Ulf Helmersson

Overview

Best Publications

• Ionized physical vapor deposition (IPVD): A review of technology and applications

  Ulf Helmersson;Martina Lattemann;Johan Bohlmark;Arutiun P. Ehiasarian

  1329
  Citations

• A novel pulsed magnetron sputter technique utilizing very high target power densities

  Vladimir Kouznetsov;Karol Macák;Jochen M. Schneider;Ulf Helmersson

  1306
  Citations

• Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness

  U. Helmersson;S. Todorova;S. A. Barnett;J.‐E. Sundgren

  981
  Citations

• High power impulse magnetron sputtering discharge

  J. T. Gudmundsson;N. Brenning;Daniel Lundin;Ulf Helmersson

  816
  Citations

• On the film density using high power impulse magnetron sputtering

  Mattias Samuelsson;Daniel Lundin;Jens Jensen;Michael A. Raadu

  487
  Citations

• Optical properties of anatase TiO2 thin films prepared by aqueous sol–gel process at low temperature

  Zhongchun Wang;Ulf Helmersson;Per-Olov Käll

  440
  Citations

• Influence of high power densities on the composition of pulsed magnetron plasmas

  Arutiun Ehiasarian;Roger New;W. D. Munz;L. Hultman

  394
  Citations

• The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

  Johan Böhlmark;Martina Lattemann;J.T. Gudmundsson;A.P. Ehiasarian

  388
  Citations

• Microstructure modification of TiN by ion bombardment during reactive sputter deposition

  I. Petrov;L. Hultman;U. Helmersson;J.-E. Sundgren

  380
  Citations

• Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

  Karol Macák;Vladimir Kouznetsov;Jochen Schneider;Ulf Helmersson

  353
  Citations

• Ionization of sputtered metals in high power pulsed magnetron sputtering

  Johan Bohlmark;Jones Alami;Chris Christou;Arutiun P. Ehiasarian

  329
  Citations

• Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique

  A. P. Ehiasarian;P. Eh. Hovsepian;Lars Hultman;Ulf Helmersson

  318
  Citations

• Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces

  Jones Alami;Per O. Å. Persson;Denis Music;J. T. Gudmundsson

  306
  Citations

• High power pulsed magnetron sputtered CrNX films

  A.P. Ehiasarian;W.-D. Munz;Lars Hultman;Ulf Helmersson

  290
  Citations

• Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge

  Jon Tomas Gudmundsson;J Alami;Ulf Helmersson

  273
  Citations

• A spectroscopic ellipsometry study of cerium dioxide thin films grown on sapphire by rf magnetron sputtering

  S. Guo;H. Arwin;S. N. Jacobsen;K. Järrendahl

  235
  Citations

• Low‐Temperature Superionic Conductivity in Strained Yttria‐Stabilized Zirconia

  Michael Sillassen;Per Eklund;Nini Pryds;Erik Johnson;Erik Johnson

  209
  Citations

• Cross-field ion transport during high power impulse magnetron sputtering

  Daniel Lundin;Petter Larsson;Erik Wallin;Martina Lattemann;Martina Lattemann

  202
  Citations

• Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel

  Martina Lattemann;A.P. Ehiasarian;Johan Böhlmark;Per .Å.O. Persson;Per .Å.O. Persson

  196
  Citations

• Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge

  Jon Tomas Gudmundsson;J Alami;Ulf Helmersson

  182
  Citations

• Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering

  Jones Alami;Per Eklund;Jon M. Andersson;Martina Lattemann

  172
  Citations

• Hysteresis-free reactive high power impulse magnetron sputtering

  Erik Wallin;Ulf Helmersson

  167
  Citations

• Adhesion of titanium nitride coatings on high‐speed steels

  U. Helmersson;B. O. Johansson;J.‐E. Sundgren;H. T. G. Hentzell

  162
  Citations