What is he best known for?
The fields of study he is best known for:
- Electron
- Semiconductor
- Aluminium
His main research concerns Sputtering, Sputter deposition, Thin film, Analytical chemistry and High-power impulse magnetron sputtering.
His studies deal with areas such as Adhesion and Atomic physics as well as Sputtering.
His work deals with themes such as Capacitor, Ionization, Dielectric, Substrate and Microstructure, which intersect with Sputter deposition.
His Thin film study also includes fields such as
- Tin which is related to area like Mineralogy,
- Amorphous solid and related Grain growth.
His Analytical chemistry research focuses on subjects like Transmission electron microscopy, which are linked to Scanning electron microscope.
Ulf Helmersson has included themes like Optoelectronics and Physical vapor deposition in his High-power impulse magnetron sputtering study.
His most cited work include:
- A novel pulsed magnetron sputter technique utilizing very high target power densities (777 citations)
- Ionized physical vapor deposition (IPVD): A review of technology and applications (748 citations)
- Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness (608 citations)
What are the main themes of his work throughout his whole career to date?
His primary areas of study are Thin film, Sputter deposition, High-power impulse magnetron sputtering, Analytical chemistry and Sputtering.
His Thin film study combines topics in areas such as Substrate, Epitaxy, Mineralogy and Composite material, Microstructure.
His Sputter deposition research focuses on Atomic physics and how it relates to Electron density, Electron and Langmuir probe.
The study incorporates disciplines such as Optoelectronics, Ionization, Physical vapor deposition and Engineering physics in addition to High-power impulse magnetron sputtering.
His Analytical chemistry research integrates issues from Amorphous solid, Transmission electron microscopy, Deposition and Oxide.
His work focuses on many connections between Sputtering and other disciplines, such as Plasma, that overlap with his field of interest in Nanoparticle.
He most often published in these fields:
- Thin film (43.93%)
- Sputter deposition (39.29%)
- High-power impulse magnetron sputtering (35.71%)
What were the highlights of his more recent work (between 2013-2021)?
- Nanoparticle (11.07%)
- High-power impulse magnetron sputtering (35.71%)
- Sputter deposition (39.29%)
In recent papers he was focusing on the following fields of study:
Ulf Helmersson spends much of his time researching Nanoparticle, High-power impulse magnetron sputtering, Sputter deposition, Sputtering and Optoelectronics.
His research on High-power impulse magnetron sputtering concerns the broader Thin film.
The various areas that Ulf Helmersson examines in his Sputter deposition study include Composite number, Deposition, Nitride and Cavity magnetron.
His Sputtering study integrates concerns from other disciplines, such as Grain boundary, Nucleation, Degree of ionization, Grain size and Graphene oxide paper.
The Optoelectronics study combines topics in areas such as Cubic zirconia, Capacitance, High-resolution transmission electron microscopy and Solid-state chemistry.
His Analytical chemistry study combines topics from a wide range of disciplines, such as Electrical conductor, Transmission electron microscopy and Direct current.
Between 2013 and 2021, his most popular works were:
- Room temperature deposition of homogeneous, highly transparent and conductive Al-doped ZnO films by reactive high power impulse magnetron sputtering (53 citations)
- Highly reflective rear surface passivation design for ultra-thin Cu(In,Ga)Se2 solar cells (40 citations)
- The role of Ohmic heating in dc magnetron sputtering (34 citations)
In his most recent research, the most cited papers focused on:
- Electron
- Semiconductor
- Aluminium
His scientific interests lie mostly in High-power impulse magnetron sputtering, Thin film, Sputter deposition, Optoelectronics and Sputtering.
He interconnects Diamond-like carbon, Substrate, Doping and Nitride in the investigation of issues within High-power impulse magnetron sputtering.
His work in Thin film addresses issues such as Composite material, which are connected to fields such as Electrical resistivity and conductivity, Partial pressure and Crystallite.
His Sputter deposition study incorporates themes from Deposition, Plasma, Atomic physics and Analytical chemistry.
His Optoelectronics research includes themes of Faraday efficiency, Non-blocking I/O and Solid-state chemistry.
His studies in Sputtering integrate themes in fields like Nanoparticle, Metallurgy, Grain size and Grain boundary strengthening.
This overview was generated by a machine learning system which analysed the scientist’s
body of work. If you have any feedback, you can
contact us
here.
