World's Best Scientists 2026 revealed!
Ulf Helmersson

Ulf Helmersson

D-Index & Metrics

Materials Science

D-Index
67
Citations
17363
World Ranking
5078
National Ranking
52

Ulf Helmersson publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Ulf Helmersson sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 279 publications — 55th percentile

55% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Ulf Helmersson D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Ulf Helmersson sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 67 D-Index — 61st percentile

61% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Ulf Helmersson is affiliated with Linköping University in Sweden and has a research focus primarily in the fields of Engineering and Materials Science. Their work encompasses several key subfields including Mechanics of Materials, Electrical and Electronic Engineering, Materials Chemistry, Computational Mechanics, and Mechanical Engineering.

The scientist's research topics include:

  • Metal and Thin Film Mechanics
  • Diamond and Carbon-based Materials Research
  • Ion-surface interactions and analysis
  • Plasma Diagnostics and Applications
  • Semiconductor materials and devices
  • High Entropy Alloys Studies
  • High-Temperature Coating Behaviors

Helmersson's recent publications reflect a focus on plasma technologies and thin film deposition methods. Notable papers include:

  • Experimental verification of deposition rate increase, with maintained high ionized flux fraction, by shortening the HiPIMS pulse (2021, Plasma Sources Science and Technology)
  • Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge (2020, Plasma Sources Science and Technology)
  • Copper thin films deposited using different ion acceleration strategies in HiPIMS (2021, Surface and Coatings Technology)
  • Bipolar HiPIMS: The role of capacitive coupling in achieving ion bombardment during growth of dielectric thin films (2021, Surface and Coatings Technology)
  • Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias (2021, Journal of Applied Physics)

Their work has been published frequently in these venues:

  • Plasma Sources Science and Technology
  • Surface and Coatings Technology
  • Journal of Applied Physics
  • ACS Applied Nano Materials
  • Scripta Materialia

Frequent collaborators include Daniel Lundin, Michal Zanáška, Hao Du, Robert Boyd, and N. Brenning. These coauthors have contributed to multiple joint publications across related research topics.

Best Publications

  • Ionized physical vapor deposition (IPVD): A review of technology and applications

    Ulf Helmersson;Martina Lattemann;Johan Bohlmark;Arutiun P. Ehiasarian

  • A novel pulsed magnetron sputter technique utilizing very high target power densities

    Vladimir Kouznetsov;Karol Macák;Jochen M. Schneider;Ulf Helmersson

  • Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness

    U. Helmersson;S. Todorova;S. A. Barnett;J.‐E. Sundgren

  • High power impulse magnetron sputtering discharge

    J. T. Gudmundsson;N. Brenning;Daniel Lundin;Ulf Helmersson

  • On the film density using high power impulse magnetron sputtering

    Mattias Samuelsson;Daniel Lundin;Jens Jensen;Michael A. Raadu

  • Optical properties of anatase TiO2 thin films prepared by aqueous sol–gel process at low temperature

    Zhongchun Wang;Ulf Helmersson;Per-Olov Käll

  • Influence of high power densities on the composition of pulsed magnetron plasmas

    Arutiun Ehiasarian;Roger New;W. D. Munz;L. Hultman

  • The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

    Johan Böhlmark;Martina Lattemann;J.T. Gudmundsson;A.P. Ehiasarian

  • Microstructure modification of TiN by ion bombardment during reactive sputter deposition

    I. Petrov;L. Hultman;U. Helmersson;J.-E. Sundgren

  • Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

    Karol Macák;Vladimir Kouznetsov;Jochen Schneider;Ulf Helmersson

  • Ionization of sputtered metals in high power pulsed magnetron sputtering

    Johan Bohlmark;Jones Alami;Chris Christou;Arutiun P. Ehiasarian

  • Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique

    A. P. Ehiasarian;P. Eh. Hovsepian;Lars Hultman;Ulf Helmersson

  • Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces

    Jones Alami;Per O. Å. Persson;Denis Music;J. T. Gudmundsson

  • High power pulsed magnetron sputtered CrNX films

    A.P. Ehiasarian;W.-D. Munz;Lars Hultman;Ulf Helmersson

  • Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge

    Jon Tomas Gudmundsson;J Alami;Ulf Helmersson

  • A spectroscopic ellipsometry study of cerium dioxide thin films grown on sapphire by rf magnetron sputtering

    S. Guo;H. Arwin;S. N. Jacobsen;K. Järrendahl

  • Low‐Temperature Superionic Conductivity in Strained Yttria‐Stabilized Zirconia

    Michael Sillassen;Per Eklund;Nini Pryds;Erik Johnson;Erik Johnson

  • Cross-field ion transport during high power impulse magnetron sputtering

    Daniel Lundin;Petter Larsson;Erik Wallin;Martina Lattemann;Martina Lattemann

  • Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel

    Martina Lattemann;A.P. Ehiasarian;Johan Böhlmark;Per .Å.O. Persson;Per .Å.O. Persson

  • Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge

    Jon Tomas Gudmundsson;J Alami;Ulf Helmersson

  • Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering

    Jones Alami;Per Eklund;Jon M. Andersson;Martina Lattemann

  • Hysteresis-free reactive high power impulse magnetron sputtering

    Erik Wallin;Ulf Helmersson

  • Adhesion of titanium nitride coatings on high‐speed steels

    U. Helmersson;B. O. Johansson;J.‐E. Sundgren;H. T. G. Hentzell

Frequent Co-Authors

J.-E. Sundgren
J.-E. Sundgren Chalmers University of Technology
Lars Hultman
Lars Hultman Linköping University
Denis Music
Denis Music RWTH Aachen University
Jochen M. Schneider
Jochen M. Schneider RWTH Aachen University
Joseph E Greene
Joseph E Greene University of Illinois at Urbana-Champaign
Jens Jensen
Jens Jensen Linköping University
Ivan Petrov
Ivan Petrov University of Illinois at Urbana-Champaign
Eva Olsson
Eva Olsson Chalmers University of Technology
Rositsa Yakimova
Rositsa Yakimova Linköping University
Igor A. Abrikosov
Igor A. Abrikosov Linköping University

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