Ivan Petrov mostly deals with Analytical chemistry, Sputter deposition, Sputtering, Thin film and Tin. His Analytical chemistry research integrates issues from Crystallography, Texture, Microstructure and Transmission electron microscopy. His work deals with themes such as Crystal growth, Epitaxy, Lattice constant, Mineralogy and Electrical resistivity and conductivity, which intersect with Sputter deposition.
The various areas that he examines in his Sputtering study include Metallurgy, Substrate and Physical vapor deposition. In his study, which falls under the umbrella issue of Thin film, Plasma diagnostics, Ionization, Mass spectrometry and Charged particle is strongly linked to Atomic physics. His Tin research focuses on Ab initio quantum chemistry methods and how it connects with Density functional theory.
Ivan Petrov spends much of his time researching Sputter deposition, Analytical chemistry, Thin film, Sputtering and Tin. He has included themes like Crystallography, Substrate, Epitaxy and Cavity magnetron in his Sputter deposition study. His Analytical chemistry study combines topics in areas such as Transmission electron microscopy, Annealing and Microstructure.
His Thin film study combines topics from a wide range of disciplines, such as Composite material, Nanoindentation, Texture and Chemical engineering. Within one scientific family, Ivan Petrov focuses on topics pertaining to Optoelectronics under Sputtering, and may sometimes address concerns connected to Nanotechnology. His Tin study also includes fields such as
His primary scientific interests are in Thin film, Sputter deposition, High-power impulse magnetron sputtering, Composite material and Sputtering. The concepts of his Thin film study are interwoven with issues in Chemical engineering, Nanostructure, Substrate and Analytical chemistry. His research in Analytical chemistry intersects with topics in Rutherford backscattering spectrometry and Elastic recoil detection.
His study in Sputter deposition is interdisciplinary in nature, drawing from both Epitaxy, Scanning transmission electron microscopy, Titanium diboride, Titanium and Solid-state chemistry. His studies deal with areas such as Microstructure, Physical vapor deposition and Nitride as well as High-power impulse magnetron sputtering. His Sputtering research incorporates elements of Optoelectronics, Metal and X-ray photoelectron spectroscopy.
His primary areas of study are Thin film, High-power impulse magnetron sputtering, Sputtering, Sputter deposition and Ceramic. To a larger extent, he studies Nanotechnology with the aim of understanding Thin film. His High-power impulse magnetron sputtering study incorporates themes from Nitride and Analytical chemistry.
His study looks at the relationship between Analytical chemistry and topics such as Transmission electron microscopy, which overlap with Epitaxy. His Sputtering research is multidisciplinary, relying on both Optoelectronics and Metal. Many of his studies on Sputter deposition involve topics that are commonly interrelated, such as Cavity magnetron.
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Microstructural evolution during film growth
I. Petrov;P.B. Barna;Lars Hultman;J.E. Greene.
Journal of Vacuum Science and Technology (2003)
Stretchable batteries with self-similar serpentine interconnects and integrated wireless recharging systems.
Sheng Xu;Yihui Zhang;Yihui Zhang;Jiung Cho;Juhwan Lee.
Nature Communications (2013)
A novel pulsed magnetron sputter technique utilizing very high target power densities
Vladimir Kouznetsov;Karol Macák;Jochen M. Schneider;Ulf Helmersson.
Surface & Coatings Technology (1999)
Growth of semiconducting graphene on palladium.
Soon-Yong Kwon;Cristian V Ciobanu;Vania Petrova;Vivek B Shenoy.
Nano Letters (2009)
Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering
J. E. Greene;J.‐E. Sundgren;L. Hultman;I. Petrov.
Applied Physics Letters (1995)
Detection of Single Atoms and Buried Defects in Three Dimensions by Aberration-Corrected Electron Microscope with 0.5-Å Information Limit
C. Kisielowski;B. Freitag;M. Bischoff;H. van Lin.
Microscopy and Microanalysis (2008)
Pathways of atomistic processes on TiN(001) and (111) surfaces during film growth: An ab initio study
D. Gall;S. Kodambaka;M. A. Wall;I. Petrov.
Journal of Applied Physics (2003)
Microstructure modification of TiN by ion bombardment during reactive sputter deposition
I. Petrov;L. Hultman;U. Helmersson;J.-E. Sundgren.
Thin Solid Films (1989)
Surface changes on LiNi0.8Co0.2O2 particles during testing of high-power lithium-ion cells
D.P Abraham;R.D Twesten;M Balasubramanian;I Petrov.
Electrochemistry Communications (2002)
Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion
A. P. Ehiasarian;J. G. Wen;I. Petrov.
Journal of Applied Physics (2007)
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