His main research concerns Sputtering, Sputter deposition, Thin film, Analytical chemistry and High-power impulse magnetron sputtering. His studies deal with areas such as Adhesion and Atomic physics as well as Sputtering. His work deals with themes such as Capacitor, Ionization, Dielectric, Substrate and Microstructure, which intersect with Sputter deposition.
His Thin film study also includes fields such as
His primary areas of study are Thin film, Sputter deposition, High-power impulse magnetron sputtering, Analytical chemistry and Sputtering. His Thin film study combines topics in areas such as Substrate, Epitaxy, Mineralogy and Composite material, Microstructure. His Sputter deposition research focuses on Atomic physics and how it relates to Electron density, Electron and Langmuir probe.
The study incorporates disciplines such as Optoelectronics, Ionization, Physical vapor deposition and Engineering physics in addition to High-power impulse magnetron sputtering. His Analytical chemistry research integrates issues from Amorphous solid, Transmission electron microscopy, Deposition and Oxide. His work focuses on many connections between Sputtering and other disciplines, such as Plasma, that overlap with his field of interest in Nanoparticle.
Ulf Helmersson spends much of his time researching Nanoparticle, High-power impulse magnetron sputtering, Sputter deposition, Sputtering and Optoelectronics. His research on High-power impulse magnetron sputtering concerns the broader Thin film. The various areas that Ulf Helmersson examines in his Sputter deposition study include Composite number, Deposition, Nitride and Cavity magnetron.
His Sputtering study integrates concerns from other disciplines, such as Grain boundary, Nucleation, Degree of ionization, Grain size and Graphene oxide paper. The Optoelectronics study combines topics in areas such as Cubic zirconia, Capacitance, High-resolution transmission electron microscopy and Solid-state chemistry. His Analytical chemistry study combines topics from a wide range of disciplines, such as Electrical conductor, Transmission electron microscopy and Direct current.
His scientific interests lie mostly in High-power impulse magnetron sputtering, Thin film, Sputter deposition, Optoelectronics and Sputtering. He interconnects Diamond-like carbon, Substrate, Doping and Nitride in the investigation of issues within High-power impulse magnetron sputtering. His work in Thin film addresses issues such as Composite material, which are connected to fields such as Electrical resistivity and conductivity, Partial pressure and Crystallite.
His Sputter deposition study incorporates themes from Deposition, Plasma, Atomic physics and Analytical chemistry. His Optoelectronics research includes themes of Faraday efficiency, Non-blocking I/O and Solid-state chemistry. His studies in Sputtering integrate themes in fields like Nanoparticle, Metallurgy, Grain size and Grain boundary strengthening.
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Ionized physical vapor deposition (IPVD): A review of technology and applications
Ulf Helmersson;Martina Lattemann;Johan Bohlmark;Arutiun P. Ehiasarian.
Thin Solid Films (2006)
A novel pulsed magnetron sputter technique utilizing very high target power densities
Vladimir Kouznetsov;Karol Macák;Jochen M. Schneider;Ulf Helmersson.
Surface & Coatings Technology (1999)
Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness
U. Helmersson;S. Todorova;S. A. Barnett;J.‐E. Sundgren.
Journal of Applied Physics (1987)
High power impulse magnetron sputtering discharge
J. T. Gudmundsson;N. Brenning;Daniel Lundin;Ulf Helmersson.
Journal of Vacuum Science and Technology (2012)
Optical properties of anatase TiO2 thin films prepared by aqueous sol–gel process at low temperature
Zhongchun Wang;Ulf Helmersson;Per-Olov Käll.
Thin Solid Films (2002)
Influence of high power densities on the composition of pulsed magnetron plasmas
Arutiun Ehiasarian;Roger New;W. D. Munz;L. Hultman.
Microstructure modification of TiN by ion bombardment during reactive sputter deposition
I. Petrov;L. Hultman;U. Helmersson;J.-E. Sundgren.
Thin Solid Films (1989)
On the film density using high power impulse magnetron sputtering
Mattias Samuelsson;Daniel Lundin;Jens Jensen;Michael A. Raadu.
Surface & Coatings Technology (2010)
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
Johan Böhlmark;Martina Lattemann;J.T. Gudmundsson;A.P. Ehiasarian.
Thin Solid Films (2006)
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
Karol Macák;Vladimir Kouznetsov;Jochen Schneider;Ulf Helmersson.
Journal of Vacuum Science and Technology (2000)
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