2026 André Anders: Materials Science Researcher – H-Index, Publications & Awards

Discipline name	D-Index	World Ranking	Current World Ranking	National Ranking	Current National Ranking	Publications	Citations
Materials Science	72	4015	3886	223	215	403	20006

André Anders publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where André Anders sits on this spectrum.

50 publications 1,163+

This scientist: 403 publications — 77th percentile

77% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

André Anders D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where André Anders sits on this spectrum.

40 D-Index 165+

This scientist: 72 D-Index — 69th percentile

69% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

André Anders is affiliated with the Leibniz Institute of Surface Engineering in Germany. Their research spans various areas within engineering and materials science, with a particular focus on plasma-assisted physical vapor deposition, thin film mechanics, and discharge physics.

Their work covers main fields including:

Engineering
Materials Science

Within these broad fields, their subfields of expertise include:

Electrical and Electronic Engineering
Mechanics of Materials
Materials Chemistry
Computational Mechanics
Atomic and Molecular Physics, and Optics

Key research topics addressed by André Anders focus on:

Metal and Thin Film Mechanics
Plasma Diagnostics and Applications
Semiconductor materials and devices
Diamond and Carbon-based Materials Research
Ion-surface interactions and analysis
Vacuum and Plasma Arcs
ZnO doping and properties

The scientist has contributed extensively to multiple frequent publication venues, including:

Journal of Applied Physics
Plasma Sources Science and Technology
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Journal of Physics D Applied Physics
Surface and Coatings Technology

André Anders collaborates regularly with several researchers. Frequent co-authors in their publications are:

Martin Rudolph
Dmitry Kalanov
Yeliz Unutulmazsoy
Jón Tómas Guðmundsson
N. Brenning

Selected recent papers by André Anders and their collaborators include:

"Foundations of physical vapor deposition with plasma assistance", 2022, Plasma Sources Science and Technology
"Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering", 2020, Plasma Sources Science and Technology
"Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge", 2021, Journal of Physics D Applied Physics
"Glows, arcs, ohmic discharges: An electrode-centered review on discharge modes and the transitions between them", 2024, Applied Physics Reviews
"Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films", 2021, Acta Materialia

Best Publications

A structure zone diagram including plasma-based deposition and ion etching

André Anders

1092
Citations
Cathodic Arcs: From Fractal Spots to Energetic Condensation

André Anders

875
Citations
Handbook of plasma immersion ion implantation and deposition

André Anders

711
Citations
Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals

Guillermo Garcia;Raffaella Buonsanti;Evan L. Runnerstrom;Rueben J. Mendelsberg

648
Citations
Some Applications of Cathodic Arc Coatings

André Anders

520
Citations
Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks

T. Y. Tsui;G. M. Pharr;W. C. Oliver;C. S. Bhatia

509
Citations
Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field

André Anders;George Yu. Yushkov

466
Citations
High power impulse magnetron sputtering : Current-voltage-time characteristics indicate the onset of sustained self-sputtering

André Anders;Joakim Andersson;Arutiun Ehiasarian

425
Citations
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

André Anders

406
Citations
Metal plasma immersion ion implantation and deposition : a review

André Anders

351
Citations
Discharge physics of high power impulse magnetron sputtering

André Anders

342
Citations
Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing

George M. Pharr;Daniel L. Callahan;Shaun D. McAdams;Ting Y. Tsui

330
Citations
Approaches to rid cathodic arc plasmas of macro-and nanoparticles : a review

André Anders

328
Citations
A discussion on the absence of plasma in spark plasma sintering

Dustin M. Hulbert;André Anders;Joakim Andersson;Enrique J. Lavernia

320
Citations
A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

André Anders

319
Citations
Review of cathodic arc deposition technology at the start of the new millennium

David M Sanders;André Anders

319
Citations
The Absence of Plasma in "Spark Plasma Sintering"

Dustin M. Hulbert;André Anders;Dina V. Dudina;Joakim Andersson

267
Citations
Plasma-based ion implantation and deposition: a review of physics, technology, and applications

J. Pelletier;A. Anders

264
Citations
Deposition rates of high power impulse magnetron sputtering: Physics and economics

André Anders

261
Citations
Ion charge state distributions in high current vacuum arc plasmas in a magnetic field

E.M. Oks;A. Anders;I.G. Brown;M.R. Dickinson

219
Citations
Comparative surface and nano-tribological characteristics of nanocomposite diamond-like carbon thin films doped by silver

Han-Shen Zhang;Jose L. Endrino;Andre Anders

219
Citations