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Materials Science

D-Index
68
Citations
11545
World Ranking
4996
National Ranking
1312

Overview

William D. Sproul is affiliated with Northwestern University in the United States. The profile draws on existing data concerning their academic career and research output. The scientist has not been recorded with recent paper publications, nor are there documented co-authors or frequent publication venues linked to their work.

There is no available information on book publications or awards associated with William D. Sproul. Similarly, no specific fields or subfields of study have been identified in the available data to define the primary research interests.

The absence of recent papers and detailed topics of research suggests that published scientific contributions from William D. Sproul may not be readily accessible in public academic databases or that the data provided is limited in scope. No frequent co-authors or publication venues indicate a potentially independent or less collaborative publication pattern, or simply a lack of recorded information.

No specific main topics of work have been attributed to this scientist, which may reflect either a broad research scope not categorized into distinct topics or insufficient data to specify particular research areas.

Best Publications

  • Nanometer scale multilayered hard coatings

    Philip C. Yashar;William D. Sproul

  • New Routes in the Preparation of Mechanically Hard Films

    William D. Sproul

  • Analytical electron microscopy and Raman spectroscopy studies of carbon nitride thin films

    Ming Y. Chen;D. Li;X. Lin;V. P. Dravid

  • Nano‐indentation studies of ultrahigh strength carbon nitride thin films

    Dong Li;Yip Wah Chung;Ming Show Wong;William D. Sproul

  • Use of an externally applied axial magnetic field to control ion/neutral flux ratios incident at the substrate during magnetron sputter deposition

    I. Petrov;F. Adibi;J. E. Greene;W. D. Sproul

  • Reactive unbalanced magnetron sputter deposition of polycrystalline TiN/NbN superlattice coatings

    X. Chu;Scott A Barnett;M. S. Wong;W. D. Sproul

  • Deposition and properties of polycrystalline TiN/NbN superlattice coatings

    X. Chu;M. S. Wong;W. D. Sproul;S. L. Rohde

  • Physical vapor deposition tool coatings

    William D. Sproul

  • SYNTHESIS OF SUPERHARD CARBON NITRIDE COMPOSITE COATINGS

    Dong Li;Xi Chu;Shang Cong Cheng;Xi Wei Lin

  • CRYSTALLINE ALUMINA DEPOSITED AT LOW TEMPERATURES BY IONIZED MAGNETRON SPUTTERING

    Jochen M. Schneider;William D. Sproul;Andrey A. Voevodin;Allan Matthews

  • High rate deposition of thick CrN and Cr2N coatings using modulated pulse power (MPP) magnetron sputtering

    Unknown

  • Multilayer, multicomponent, and multiphase physical vapor deposition coatings for enhanced performance

    William D. Sproul

  • Structure and hardness studies of CNx/TiN nanocomposite coatings

    Dong Li;Xi Wei Lin;Shang Cong Cheng;Vinayak P. Dravid

  • Reactive direct current magnetron sputtering of aluminum oxide coatings

    W. D. Sproul;M. E. Graham;M. S. Wong;S. Lopez

  • Structure and mechanical properties of polycrystalline CrN/TiN superlattices

    P. Yashar;Scott A Barnett;J. Rechner;W. D. Sproul

  • Growth and characterization of C-N thin films

    Ming Y. Chen;X. Lin;V.P. Dravid;Y.W. Chung

  • Recent developments in plasma assisted physical vapour deposition

    Jochen M Schneider;Suzanne Rohde;William D Sproul;Allan Matthews

  • Wear and corrosion resistance of CrN/TiN superlattice coatings deposited by a combined deep oscillation magnetron sputtering and pulsed dc magnetron sputtering

    Unknown

  • Ionized magnetron sputter deposition of amorphous carbon nitride thin films

    D. Li;S. Lopez;Y. W. Chung;M. S. Wong

  • High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

    William D. Sproul;Paul J. Rudnik;Michael E. Graham;Suzanne L. Rohde

  • Compounds of carbon and nitrogen on a substrate

    Ming-Show Wong;Dong Li;Yip-Wah Chung;William D. Sproul

  • Method for sputtering compounds on a substrate

    William D. Sproul;Michael E. Graham

Frequent Co-Authors

Ming-Show Wong
Ming-Show Wong National Dong Hwa University
Yip-Wah Chung
Yip-Wah Chung Northwestern University
Scott A. Barnett
Scott A. Barnett Northwestern University
Vinayak P. Dravid
Vinayak P. Dravid Northwestern University
Jochen M. Schneider
Jochen M. Schneider RWTH Aachen University
Allan Matthews
Allan Matthews University of Manchester
Ivan Petrov
Ivan Petrov University of Illinois at Urbana-Champaign
Lars Hultman
Lars Hultman Linköping University
Andrey A. Voevodin
Andrey A. Voevodin University of North Texas
Joseph E Greene
Joseph E Greene University of Illinois at Urbana-Champaign

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