What is he best known for?
The fields of study he is best known for:
- Electron
- Semiconductor
- Plasma
His scientific interests lie mostly in Plasma, Atomic physics, Vacuum arc, Analytical chemistry and Thin film.
His Plasma research is multidisciplinary, incorporating elements of Space charge, Deposition and Argon.
His studies deal with areas such as High-power impulse magnetron sputtering, Sputtering, Plasma diagnostics, Ionization and Electron as well as Atomic physics.
His Vacuum arc study is concerned with the field of Cathode as a whole.
His Analytical chemistry research integrates issues from Amorphous carbon, Ion implantation, Plasma-immersion ion implantation, Optoelectronics and Plasma processing.
His Thin film research incorporates themes from Cathodic arc deposition, Langmuir probe, Composite material and Partial pressure.
His most cited work include:
- Handbook of plasma immersion ion implantation and deposition (437 citations)
- A structure zone diagram including plasma-based deposition and ion etching (420 citations)
- Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals (352 citations)
What are the main themes of his work throughout his whole career to date?
André Anders mainly focuses on Plasma, Atomic physics, Vacuum arc, Cathode and Analytical chemistry.
His work in Plasma tackles topics such as High-power impulse magnetron sputtering which are related to areas like Secondary emission and Secondary electrons.
He combines subjects such as Sputtering, Ion gun, Ion source, Ion beam and Ionization with his study of Atomic physics.
His Vacuum arc research includes themes of Ion current, Ion implantation, Plasma arc welding and Electric current.
His work deals with themes such as Anode, Cathodic protection and Electric arc, which intersect with Cathode.
His research in Analytical chemistry intersects with topics in Amorphous carbon, Thin film, Plasma-immersion ion implantation, Biasing and Substrate.
He most often published in these fields:
- Plasma (47.69%)
- Atomic physics (47.88%)
- Vacuum arc (27.69%)
What were the highlights of his more recent work (between 2012-2021)?
- Atomic physics (47.88%)
- Plasma (47.69%)
- High-power impulse magnetron sputtering (12.50%)
In recent papers he was focusing on the following fields of study:
André Anders mostly deals with Atomic physics, Plasma, High-power impulse magnetron sputtering, Ionization and Sputtering.
The various areas that André Anders examines in his Atomic physics study include Range, Ion beam, Vacuum arc, Mass spectrometry and Ion source.
André Anders has researched Plasma in several fields, including Cathode, Deposition, Pulse and Analytical chemistry.
His research integrates issues of Optoelectronics, Light emission and Excitation in his study of High-power impulse magnetron sputtering.
His Ionization research is multidisciplinary, incorporating perspectives in Optics, Charged particle, Plasma diagnostics, Electron and Pulse duration.
His Sputtering research is multidisciplinary, incorporating elements of Mass spectrum and Boron.
Between 2012 and 2021, his most popular works were:
- Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) (142 citations)
- A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) (125 citations)
- Drifting potential humps in ionization zones: The “propeller blades” of high power impulse magnetron sputtering (59 citations)
In his most recent research, the most cited papers focused on:
- Electron
- Optics
- Electrical engineering
André Anders focuses on High-power impulse magnetron sputtering, Ionization, Atomic physics, Sputtering and Plasma.
High-power impulse magnetron sputtering is a subfield of Thin film that he investigates.
His research integrates issues of Cathodic arc deposition, Oxide and Substrate in his study of Thin film.
His Atomic physics study incorporates themes from Electron and Deposition.
His work focuses on many connections between Sputtering and other disciplines, such as Plasma diagnostics, that overlap with his field of interest in Streak camera.
His Plasma research also works with subjects such as
- Excitation together with Excited state,
- Secondary emission that intertwine with fields like Joule heating, Cathode, Pulsed power, Coating and Partial pressure.
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