His scientific interests lie mostly in Plasma, Atomic physics, Vacuum arc, Analytical chemistry and Thin film. His Plasma research is multidisciplinary, incorporating elements of Space charge, Deposition and Argon. His studies deal with areas such as High-power impulse magnetron sputtering, Sputtering, Plasma diagnostics, Ionization and Electron as well as Atomic physics.
His Vacuum arc study is concerned with the field of Cathode as a whole. His Analytical chemistry research integrates issues from Amorphous carbon, Ion implantation, Plasma-immersion ion implantation, Optoelectronics and Plasma processing. His Thin film research incorporates themes from Cathodic arc deposition, Langmuir probe, Composite material and Partial pressure.
André Anders mainly focuses on Plasma, Atomic physics, Vacuum arc, Cathode and Analytical chemistry. His work in Plasma tackles topics such as High-power impulse magnetron sputtering which are related to areas like Secondary emission and Secondary electrons. He combines subjects such as Sputtering, Ion gun, Ion source, Ion beam and Ionization with his study of Atomic physics.
His Vacuum arc research includes themes of Ion current, Ion implantation, Plasma arc welding and Electric current. His work deals with themes such as Anode, Cathodic protection and Electric arc, which intersect with Cathode. His research in Analytical chemistry intersects with topics in Amorphous carbon, Thin film, Plasma-immersion ion implantation, Biasing and Substrate.
André Anders mostly deals with Atomic physics, Plasma, High-power impulse magnetron sputtering, Ionization and Sputtering. The various areas that André Anders examines in his Atomic physics study include Range, Ion beam, Vacuum arc, Mass spectrometry and Ion source. André Anders has researched Plasma in several fields, including Cathode, Deposition, Pulse and Analytical chemistry.
His research integrates issues of Optoelectronics, Light emission and Excitation in his study of High-power impulse magnetron sputtering. His Ionization research is multidisciplinary, incorporating perspectives in Optics, Charged particle, Plasma diagnostics, Electron and Pulse duration. His Sputtering research is multidisciplinary, incorporating elements of Mass spectrum and Boron.
André Anders focuses on High-power impulse magnetron sputtering, Ionization, Atomic physics, Sputtering and Plasma. High-power impulse magnetron sputtering is a subfield of Thin film that he investigates. His research integrates issues of Cathodic arc deposition, Oxide and Substrate in his study of Thin film.
His Atomic physics study incorporates themes from Electron and Deposition. His work focuses on many connections between Sputtering and other disciplines, such as Plasma diagnostics, that overlap with his field of interest in Streak camera. His Plasma research also works with subjects such as
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Cathodic Arcs: From Fractal Spots to Energetic Condensation
A structure zone diagram including plasma-based deposition and ion etching
Thin Solid Films (2010)
Handbook of plasma immersion ion implantation and deposition
Some Applications of Cathodic Arc Coatings
Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals
Guillermo Garcia;Raffaella Buonsanti;Evan L. Runnerstrom;Evan L. Runnerstrom;Rueben J. Mendelsberg.
Nano Letters (2011)
Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field
André Anders;George Yu. Yushkov.
Journal of Applied Physics (2002)
Ion charge state distributions of vacuum arc plasmas: The origin of species
Physical Review E (1997)
Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks
T. Y. Tsui;G. M. Pharr;W. C. Oliver;C. S. Bhatia.
MRS Proceedings (1995)
High power impulse magnetron sputtering : Current-voltage-time characteristics indicate the onset of sustained self-sputtering
André Anders;Joakim Andersson;Arutiun Ehiasarian.
Journal of Applied Physics (2007)
Metal plasma immersion ion implantation and deposition : a review
Surface & Coatings Technology (1997)
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