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Materials Science

D-Index
72
Citations
20006
World Ranking
4017
National Ranking
224

Overview

André Anders is affiliated with the Leibniz Institute of Surface Engineering in Germany. Their research spans various areas within engineering and materials science, with a particular focus on plasma-assisted physical vapor deposition, thin film mechanics, and discharge physics.

Their work covers main fields including:

  • Engineering
  • Materials Science

Within these broad fields, their subfields of expertise include:

  • Electrical and Electronic Engineering
  • Mechanics of Materials
  • Materials Chemistry
  • Computational Mechanics
  • Atomic and Molecular Physics, and Optics

Key research topics addressed by André Anders focus on:

  • Metal and Thin Film Mechanics
  • Plasma Diagnostics and Applications
  • Semiconductor materials and devices
  • Diamond and Carbon-based Materials Research
  • Ion-surface interactions and analysis
  • Vacuum and Plasma Arcs
  • ZnO doping and properties

The scientist has contributed extensively to multiple frequent publication venues, including:

  • Journal of Applied Physics
  • Plasma Sources Science and Technology
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Journal of Physics D Applied Physics
  • Surface and Coatings Technology

André Anders collaborates regularly with several researchers. Frequent co-authors in their publications are:

  • Martin Rudolph
  • Dmitry Kalanov
  • Yeliz Unutulmazsoy
  • Jón Tómas Guðmundsson
  • N. Brenning

Selected recent papers by André Anders and their collaborators include:

  • "Foundations of physical vapor deposition with plasma assistance", 2022, Plasma Sources Science and Technology
  • "Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering", 2020, Plasma Sources Science and Technology
  • "Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge", 2021, Journal of Physics D Applied Physics
  • "Glows, arcs, ohmic discharges: An electrode-centered review on discharge modes and the transitions between them", 2024, Applied Physics Reviews
  • "Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films", 2021, Acta Materialia

Best Publications

  • A structure zone diagram including plasma-based deposition and ion etching

    André Anders

  • Cathodic Arcs: From Fractal Spots to Energetic Condensation

    André Anders

  • Handbook of plasma immersion ion implantation and deposition

    André Anders

  • Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals

    Guillermo Garcia;Raffaella Buonsanti;Evan L. Runnerstrom;Rueben J. Mendelsberg

  • Some Applications of Cathodic Arc Coatings

    André Anders

  • Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks

    T. Y. Tsui;G. M. Pharr;W. C. Oliver;C. S. Bhatia

  • Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field

    André Anders;George Yu. Yushkov

  • High power impulse magnetron sputtering : Current-voltage-time characteristics indicate the onset of sustained self-sputtering

    André Anders;Joakim Andersson;Arutiun Ehiasarian

  • Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

    André Anders

  • Metal plasma immersion ion implantation and deposition : a review

    André Anders

  • Discharge physics of high power impulse magnetron sputtering

    André Anders

  • Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing

    George M. Pharr;Daniel L. Callahan;Shaun D. McAdams;Ting Y. Tsui

  • Approaches to rid cathodic arc plasmas of macro-and nanoparticles : a review

    André Anders

  • A discussion on the absence of plasma in spark plasma sintering

    Dustin M. Hulbert;André Anders;Joakim Andersson;Enrique J. Lavernia

  • A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

    André Anders

  • Review of cathodic arc deposition technology at the start of the new millennium

    David M Sanders;André Anders

  • The Absence of Plasma in "Spark Plasma Sintering"

    Dustin M. Hulbert;André Anders;Dina V. Dudina;Joakim Andersson

  • Plasma-based ion implantation and deposition: a review of physics, technology, and applications

    J. Pelletier;A. Anders

  • Deposition rates of high power impulse magnetron sputtering: Physics and economics

    André Anders

  • Ion charge state distributions in high current vacuum arc plasmas in a magnetic field

    E.M. Oks;A. Anders;I.G. Brown;M.R. Dickinson

  • Comparative surface and nano-tribological characteristics of nanocomposite diamond-like carbon thin films doped by silver

    Han-Shen Zhang;Jose L. Endrino;Andre Anders

Frequent Co-Authors

Ian G. Brown
Ian G. Brown Lawrence Berkeley National Laboratory
Kin Man Yu
Kin Man Yu City University of Hong Kong
Johanna Rosen
Johanna Rosen Linköping University
Jochen M. Schneider
Jochen M. Schneider RWTH Aachen University
Kyriakos Komvopoulos
Kyriakos Komvopoulos University of California, Berkeley
Joel W. Ager
Joel W. Ager Lawrence Berkeley National Laboratory
Lars Hultman
Lars Hultman Linköping University
Delia J. Milliron
Delia J. Milliron The University of Texas at Austin
Martin A. Gundersen
Martin A. Gundersen University of Southern California
John C. Byrd
John C. Byrd University of Pittsburgh Cancer Institute

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