part of Sputtering. His Epitaxy research is multidisciplinary, incorporating elements of Molecular physics, Atom, Tin and Condensed matter physics.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition

G. Håkansson;J.-E. Sundgren;D. McIntyre;J.E. Greene.
Thin Solid Films (1987)

318 Citations

Growth of poly- and single-crystal ScN on MgO(001): Role of low-energy N2+ irradiation in determining texture, microstructure evolution, and mechanical properties

D. Gall;I. Petrov;N. Hellgren;L. Hultman.
Journal of Applied Physics (1998)

288 Citations

Use of an externally applied axial magnetic field to control ion/neutral flux ratios incident at the substrate during magnetron sputter deposition

I. Petrov;F. Adibi;J. E. Greene;W. D. Sproul.
Journal of Vacuum Science and Technology (1992)

252 Citations

Microstructure and oxidation-resistance of Ti1 − x − y −zAlxCryYzN layers grown by combined steered-arc/unbalanced-magnetron-sputter deposition

L.A. Donohue;I.J. Smith;W.-D. Münz;I. Petrov.
Surface & Coatings Technology (1997)

234 Citations

Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixtures

I. Petrov;A. Myers;J. E. Greene;John R Abelson.
Journal of Vacuum Science and Technology (1994)

229 Citations

Self-organized nanocolumnar structure in superhard TiB2 thin films

P. H. Mayrhofer;C. Mitterer;J. G. Wen;J. E. Greene.
Applied Physics Letters (2005)

214 Citations

Microstructures of TiN films grown by various physical vapour deposition techniques

G. Håkansson;L. Hultman;J.-E. Sundgren;J.E. Greene.
Surface & Coatings Technology (1991)

213 Citations

Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering

F. Adibi;I. Petrov;J. E. Greene;L. Hultman.
Journal of Applied Physics (1993)

213 Citations

Reactive magnetron sputter deposited CNx: Effects of N2 pressure and growth temperature on film composition, bonding, and microstructure

W. T. Zheng;H. Sjöström;I. Ivanov;K. Z. Xing.
Journal of Vacuum Science and Technology (1996)

209 Citations

Defect structure and phase transitions in epitaxial metastable cubic Ti0.5Al0.5N alloys grown on MgO(001) by ultra‐high‐vacuum magnetron sputter deposition

F. Adibi;I. Petrov;L. Hultman;U. Wahlström.
Journal of Applied Physics (1991)

198 Citations

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